Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures
- Autores
- Benvenuto, Ariel Gastón; Buitrago, Roman Horacio; Schmidt, Javier Alejandro
- Año de publicación
- 2012
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (poly-Si) by chemical vapor deposition from trichlorosilane at temperatures between 740 and 870 ºC. By using scanning electron microscopy an average grain size lower than 0.4 μm was observed, with a columnar structure suitable for the electrical conduction in photovoltaic cells. X-ray diffraction reveals a strong (2 2 0) preferential orientation of the films, which is indicative of a low density of intra-grain defects. Atomic force microscope images reveal a conical structure, with a root mean square roughness of 65 nm for samples of around 3 μm in thickness. This natural texture is a positive characteristic from the point of view of light trapping. By using boron tribromide as a doping agent, degrees of doping ranging from intrinsic to clearly p-doped were obtained, as shown by dark conductivity measurements as a function of temperature. The process, the reactants and the substrate used are of low cost and proved to be adequate for direct poly-Si deposition.
Fil: Benvenuto, Ariel Gastón. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; Argentina
Fil: Buitrago, Roman Horacio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; Argentina
Fil: Schmidt, Javier Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; Argentina - Materia
-
Silicio Policristalino
Cvd
Clorosilanos - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
- Repositorio
- Institución
- Consejo Nacional de Investigaciones Científicas y Técnicas
- OAI Identificador
- oai:ri.conicet.gov.ar:11336/18824
Ver los metadatos del registro completo
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Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperaturesBenvenuto, Ariel GastónBuitrago, Roman HoracioSchmidt, Javier AlejandroSilicio PolicristalinoCvdClorosilanoshttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (poly-Si) by chemical vapor deposition from trichlorosilane at temperatures between 740 and 870 ºC. By using scanning electron microscopy an average grain size lower than 0.4 μm was observed, with a columnar structure suitable for the electrical conduction in photovoltaic cells. X-ray diffraction reveals a strong (2 2 0) preferential orientation of the films, which is indicative of a low density of intra-grain defects. Atomic force microscope images reveal a conical structure, with a root mean square roughness of 65 nm for samples of around 3 μm in thickness. This natural texture is a positive characteristic from the point of view of light trapping. By using boron tribromide as a doping agent, degrees of doping ranging from intrinsic to clearly p-doped were obtained, as shown by dark conductivity measurements as a function of temperature. The process, the reactants and the substrate used are of low cost and proved to be adequate for direct poly-Si deposition.Fil: Benvenuto, Ariel Gastón. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; ArgentinaFil: Buitrago, Roman Horacio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; ArgentinaFil: Schmidt, Javier Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; ArgentinaEdp Sciences2012-05info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/18824Benvenuto, Ariel Gastón; Buitrago, Roman Horacio; Schmidt, Javier Alejandro; Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures; Edp Sciences; European Physical Journal Applied Physics; 58; 5-2012; 201011-2010171286-0042CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/https://epjap.epj.org/articles/epjap/abs/2012/05/ap110311/ap110311.htmlinfo:eu-repo/semantics/altIdentifier/doi/10.1051/epjap/2012110311info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-03T09:59:15Zoai:ri.conicet.gov.ar:11336/18824instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-03 09:59:15.566CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse |
dc.title.none.fl_str_mv |
Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures |
title |
Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures |
spellingShingle |
Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures Benvenuto, Ariel Gastón Silicio Policristalino Cvd Clorosilanos |
title_short |
Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures |
title_full |
Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures |
title_fullStr |
Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures |
title_full_unstemmed |
Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures |
title_sort |
Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures |
dc.creator.none.fl_str_mv |
Benvenuto, Ariel Gastón Buitrago, Roman Horacio Schmidt, Javier Alejandro |
