Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)

Autores
Osorio Vargas, Paula; Sanjines, Rosendo; Ruales Lonfat, Cristina; Castro, Camilo; Pulgarin, Cesar; Rengifo Herrera, Julian Andres; Lavanchy, Jean-Claude; Kiwi, John
Año de publicación
2011
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Cu-cotton fabrics were functionalized by bipolar asymmetric DC-pulse magnetron sputtering (DCP). The DCP of Cu-particles on cotton proceeds at a higher energy than DC-magnetron sputtering (DC). The different sputtering mode showed effects on the structure of the Cu-film on the textile. The Cu-layer thickness was observed to be a function of DCP time being the rate of atomic deposition of 2.5 × 10 15 atoms/cm2 sat 300mA. The fastest Escherichia coli inactivation was observed within 10min when Cu was sputtered on cotton Cu for 60s. This led to a film thickness of 30nm (150 Cu-layers) with 1.7×10 17 atoms/cm 2. The Cu-textiles became darker at longer sputtering times as detected by diffuse reflectance spectroscopy (DRS). By transmission electron spectroscopy (TEM), Cu-particles 35–50nm in size were found and became more compact on the cotton surface as a function of deposition time. X-ray photoelectron spectroscopy (XPS) was used to determine the surface atomic concentration of O, Cu C, and N along the states of oxidation of the Cu-ions during the redox process leading to E. coli inactivation. The oxidation of the E. coli on the Cu-cotton surface was a function of reaction time and was monitored by the oxidation index of the carbon species on the fabric according to the ratio: (C–OH)/(C–C, C C, C–H). The increase in hydrophobicity of the Cu-cotton was followed as a function of the contact angle and droplet residence time for different samples. The results obtained for the E. coli inactivation on the Cu-films are discussed suggesting a possible reaction mechanism.
Fil: Osorio Vargas, Paula. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Sanjines, Rosendo. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Ruales Lonfat, Cristina. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Castro, Camilo. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Pulgarin, Cesar. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Rengifo Herrera, Julian Andres. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Investigación y Desarrollo En Ciencias Aplicadas "Dr. Jorge J. Ronco". Universidad Nacional de la Plata. Facultad de Ciencias Exactas. Centro de Investigación y Desarrollo en Ciencias Aplicadas; Argentina
Fil: Lavanchy, Jean-Claude. Universite de Lausanne; Suiza
Fil: Kiwi, John. Ecole Polytechnique Federale de Lausanne; Suiza
Materia
Bipolar-Asymmetric Pulsed Magnetron
Sputtering
E. Coli
Cu-Ions
Cotton
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/16233
Acceder
id CONICETDig_ead53a20a243197ed9cec7436c4cea55
oai_identifier_str oai:ri.conicet.gov.ar:11336/16233
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)Osorio Vargas, PaulaSanjines, RosendoRuales Lonfat, CristinaCastro, CamiloPulgarin, CesarRengifo Herrera, Julian AndresLavanchy, Jean-ClaudeKiwi, JohnBipolar-Asymmetric Pulsed MagnetronSputteringE. ColiCu-IonsCottonhttps://purl.org/becyt/ford/2.5https://purl.org/becyt/ford/2Cu-cotton fabrics were functionalized by bipolar asymmetric DC-pulse magnetron sputtering (DCP). The DCP of Cu-particles on cotton proceeds at a higher energy than DC-magnetron sputtering (DC). The different sputtering mode showed effects on the structure of the Cu-film on the textile. The Cu-layer thickness was observed to be a function of DCP time being the rate of atomic deposition of 2.5 × 10 15 atoms/cm2 sat 300mA. The fastest Escherichia coli inactivation was observed within 10min when Cu was sputtered on cotton Cu for 60s. This led to a film thickness of 30nm (150 Cu-layers) with 1.7×10 17 atoms/cm 2. The Cu-textiles became darker at longer sputtering times as detected by diffuse reflectance spectroscopy (DRS). By transmission electron spectroscopy (TEM), Cu-particles 35–50nm in size were found and became more compact on the cotton surface as a function of deposition time. X-ray photoelectron spectroscopy (XPS) was used to determine the surface atomic concentration of O, Cu C, and N along the states of oxidation of the Cu-ions during the redox process leading to E. coli inactivation. The oxidation of the E. coli on the Cu-cotton surface was a function of reaction time and was monitored by the oxidation index of the carbon species on the fabric according to the ratio: (C–OH)/(C–C, C C, C–H). The increase in hydrophobicity of the Cu-cotton was followed as a function of the contact angle and droplet residence time for different samples. The results obtained for the E. coli inactivation on the Cu-films are discussed suggesting a possible reaction mechanism.Fil: Osorio Vargas, Paula. Ecole Polytechnique Federale de Lausanne; SuizaFil: Sanjines, Rosendo. Ecole Polytechnique Federale de Lausanne; SuizaFil: Ruales Lonfat, Cristina. Ecole Polytechnique Federale de Lausanne; SuizaFil: Castro, Camilo. Ecole Polytechnique Federale de Lausanne; SuizaFil: Pulgarin, Cesar. Ecole Polytechnique Federale de Lausanne; SuizaFil: Rengifo Herrera, Julian Andres. