Cita APA

Avellaneda, M., Boasso, A., Sirena, M., & Roa Díaz, S. A. (2023). Annealing effects on photoresist films' mechanical and chemical resistance. Web

Citación estilo Chicago

Avellaneda, Manuel, Andrés Boasso, Martin Sirena, and Simón Andre Roa Díaz. Annealing Effects On Photoresist Films' Mechanical and Chemical Resistance. 2023.

Cita MLA

Avellaneda, Manuel, Andrés Boasso, Martin Sirena, and Simón Andre Roa Díaz. Annealing Effects On Photoresist Films' Mechanical and Chemical Resistance. 2023.