Annealing effects on photoresist films' mechanical and chemical resistance

Autores
Avellaneda, Manuel; Boasso, Andrés; Sirena, Martin; Roa Díaz, Simón Andre
Año de publicación
2023
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Nowadays, photoresist-based films are used by photolithography techniques for the fabrication of micro/nanodevices in the modern nanotechnology industry. The impact of thermal-induced polymerization on the mechanical resistance of these materials is critical for improving both the mechanical and the chemical performance. In this work, we present a systematic study of the annealing effects on the mechanical resistance (thermally-induced material hardening) of MICROPOSIT™ photoresist films. The mechanical properties were studied by depth-sensing nanoindentation technique using an atomic force microscope. Results show the films' plastic strain susceptibility decreases as the annealing temperature increases, implying an improvement of their mechanical resistance by thermal-induced polymerization. Strain energy dissipation coefficients decreased from 0.725 up to 0.525 as the annealing temperature was increased from 60 up to 200 °C, demonstrating this point. Indentation hardness results were consistent with this behavior, observing an increase from 0.12 up to 0.23 [GPa] for the highest annealing temperature. Annealing-induced hardening seems to be correlated with the films' resistance to wet chemical etching, observing higher chemical resistance for higher annealing temperatures. The observed increase of the mechanical and chemical resistance of the photoresists with annealing becomes of great importance for their application in the development of novel micro and nanostructures.
Fil: Avellaneda, Manuel. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; Argentina
Fil: Boasso, Andrés. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; Argentina
Fil: Sirena, Martin. Consejo Nacional de Investigaciones Cientificas y Tecnicas. Oficina de Coordinacion Administrativa Ciudad Universitaria. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche | Comision Nacional de Energia Atomica. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche.; Argentina
Fil: Roa Díaz, Simón Andre. Consejo Nacional de Investigaciones Cientificas y Tecnicas. Oficina de Coordinacion Administrativa Ciudad Universitaria. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche | Comision Nacional de Energia Atomica. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche.; Argentina
Materia
ATOMIC FORCE MICROSCOPY
DEPTH-SENSING NANOINDENTATION
MECHANICAL PROPERTIES
PHOTORESIST FILMS
Nivel de accesibilidad
acceso embargado
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/228516
Acceder
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oai_identifier_str oai:ri.conicet.gov.ar:11336/228516
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Annealing effects on photoresist films' mechanical and chemical resistanceAvellaneda, ManuelBoasso, AndrésSirena, MartinRoa Díaz, Simón AndreATOMIC FORCE MICROSCOPYDEPTH-SENSING NANOINDENTATIONMECHANICAL PROPERTIESPHOTORESIST FILMShttps://purl.org/becyt/ford/2.5https://purl.org/becyt/ford/2Nowadays, photoresist-based films are used by photolithography techniques for the fabrication of micro/nanodevices in the modern nanotechnology industry. The impact of thermal-induced polymerization on the mechanical resistance of these materials is critical for improving both the mechanical and the chemical performance. In this work, we present a systematic study of the annealing effects on the mechanical resistance (thermally-induced material hardening) of MICROPOSIT™ photoresist films. The mechanical properties were studied by depth-sensing nanoindentation technique using an atomic force microscope. Results show the films' plastic strain susceptibility decreases as the annealing temperature increases, implying an improvement of their mechanical resistance by thermal-induced polymerization. Strain energy dissipation coefficients decreased from 0.725 up to 0.525 as the annealing temperature was increased from 60 up to 200 °C, demonstrating this point. Indentation hardness results were consistent with this behavior, observing an increase from 0.12 up to 0.23 [GPa] for the highest annealing temperature. Annealing-induced hardening seems to be correlated with the films' resistance to wet chemical etching, observing higher chemical resistance for higher annealing temperatures. The observed increase of the mechanical and chemical resistance of the photoresists with annealing becomes of great importance for their application in the development of novel micro and nanostructures.Fil: Avellaneda, Manuel. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; ArgentinaFil: Boasso, Andrés. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; ArgentinaFil: Sirena, Martin. Consejo Nacional de Investigaciones Cientificas y Tecnicas. Oficina de Coordinacion Administrativa Ciudad Universitaria. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche | Comision Nacional de Energia Atomica. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche.; ArgentinaFil: Roa Díaz, Simón Andre. Consejo Nacional de Investigaciones Cientificas y Tecnicas. Oficina de Coordinacion Administrativa Ciudad Universitaria. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche | Comision Nacional de Energia Atomica. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche.; ArgentinaElsevier2023-10info:eu-repo/date/embargoEnd/2024-04-27info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/228516Avellaneda, Manuel; Boasso, Andrés; Sirena, Martin; Roa Díaz, Simón Andre; Annealing effects on photoresist films' mechanical and chemical resistance; Elsevier; Surfaces and Interfaces; 41; 10-2023; 1-72468-0230CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/https://linkinghub.elsevier.com/retrieve/pii/S2468023023005515info:eu-repo/semantics/altIdentifier/doi/10.1016/j.surfin.2023.103181info:eu-repo/semantics/embargoedAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T09:47:31Zoai:ri.conicet.gov.ar:11336/228516instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 09:47:32.069CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Annealing effects on photoresist films' mechanical and chemical resistance
title Annealing effects on photoresist films' mechanical and chemical resistance