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Investigación y Desarrollo En Ciencias Aplicadas "Dr. Jorge J. Ronco". Universidad Nacional de la Plata. Facultad de Ciencias Exactas. Centro de Investigación y Desarrollo en Ciencias Aplicadas; ArgentinaFil: Lavanchy, Jean-Claude. Universite de Lausanne; SuizaFil: Kiwi, John. Ecole Polytechnique Federale de Lausanne; SuizaElsevier Science Sa2011-05-30info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/16233Osorio Vargas, Paula; Sanjines, Rosendo; Ruales Lonfat, Cristina; Castro, Camilo; Pulgarin, Cesar; et al.; Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP); Elsevier Science Sa; Journal Of Photochemistry And Photobiology A-chemistry; 220; 1; 30-5-2011; 70-761010-6030enginfo:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S1010603011001274info:eu-repo/semantics/altIdentifier/doi/10.1016/j.jphotochem.2011.03.022info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-10T13:18:01Zoai:ri.conicet.gov.ar:11336/16233instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-10 13:18:02.019CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
title Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
spellingShingle Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
Osorio Vargas, Paula
Bipolar-Asymmetric Pulsed Magnetron
Sputtering
E. Coli
Cu-Ions
Cotton
title_short Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
title_full Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
title_fullStr Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
title_full_unstemmed Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
title_sort Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP)
dc.creator.none.fl_str_mv Osorio Vargas, Paula
Sanjines, Rosendo
Ruales Lonfat, Cristina
Castro, Camilo
Pulgarin, Cesar
Rengifo Herrera, Julian Andres
Lavanchy, Jean-Claude
Kiwi, John
author Osorio Vargas, Paula
author_facet Osorio Vargas, Paula
Sanjines, Rosendo
Ruales Lonfat, Cristina
Castro, Camilo
Pulgarin, Cesar
Rengifo Herrera, Julian Andres
Lavanchy, Jean-Claude
Kiwi, John
author_role author
author2 Sanjines, Rosendo
Ruales Lonfat, Cristina
Castro, Camilo
Pulgarin, Cesar
Rengifo Herrera, Julian Andres
Lavanchy, Jean-Claude
Kiwi, John
author2_role author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Bipolar-Asymmetric Pulsed Magnetron
Sputtering
E. Coli
Cu-Ions
Cotton
topic Bipolar-Asymmetric Pulsed Magnetron
Sputtering
E. Coli
Cu-Ions
Cotton
purl_subject.fl_str_mv https://purl.org/becyt/ford/2.5
https://purl.org/becyt/ford/2
dc.description.none.fl_txt_mv Cu-cotton fabrics were functionalized by bipolar asymmetric DC-pulse magnetron sputtering (DCP). The DCP of Cu-particles on cotton proceeds at a higher energy than DC-magnetron sputtering (DC). The different sputtering mode showed effects on the structure of the Cu-film on the textile. The Cu-layer thickness was observed to be a function of DCP time being the rate of atomic deposition of 2.5 × 10 15 atoms/cm2 sat 300mA. The fastest Escherichia coli inactivation was observed within 10min when Cu was sputtered on cotton Cu for 60s. This led to a film thickness of 30nm (150 Cu-layers) with 1.7×10 17 atoms/cm 2. The Cu-textiles became darker at longer sputtering times as detected by diffuse reflectance spectroscopy (DRS). By transmission electron spectroscopy (TEM), Cu-particles 35–50nm in size were found and became more compact on the cotton surface as a function of deposition time. X-ray photoelectron spectroscopy (XPS) was used to determine the surface atomic concentration of O, Cu C, and N along the states of oxidation of the Cu-ions during the redox process leading to E. coli inactivation. The oxidation of the E. coli on the Cu-cotton surface was a function of reaction time and was monitored by the oxidation index of the carbon species on the fabric according to the ratio: (C–OH)/(C–C, C C, C–H). The increase in hydrophobicity of the Cu-cotton was followed as a function of the contact angle and droplet residence time for different samples. The results obtained for the E. coli inactivation on the Cu-films are discussed suggesting a possible reaction mechanism.
