Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films

Autores
Franco Arias, Lina Maria; Zambrano, G.; Gómez, M. E.; Camps, E.; Escobar Alarcón, L.
Año de publicación
2012
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
In the present work titanium dioxide (TiO2) thin films were grown by d.c. reactive magnetron sputtering process, systematically varying the Ar/O2 ratio in the gas mixture, in order to study the influence of the oxygen partial pressure on the crystallographic structure and photocatalytic activity of the TiO2 thin films. After the sputtering process the TiO2 coatings were nitrided in a microwave (f= 2.45 GHz) Electron Cyclotron Resonance (ECR) plasma discharge in pure nitrogen, to compare the photocatalytic activity of undoped and nitrogen-doped TiO2 thin films. The crystal structure of the TiO2 grown samples was studied by x-ray diffraction (XRD) and the presence of the anatase phase in these films were corroborated by Raman spectroscopy. On the other hand, X-ray photoelectron spectroscopy (XPS) measurements carried out in the nitrogen-doped TiO2 samples, showed that the nitrogen was incorporated to the films with an average concentration of 18 at% of N. The UV-Vis optical spectroscopy allowed calculating the band gap. A narrowing of the optical band gap from 3.2 eV for the undoped films to 2.5 eV for the N-doped films was observed. Photocatalytic activity tests were done using a methylene blue (MB) dye solution. The irradiation of the films in the MB dye solution was carried out with an emission lamp in the UV and in the visible range for undoped and N-doped TiO2 films, respectively. The results showed that the N-doped TiO2 films had a higher photocalytic activity in the visible range, reaching a greater MB degradation in comparison with undoped samples, which were subjected to a higher energy radiation.
Fil: Franco Arias, Lina Maria. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad del Valle; Colombia
Fil: Zambrano, G.. Universidad del Valle; Colombia
Fil: Gómez, M. E.. Universidad del Valle; Colombia
Fil: Camps, E.. Instituto Nacional de Investigaciones Nucleares; México
Fil: Escobar Alarcón, L.. Instituto Nacional de Investigaciones Nucleares; México
Materia
Titanium dioxide
Magnetron sputtering
Photocatalytic activity
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/21043
Acceder
id CONICETDig_3c98dc63e4bac209448c080f1981ffc4
oai_identifier_str oai:ri.conicet.gov.ar:11336/21043
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin filmsFranco Arias, Lina MariaZambrano, G.Gómez, M. E.Camps, E.Escobar Alarcón, L.Titanium dioxideMagnetron sputteringPhotocatalytic activityhttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1In the present work titanium dioxide (TiO2) thin films were grown by d.c. reactive magnetron sputtering process, systematically varying the Ar/O2 ratio in the gas mixture, in order to study the influence of the oxygen partial pressure on the crystallographic structure and photocatalytic activity of the TiO2 thin films. After the sputtering process the TiO2 coatings were nitrided in a microwave (f= 2.45 GHz) Electron Cyclotron Resonance (ECR) plasma discharge in pure nitrogen, to compare the photocatalytic activity of undoped and nitrogen-doped TiO2 thin films. The crystal structure of the TiO2 grown samples was studied by x-ray diffraction (XRD) and the presence of the anatase phase in these films were corroborated by Raman spectroscopy. On the other hand, X-ray photoelectron spectroscopy (XPS) measurements carried out in the nitrogen-doped TiO2 samples, showed that the nitrogen was incorporated to the films with an average concentration of 18 at% of N. The UV-Vis optical spectroscopy allowed calculating the band gap. A narrowing of the optical band gap from 3.2 eV for the undoped films to 2.5 eV for the N-doped films was observed. Photocatalytic activity tests were done using a methylene blue (MB) dye solution. The irradiation of the films in the MB dye solution was carried out with an emission lamp in the UV and in the visible range for undoped and N-doped TiO2 films, respectively. The results showed that the N-doped TiO2 films had a higher photocalytic activity in the visible range, reaching a greater MB degradation in comparison with undoped samples, which were subjected to a higher energy radiation.Fil: Franco Arias, Lina Maria. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad del Valle; ColombiaFil: Zambrano, G.. Universidad del Valle; ColombiaFil: Gómez, M. E.. Universidad del Valle; ColombiaFil: Camps, E.. Instituto Nacional de Investigaciones Nucleares; MéxicoFil: Escobar Alarcón, L.. Instituto Nacional de Investigaciones Nucleares; MéxicoSociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales2012info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/21043Franco Arias, Lina Maria; Zambrano, G.; Gómez, M. E.; Camps, E.; Escobar Alarcón, L.; Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films; Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales; Revista Superficies y Vacio; 25; 3; 2012; 161-1651665-3521CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/http://smctsm.org.mx/ojs/index.php/SyV/article/view/198info:eu-repo/semantics/altIdentifier/url/http://www.redalyc.org/articulo.oa?id=94224555003info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-03T10:10:40Zoai:ri.conicet.gov.ar:11336/21043instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-03 10:10:40.91CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
title Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
spellingShingle Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
Franco Arias, Lina Maria
Titanium dioxide
Magnetron sputtering
Photocatalytic activity
title_short Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
title_full Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
title_fullStr Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
title_full_unstemmed Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
title_sort Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films
dc.creator.none.fl_str_mv Franco Arias, Lina Maria
Zambrano, G.