author |
Benvenuto, Ariel Gastón |
author_facet |
Benvenuto, Ariel Gastón Buitrago, Roman Horacio Schmidt, Javier Alejandro |
author_role |
author |
author2 |
Buitrago, Roman Horacio Schmidt, Javier Alejandro |
author2_role |
author author |
dc.subject.none.fl_str_mv |
Silicio Policristalino Cvd Clorosilanos |
topic |
Silicio Policristalino Cvd Clorosilanos |
purl_subject.fl_str_mv |
https://purl.org/becyt/ford/1.3 https://purl.org/becyt/ford/1 |
dc.description.none.fl_txt_mv |
We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (poly-Si) by chemical vapor deposition from trichlorosilane at temperatures between 740 and 870 ºC. By using scanning electron microscopy an average grain size lower than 0.4 μm was observed, with a columnar structure suitable for the electrical conduction in photovoltaic cells. X-ray diffraction reveals a strong (2 2 0) preferential orientation of the films, which is indicative of a low density of intra-grain defects. Atomic force microscope images reveal a conical structure, with a root mean square roughness of 65 nm for samples of around 3 μm in thickness. This natural texture is a positive characteristic from the point of view of light trapping. By using boron tribromide as a doping agent, degrees of doping ranging from intrinsic to clearly p-doped were obtained, as shown by dark conductivity measurements as a function of temperature. The process, the reactants and the substrate used are of low cost and proved to be adequate for direct poly-Si deposition. Fil: Benvenuto, Ariel Gastón. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; Argentina Fil: Buitrago, Roman Horacio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; Argentina Fil: Schmidt, Javier Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico Para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico Para la Industria Química; Argentina |
description |
We show that commercial float glass can be used as a substrate to deposit polycrystalline silicon (poly-Si) by chemical vapor deposition from trichlorosilane at temperatures between 740 and 870 ºC. By using scanning electron microscopy an average grain size lower than 0.4 μm was observed, with a columnar structure suitable for the electrical conduction in photovoltaic cells. X-ray diffraction reveals a strong (2 2 0) preferential orientation of the films, which is indicative of a low density of intra-grain defects. Atomic force microscope images reveal a conical structure, with a root mean square roughness of 65 nm for samples of around 3 μm in thickness. This natural texture is a positive characteristic from the point of view of light trapping. By using boron tribromide as a doping agent, degrees of doping ranging from intrinsic to clearly p-doped were obtained, as shown by dark conductivity measurements as a function of temperature. The process, the reactants and the substrate used are of low cost and proved to be adequate for direct poly-Si deposition. |
publishDate |
2012 |
dc.date.none.fl_str_mv |
2012-05 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
http://hdl.handle.net/11336/18824 Benvenuto, Ariel Gastón; Buitrago, Roman Horacio; Schmidt, Javier Alejandro; Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures; Edp Sciences; European Physical Journal Applied Physics; 58; 5-2012; 201011-201017 1286-0042 CONICET Digital CONICET |
url |
http://hdl.handle.net/11336/18824 |
identifier_str_mv |
Benvenuto, Ariel Gastón; Buitrago, Roman Horacio; Schmidt, Javier Alejandro; Polycrystalline silicon thin films on glass deposited from chlorosilanes at intermediate temperatures; Edp Sciences; European Physical Journal Applied Physics; 58; 5-2012; 201011-201017 1286-0042 CONICET Digital CONICET |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
info:eu-repo/semantics/altIdentifier/url/https://epjap.epj.org/articles/epjap/abs/2012/05/ap110311/ap110311.html info:eu-repo/semantics/altIdentifier/doi/10.1051/epjap/2012110311 |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by-nc-sa/2.5/ar/ |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/ |
dc.format.none.fl_str_mv |
application/pdf application/pdf |
dc.publisher.none.fl_str_mv |
Edp Sciences |
publisher.none.fl_str_mv |
Edp Sciences |
dc.source.none.fl_str_mv |
reponame:CONICET Digital (CONICET) instname:Consejo Nacional de Investigaciones Científicas y Técnicas |
reponame_str |
CONICET Digital (CONICET) |
collection |
CONICET Digital (CONICET) |
instname_str |
Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.name.fl_str_mv |
CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.mail.fl_str_mv |
dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar |
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1842269570313748480 |
score |
13.13397 |