Fil: Osorio Vargas, Paula. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Sanjines, Rosendo. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Ruales Lonfat, Cristina. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Castro, Camilo. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Pulgarin, Cesar. Ecole Polytechnique Federale de Lausanne; Suiza
Fil: Rengifo Herrera, Julian Andres. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Investigación y Desarrollo En Ciencias Aplicadas "Dr. Jorge J. Ronco". Universidad Nacional de la Plata. Facultad de Ciencias Exactas. Centro de Investigación y Desarrollo en Ciencias Aplicadas; Argentina
Fil: Lavanchy, Jean-Claude. Universite de Lausanne; Suiza
Fil: Kiwi, John. Ecole Polytechnique Federale de Lausanne; Suiza
description Cu-cotton fabrics were functionalized by bipolar asymmetric DC-pulse magnetron sputtering (DCP). The DCP of Cu-particles on cotton proceeds at a higher energy than DC-magnetron sputtering (DC). The different sputtering mode showed effects on the structure of the Cu-film on the textile. The Cu-layer thickness was observed to be a function of DCP time being the rate of atomic deposition of 2.5 × 10 15 atoms/cm2 sat 300mA. The fastest Escherichia coli inactivation was observed within 10min when Cu was sputtered on cotton Cu for 60s. This led to a film thickness of 30nm (150 Cu-layers) with 1.7×10 17 atoms/cm 2. The Cu-textiles became darker at longer sputtering times as detected by diffuse reflectance spectroscopy (DRS). By transmission electron spectroscopy (TEM), Cu-particles 35–50nm in size were found and became more compact on the cotton surface as a function of deposition time. X-ray photoelectron spectroscopy (XPS) was used to determine the surface atomic concentration of O, Cu C, and N along the states of oxidation of the Cu-ions during the redox process leading to E. coli inactivation. The oxidation of the E. coli on the Cu-cotton surface was a function of reaction time and was monitored by the oxidation index of the carbon species on the fabric according to the ratio: (C–OH)/(C–C, C C, C–H). The increase in hydrophobicity of the Cu-cotton was followed as a function of the contact angle and droplet residence time for different samples. The results obtained for the E. coli inactivation on the Cu-films are discussed suggesting a possible reaction mechanism.
publishDate 2011
dc.date.none.fl_str_mv 2011-05-30
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/16233
Osorio Vargas, Paula; Sanjines, Rosendo; Ruales Lonfat, Cristina; Castro, Camilo; Pulgarin, Cesar; et al.; Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP); Elsevier Science Sa; Journal Of Photochemistry And Photobiology A-chemistry; 220; 1; 30-5-2011; 70-76
1010-6030
url http://hdl.handle.net/11336/16233
identifier_str_mv Osorio Vargas, Paula; Sanjines, Rosendo; Ruales Lonfat, Cristina; Castro, Camilo; Pulgarin, Cesar; et al.; Antimicrobial Cu-functionalized surfaces prepared by bipolar asymmetric DC-pulsed magnetron sputtering (DCP); Elsevier Science Sa; Journal Of Photochemistry And Photobiology A-chemistry; 220; 1; 30-5-2011; 70-76
1010-6030
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S1010603011001274
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.jphotochem.2011.03.022
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier Science Sa
publisher.none.fl_str_mv Elsevier Science Sa
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1842980986151763968
score 12.993085

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