Gómez, M. E.
Camps, E.
Escobar Alarcón, L.
author Franco Arias, Lina Maria
author_facet Franco Arias, Lina Maria
Zambrano, G.
Gómez, M. E.
Camps, E.
Escobar Alarcón, L.
author_role author
author2 Zambrano, G.
Gómez, M. E.
Camps, E.
Escobar Alarcón, L.
author2_role author
author
author
author
dc.subject.none.fl_str_mv Titanium dioxide
Magnetron sputtering
Photocatalytic activity
topic Titanium dioxide
Magnetron sputtering
Photocatalytic activity
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv In the present work titanium dioxide (TiO2) thin films were grown by d.c. reactive magnetron sputtering process, systematically varying the Ar/O2 ratio in the gas mixture, in order to study the influence of the oxygen partial pressure on the crystallographic structure and photocatalytic activity of the TiO2 thin films. After the sputtering process the TiO2 coatings were nitrided in a microwave (f= 2.45 GHz) Electron Cyclotron Resonance (ECR) plasma discharge in pure nitrogen, to compare the photocatalytic activity of undoped and nitrogen-doped TiO2 thin films. The crystal structure of the TiO2 grown samples was studied by x-ray diffraction (XRD) and the presence of the anatase phase in these films were corroborated by Raman spectroscopy. On the other hand, X-ray photoelectron spectroscopy (XPS) measurements carried out in the nitrogen-doped TiO2 samples, showed that the nitrogen was incorporated to the films with an average concentration of 18 at% of N. The UV-Vis optical spectroscopy allowed calculating the band gap. A narrowing of the optical band gap from 3.2 eV for the undoped films to 2.5 eV for the N-doped films was observed. Photocatalytic activity tests were done using a methylene blue (MB) dye solution. The irradiation of the films in the MB dye solution was carried out with an emission lamp in the UV and in the visible range for undoped and N-doped TiO2 films, respectively. The results showed that the N-doped TiO2 films had a higher photocalytic activity in the visible range, reaching a greater MB degradation in comparison with undoped samples, which were subjected to a higher energy radiation.
Fil: Franco Arias, Lina Maria. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad del Valle; Colombia
Fil: Zambrano, G.. Universidad del Valle; Colombia
Fil: Gómez, M. E.. Universidad del Valle; Colombia
Fil: Camps, E.. Instituto Nacional de Investigaciones Nucleares; México
Fil: Escobar Alarcón, L.. Instituto Nacional de Investigaciones Nucleares; México
description In the present work titanium dioxide (TiO2) thin films were grown by d.c. reactive magnetron sputtering process, systematically varying the Ar/O2 ratio in the gas mixture, in order to study the influence of the oxygen partial pressure on the crystallographic structure and photocatalytic activity of the TiO2 thin films. After the sputtering process the TiO2 coatings were nitrided in a microwave (f= 2.45 GHz) Electron Cyclotron Resonance (ECR) plasma discharge in pure nitrogen, to compare the photocatalytic activity of undoped and nitrogen-doped TiO2 thin films. The crystal structure of the TiO2 grown samples was studied by x-ray diffraction (XRD) and the presence of the anatase phase in these films were corroborated by Raman spectroscopy. On the other hand, X-ray photoelectron spectroscopy (XPS) measurements carried out in the nitrogen-doped TiO2 samples, showed that the nitrogen was incorporated to the films with an average concentration of 18 at% of N. The UV-Vis optical spectroscopy allowed calculating the band gap. A narrowing of the optical band gap from 3.2 eV for the undoped films to 2.5 eV for the N-doped films was observed. Photocatalytic activity tests were done using a methylene blue (MB) dye solution. The irradiation of the films in the MB dye solution was carried out with an emission lamp in the UV and in the visible range for undoped and N-doped TiO2 films, respectively. The results showed that the N-doped TiO2 films had a higher photocalytic activity in the visible range, reaching a greater MB degradation in comparison with undoped samples, which were subjected to a higher energy radiation.
publishDate 2012
dc.date.none.fl_str_mv 2012
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/21043
Franco Arias, Lina Maria; Zambrano, G.; Gómez, M. E.; Camps, E.; Escobar Alarcón, L.; Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films; Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales; Revista Superficies y Vacio; 25; 3; 2012; 161-165
1665-3521
CONICET Digital
CONICET
url http://hdl.handle.net/11336/21043
identifier_str_mv Franco Arias, Lina Maria; Zambrano, G.; Gómez, M. E.; Camps, E.; Escobar Alarcón, L.; Photocatalytic activity of nitrogen-doped and undoped titanium dioxide sputtered thin films; Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales; Revista Superficies y Vacio; 25; 3; 2012; 161-165
1665-3521
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/http://smctsm.org.mx/ojs/index.php/SyV/article/view/198
info:eu-repo/semantics/altIdentifier/url/http://www.redalyc.org/articulo.oa?id=94224555003
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales
publisher.none.fl_str_mv Sociedad Mexicana de Ciencia y Tecnología de Superficies y Materiales
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1842270129647255552
score 13.13397

Publicaciones similares