Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy

Autores
Brusa, R. S.; Mariazzi, S.; Ravelli, L.; Mazzoldi, P.; Mattei, G.; Egger, W.; Hugenschmidt, C.; Löwe, B.; Pikart, P.; Macchi, Carlos Eugenio; Somoza, Alberto Horacio
Año de publicación
2010
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Positron Annihilation Spectroscopy (PAS) performed with continuous and pulsed positron beams allows to characterize the size of the intrinsic nano-voids in silica glass, their in depth modification after ion implantation and their decoration by implanted ions. Three complementary PAS techniques, lifetime spectroscopy (LS), Doppler broadening spectroscopy (DBS) and coincidence Doppler broadening spectroscopy (CDBS) will be illustrated by presenting, as a case study, measurements obtained on virgin and gold implanted silica glass.
Fil: Brusa, R. S.. Universita degli Studi di Trento; Italia
Fil: Mariazzi, S.. Universita degli Studi di Trento; Italia
Fil: Ravelli, L.. Universita degli Studi di Trento; Italia
Fil: Mazzoldi, P.. Università di Padova; Italia
Fil: Mattei, G.. Università di Padova; Italia
Fil: Egger, W.. Universität der Bunderswehr München; Alemania
Fil: Hugenschmidt, C.. Technische Universitat München; Alemania
Fil: Löwe, B.. Technische Universitat München; Alemania
Fil: Pikart, P.. Technische Universitat München; Alemania
Fil: Macchi, Carlos Eugenio. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tandil; Argentina
Fil: Somoza, Alberto Horacio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tandil; Argentina. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina
Materia
Silica glass
Positronium
Positrons
Ion implantation
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/245152
Acceder
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oai_identifier_str oai:ri.conicet.gov.ar:11336/245152
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Study of defects in implanted silica glass by depth profiling Positron Annihilation SpectroscopyBrusa, R. S.Mariazzi, S.Ravelli, L.Mazzoldi, P.Mattei, G.Egger, W.Hugenschmidt, C.Löwe, B.Pikart, P.Macchi, Carlos EugenioSomoza, Alberto HoracioSilica glassPositroniumPositronsIon implantationhttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1Positron Annihilation Spectroscopy (PAS) performed with continuous and pulsed positron beams allows to characterize the size of the intrinsic nano-voids in silica glass, their in depth modification after ion implantation and their decoration by implanted ions. Three complementary PAS techniques, lifetime spectroscopy (LS), Doppler broadening spectroscopy (DBS) and coincidence Doppler broadening spectroscopy (CDBS) will be illustrated by presenting, as a case study, measurements obtained on virgin and gold implanted silica glass.Fil: Brusa, R. S.. Universita degli Studi di Trento; ItaliaFil: Mariazzi, S.. Universita degli Studi di Trento; ItaliaFil: Ravelli, L.. Universita degli Studi di Trento; ItaliaFil: Mazzoldi, P.. Università di Padova; ItaliaFil: Mattei, G.. Università di Padova; ItaliaFil: Egger, W.. Universität der Bunderswehr München; AlemaniaFil: Hugenschmidt, C.. Technische Universitat München; AlemaniaFil: Löwe, B.. Technische Universitat München; AlemaniaFil: Pikart, P.. Technische Universitat München; AlemaniaFil: Macchi, Carlos Eugenio. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tandil; ArgentinaFil: Somoza, Alberto Horacio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tandil; Argentina. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; ArgentinaElsevier Science2010-10info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/245152Brusa, R. S.; Mariazzi, S.; Ravelli, L.; Mazzoldi, P.; Mattei, G.; et al.; Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy; Elsevier Science; Beam Interactions with Materials and Atoms; 268; 19; 10-2010; 3186-31900168-583XCONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1016/j.nimb.2010.05.084info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-22T11:54:38Zoai:ri.conicet.gov.ar:11336/245152instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-22 11:54:38.888CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
title Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
spellingShingle Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
Brusa, R. S.
