Stress conditions to study the reliability characteristics of high-k nanolaminates

Autores
Quinteros, Cynthia Paula; Palumbo, Félix Roberto Mario; Campabadal, F.; Miranda, E.
Año de publicación
2012
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Constant voltage stressing is a standard technique to test the reliability characteristics of dielectrics used as gate insulator in MOS structures. In this work, the importance of choosing the appropriate voltage to perform stress measurements is assessed. Based on the particular dielectric permittivities and thicknesses, different operating regions in Al2O3, HfO2 and nanolaminates of both materials in terms of their breakdown voltages were established. Preliminary results seem to indicate that there is a strongly relationship between the Weibull breakdown statistics and the applied stress voltage.
Fil: Quinteros, Cynthia Paula. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Comisión Nacional de Energía Atómica; Argentina
Fil: Palumbo, Félix Roberto Mario. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Comisión Nacional de Energía Atómica; Argentina
Fil: Campabadal, F.. Consejo Superior de Investigaciones Cientificas. Instituto de Microelectronica de Barcelona; España
Fil: Miranda, E.. Universitat Autònoma de Barcelona; España
Materia
RADIATION EFFECTS
BREAKDOWN
NANOLAMINATES
HIGH-K DIELECTRICS
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/196354
Acceder
id CONICETDig_e35a2256b8523a513e824ee3b4284ac6
oai_identifier_str oai:ri.conicet.gov.ar:11336/196354
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Stress conditions to study the reliability characteristics of high-k nanolaminatesQuinteros, Cynthia PaulaPalumbo, Félix Roberto MarioCampabadal, F.Miranda, E.RADIATION EFFECTSBREAKDOWNNANOLAMINATESHIGH-K DIELECTRICShttps://purl.org/becyt/ford/2.10https://purl.org/becyt/ford/2Constant voltage stressing is a standard technique to test the reliability characteristics of dielectrics used as gate insulator in MOS structures. In this work, the importance of choosing the appropriate voltage to perform stress measurements is assessed. Based on the particular dielectric permittivities and thicknesses, different operating regions in Al2O3, HfO2 and nanolaminates of both materials in terms of their breakdown voltages were established. Preliminary results seem to indicate that there is a strongly relationship between the Weibull breakdown statistics and the applied stress voltage.Fil: Quinteros, Cynthia Paula. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Comisión Nacional de Energía Atómica; ArgentinaFil: Palumbo, Félix Roberto Mario. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Comisión Nacional de Energía Atómica; ArgentinaFil: Campabadal, F.. Consejo Superior de Investigaciones Cientificas. Instituto de Microelectronica de Barcelona; EspañaFil: Miranda, E.. Universitat Autònoma de Barcelona; EspañaElectrochemical Society Inc.2012-06info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/196354Quinteros, Cynthia Paula; Palumbo, Félix Roberto Mario; Campabadal, F.; Miranda, E.; Stress conditions to study the reliability characteristics of high-k nanolaminates; Electrochemical Society Inc.; ECS Transactions; 49; 1; 6-2012; 161-1681938-6737CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/https://iopscience.iop.org/article/10.1149/04901.0161ecstinfo:eu-repo/semantics/altIdentifier/doi/10.1149/04901.0161ecstinfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T09:37:11Zoai:ri.conicet.gov.ar:11336/196354instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 09:37:12.023CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Stress conditions to study the reliability characteristics of high-k nanolaminates
title Stress conditions to study the reliability characteristics of high-k nanolaminates
spellingShingle Stress conditions to study the reliability characteristics of high-k nanolaminates
Quinteros, Cynthia Paula
RADIATION EFFECTS
BREAKDOWN
NANOLAMINATES
HIGH-K DIELECTRICS
title_short Stress conditions to study the reliability characteristics of high-k nanolaminates
title_full Stress conditions to study the reliability characteristics of high-k nanolaminates
title_fullStr Stress conditions to study the reliability characteristics of high-k nanolaminates
title_full_unstemmed Stress conditions to study the reliability characteristics of high-k nanolaminates
title_sort Stress conditions to study the reliability characteristics of high-k nanolaminates
dc.creator.none.fl_str_mv Quinteros, Cynthia Paula
Palumbo, Félix Roberto Mario
Campabadal, F.
Miranda, E.
author Quinteros, Cynthia Paula
author_facet Quinteros, Cynthia Paula
Palumbo, Félix Roberto Mario
Campabadal, F.
Miranda, E.
author_role author
author2 Palumbo, Félix Roberto Mario
Campabadal, F.
Miranda, E.
author2_role author
author
author
dc.subject.none.fl_str_mv RADIATION EFFECTS
BREAKDOWN
NANOLAMINATES
HIGH-K DIELECTRICS
topic RADIATION EFFECTS
BREAKDOWN
NANOLAMINATES
HIGH-K DIELECTRICS
purl_subject.fl_str_mv https://purl.org/becyt/ford/2.10
https://purl.org/becyt/ford/2
dc.description.none.fl_txt_mv Constant voltage stressing is a standard technique to test the reliability characteristics of dielectrics used as gate insulator in MOS structures. In this work, the importance of choosing the appropriate voltage to perform stress measurements is assessed. Based on the particular dielectric permittivities and thicknesses, different operating regions in Al2O3, HfO2 and nanolaminates of both materials in terms of their breakdown voltages were established. Preliminary results seem to indicate that there is a strongly relationship between the Weibull breakdown statistics and the applied stress voltage.
Fil: Quinteros, Cynthia Paula. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Comisión Nacional de Energía Atómica; Argentina
Fil: Palumbo, Félix Roberto Mario. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Comisión Nacional de Energía Atómica; Argentina
Fil: Campabadal, F.. Consejo Superior de Investigaciones Cientificas. Instituto de Microelectronica de Barcelona; España
Fil: Miranda, E.. Universitat Autònoma de Barcelona; España
description Constant voltage stressing is a standard technique to test the reliability characteristics of dielectrics used as gate insulator in MOS structures. In this work, the importance of choosing the appropriate voltage to perform stress measurements is assessed. Based on the particular dielectric permittivities and thicknesses, different operating regions in Al2O3, HfO2 and nanolaminates of both materials in terms of their breakdown voltages were established. Preliminary results seem to indicate that there is a strongly relationship between the Weibull breakdown statistics and the applied stress voltage.
publishDate 2012
dc.date.none.fl_str_mv 2012-06
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/196354
Quinteros, Cynthia Paula; Palumbo, Félix Roberto Mario; Campabadal, F.; Miranda, E.; Stress conditions to study the reliability characteristics of high-k nanolaminates; Electrochemical Society Inc.; ECS Transactions; 49; 1; 6-2012; 161-168
1938-6737
CONICET Digital
CONICET
url http://hdl.handle.net/11336/196354
identifier_str_mv Quinteros, Cynthia Paula; Palumbo, Félix Roberto Mario; Campabadal, F.; Miranda, E.; Stress conditions to study the reliability characteristics of high-k nanolaminates; Electrochemical Society Inc.; ECS Transactions; 49; 1; 6-2012; 161-168
1938-6737
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/https://iopscience.iop.org/article/10.1149/04901.0161ecst
info:eu-repo/semantics/altIdentifier/doi/10.1149/04901.0161ecst
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv Electrochemical Society Inc.
publisher.none.fl_str_mv Electrochemical Society Inc.
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1844613170916753408
score 13.070432

Publicaciones similares