spellingShingle Annealing effects on photoresist films' mechanical and chemical resistance
Avellaneda, Manuel
ATOMIC FORCE MICROSCOPY
DEPTH-SENSING NANOINDENTATION
MECHANICAL PROPERTIES
PHOTORESIST FILMS
title_short Annealing effects on photoresist films' mechanical and chemical resistance
title_full Annealing effects on photoresist films' mechanical and chemical resistance
title_fullStr Annealing effects on photoresist films' mechanical and chemical resistance
title_full_unstemmed Annealing effects on photoresist films' mechanical and chemical resistance
title_sort Annealing effects on photoresist films' mechanical and chemical resistance
dc.creator.none.fl_str_mv Avellaneda, Manuel
Boasso, Andrés
Sirena, Martin
Roa Díaz, Simón Andre
author Avellaneda, Manuel
author_facet Avellaneda, Manuel
Boasso, Andrés
Sirena, Martin
Roa Díaz, Simón Andre
author_role author
author2 Boasso, Andrés
Sirena, Martin
Roa Díaz, Simón Andre
author2_role author
author
author
dc.subject.none.fl_str_mv ATOMIC FORCE MICROSCOPY
DEPTH-SENSING NANOINDENTATION
MECHANICAL PROPERTIES
PHOTORESIST FILMS
topic ATOMIC FORCE MICROSCOPY
DEPTH-SENSING NANOINDENTATION
MECHANICAL PROPERTIES
PHOTORESIST FILMS
purl_subject.fl_str_mv https://purl.org/becyt/ford/2.5
https://purl.org/becyt/ford/2
dc.description.none.fl_txt_mv Nowadays, photoresist-based films are used by photolithography techniques for the fabrication of micro/nanodevices in the modern nanotechnology industry. The impact of thermal-induced polymerization on the mechanical resistance of these materials is critical for improving both the mechanical and the chemical performance. In this work, we present a systematic study of the annealing effects on the mechanical resistance (thermally-induced material hardening) of MICROPOSIT™ photoresist films. The mechanical properties were studied by depth-sensing nanoindentation technique using an atomic force microscope. Results show the films' plastic strain susceptibility decreases as the annealing temperature increases, implying an improvement of their mechanical resistance by thermal-induced polymerization. Strain energy dissipation coefficients decreased from 0.725 up to 0.525 as the annealing temperature was increased from 60 up to 200 °C, demonstrating this point. Indentation hardness results were consistent with this behavior, observing an increase from 0.12 up to 0.23 [GPa] for the highest annealing temperature. Annealing-induced hardening seems to be correlated with the films' resistance to wet chemical etching, observing higher chemical resistance for higher annealing temperatures. The observed increase of the mechanical and chemical resistance of the photoresists with annealing becomes of great importance for their application in the development of novel micro and nanostructures.
Fil: Avellaneda, Manuel. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; Argentina
Fil: Boasso, Andrés. Comisión Nacional de Energía Atómica. Gerencia del Área de Energía Nuclear. Instituto Balseiro; Argentina
Fil: Sirena, Martin. Consejo Nacional de Investigaciones Cientificas y Tecnicas. Oficina de Coordinacion Administrativa Ciudad Universitaria. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche | Comision Nacional de Energia Atomica. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche.; Argentina
Fil: Roa Díaz, Simón Andre. Consejo Nacional de Investigaciones Cientificas y Tecnicas. Oficina de Coordinacion Administrativa Ciudad Universitaria. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche | Comision Nacional de Energia Atomica. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia. Unidad Ejecutora Instituto de Nanociencia y Nanotecnologia - Nodo Bariloche.; Argentina
description Nowadays, photoresist-based films are used by photolithography techniques for the fabrication of micro/nanodevices in the modern nanotechnology industry. The impact of thermal-induced polymerization on the mechanical resistance of these materials is critical for improving both the mechanical and the chemical performance. In this work, we present a systematic study of the annealing effects on the mechanical resistance (thermally-induced material hardening) of MICROPOSIT™ photoresist films. The mechanical properties were studied by depth-sensing nanoindentation technique using an atomic force microscope. Results show the films' plastic strain susceptibility decreases as the annealing temperature increases, implying an improvement of their mechanical resistance by thermal-induced polymerization. Strain energy dissipation coefficients decreased from 0.725 up to 0.525 as the annealing temperature was increased from 60 up to 200 °C, demonstrating this point. Indentation hardness results were consistent with this behavior, observing an increase from 0.12 up to 0.23 [GPa] for the highest annealing temperature. Annealing-induced hardening seems to be correlated with the films' resistance to wet chemical etching, observing higher chemical resistance for higher annealing temperatures. The observed increase of the mechanical and chemical resistance of the photoresists with annealing becomes of great importance for their application in the development of novel micro and nanostructures.
publishDate 2023
dc.date.none.fl_str_mv 2023-10
info:eu-repo/date/embargoEnd/2024-04-27
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/228516
Avellaneda, Manuel; Boasso, Andrés; Sirena, Martin; Roa Díaz, Simón Andre; Annealing effects on photoresist films' mechanical and chemical resistance; Elsevier; Surfaces and Interfaces; 41; 10-2023; 1-7
2468-0230
CONICET Digital
CONICET
url http://hdl.handle.net/11336/228516
identifier_str_mv Avellaneda, Manuel; Boasso, Andrés; Sirena, Martin; Roa Díaz, Simón Andre; Annealing effects on photoresist films' mechanical and chemical resistance; Elsevier; Surfaces and Interfaces; 41; 10-2023; 1-7
2468-0230
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/https://linkinghub.elsevier.com/retrieve/pii/S2468023023005515
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.surfin.2023.103181
dc.rights.none.fl_str_mv info:eu-repo/semantics/embargoedAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv embargoedAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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score 13.070432

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