Silica glass
Positronium
Positrons
Ion implantation
title_short Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
title_full Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
title_fullStr Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
title_full_unstemmed Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
title_sort Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy
dc.creator.none.fl_str_mv Brusa, R. S.
Mariazzi, S.
Ravelli, L.
Mazzoldi, P.
Mattei, G.
Egger, W.
Hugenschmidt, C.
Löwe, B.
Pikart, P.
Macchi, Carlos Eugenio
Somoza, Alberto Horacio
author Brusa, R. S.
author_facet Brusa, R. S.
Mariazzi, S.
Ravelli, L.
Mazzoldi, P.
Mattei, G.
Egger, W.
Hugenschmidt, C.
Löwe, B.
Pikart, P.
Macchi, Carlos Eugenio
Somoza, Alberto Horacio
author_role author
author2 Mariazzi, S.
Ravelli, L.
Mazzoldi, P.
Mattei, G.
Egger, W.
Hugenschmidt, C.
Löwe, B.
Pikart, P.
Macchi, Carlos Eugenio
Somoza, Alberto Horacio
author2_role author
author
author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Silica glass
Positronium
Positrons
Ion implantation
topic Silica glass
Positronium
Positrons
Ion implantation
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv Positron Annihilation Spectroscopy (PAS) performed with continuous and pulsed positron beams allows to characterize the size of the intrinsic nano-voids in silica glass, their in depth modification after ion implantation and their decoration by implanted ions. Three complementary PAS techniques, lifetime spectroscopy (LS), Doppler broadening spectroscopy (DBS) and coincidence Doppler broadening spectroscopy (CDBS) will be illustrated by presenting, as a case study, measurements obtained on virgin and gold implanted silica glass.
Fil: Brusa, R. S.. Universita degli Studi di Trento; Italia
Fil: Mariazzi, S.. Universita degli Studi di Trento; Italia
Fil: Ravelli, L.. Universita degli Studi di Trento; Italia
Fil: Mazzoldi, P.. Università di Padova; Italia
Fil: Mattei, G.. Università di Padova; Italia
Fil: Egger, W.. Universität der Bunderswehr München; Alemania
Fil: Hugenschmidt, C.. Technische Universitat München; Alemania
Fil: Löwe, B.. Technische Universitat München; Alemania
Fil: Pikart, P.. Technische Universitat München; Alemania
Fil: Macchi, Carlos Eugenio. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tandil; Argentina
Fil: Somoza, Alberto Horacio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tandil; Argentina. Universidad Nacional del Centro de la Provincia de Buenos Aires. Facultad de Ciencias Exactas. Instituto de Física de Materiales; Argentina
description Positron Annihilation Spectroscopy (PAS) performed with continuous and pulsed positron beams allows to characterize the size of the intrinsic nano-voids in silica glass, their in depth modification after ion implantation and their decoration by implanted ions. Three complementary PAS techniques, lifetime spectroscopy (LS), Doppler broadening spectroscopy (DBS) and coincidence Doppler broadening spectroscopy (CDBS) will be illustrated by presenting, as a case study, measurements obtained on virgin and gold implanted silica glass.
publishDate 2010
dc.date.none.fl_str_mv 2010-10
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/245152
Brusa, R. S.; Mariazzi, S.; Ravelli, L.; Mazzoldi, P.; Mattei, G.; et al.; Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy; Elsevier Science; Beam Interactions with Materials and Atoms; 268; 19; 10-2010; 3186-3190
0168-583X
CONICET Digital
CONICET
url http://hdl.handle.net/11336/245152
identifier_str_mv Brusa, R. S.; Mariazzi, S.; Ravelli, L.; Mazzoldi, P.; Mattei, G.; et al.; Study of defects in implanted silica glass by depth profiling Positron Annihilation Spectroscopy; Elsevier Science; Beam Interactions with Materials and Atoms; 268; 19; 10-2010; 3186-3190
0168-583X
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/doi/10.1016/j.nimb.2010.05.084
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier Science
publisher.none.fl_str_mv Elsevier Science
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1846782245584502784
score 12.982451

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