Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films

Autores
Reyes Tolosa, M. D.; Alajami, M.; Montero Reguera, A. E.; Damonte, Laura Cristina; Hernández Fenollosa, M. A.
Año de publicación
2019
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The quality and properties of electrodeposited nanostructured ZnO films are improved when they are deposited on a crystal lattice-matching substrate. To this end, a highly conductive indium tin oxide substrate is covered with an interlayer of ZnO using direct-current magnetron sputtering. In this manuscript, we describe the effect of this interlayer on the morphological and optical properties of several nanostructured ZnO films grown by different electrodeposition methods. The thickness of the ZnO interlayer was varied starting from ultrathin layers of 10 nm all the way up to 230 nm as determined by ellipsometry. The structural and optical properties of the nanostructured ZnO films deposited on top of these interlayers were characterized using field emission scanning electron microscopy (FESEM), atomic force microscopy and UV–visible spectroscopy. Optimum properties of the nanostructured ZnO films for application in thin-film optoelectronic devices are obtained when the ZnO interlayer has a thickness of approximately 45 nm. This is the case for all the electrodeposition methods used in this work.
Facultad de Ciencias Exactas
Instituto de Física La Plata
Materia
Ciencias Exactas
ZnO flms
Electrodeposition
DC magnetron sputtering
Optical properties
Nanostructures
Band gap energy
Nivel de accesibilidad
acceso abierto
Condiciones de uso
http://creativecommons.org/licenses/by-nc-sa/4.0/
Repositorio
SEDICI (UNLP)
Institución
Universidad Nacional de La Plata
OAI Identificador
oai:sedici.unlp.edu.ar:10915/123737
Acceder
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oai_identifier_str oai:sedici.unlp.edu.ar:10915/123737
network_acronym_str SEDICI
repository_id_str 1329
network_name_str SEDICI (UNLP)
spelling Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured filmsReyes Tolosa, M. D.Alajami, M.Montero Reguera, A. E.Damonte, Laura CristinaHernández Fenollosa, M. A.Ciencias ExactasZnO flmsElectrodepositionDC magnetron sputteringOptical propertiesNanostructuresBand gap energyThe quality and properties of electrodeposited nanostructured ZnO films are improved when they are deposited on a crystal lattice-matching substrate. To this end, a highly conductive indium tin oxide substrate is covered with an interlayer of ZnO using direct-current magnetron sputtering. In this manuscript, we describe the effect of this interlayer on the morphological and optical properties of several nanostructured ZnO films grown by different electrodeposition methods. The thickness of the ZnO interlayer was varied starting from ultrathin layers of 10 nm all the way up to 230 nm as determined by ellipsometry. The structural and optical properties of the nanostructured ZnO films deposited on top of these interlayers were characterized using field emission scanning electron microscopy (FESEM), atomic force microscopy and UV–visible spectroscopy. Optimum properties of the nanostructured ZnO films for application in thin-film optoelectronic devices are obtained when the ZnO interlayer has a thickness of approximately 45 nm. This is the case for all the electrodeposition methods used in this work.Facultad de Ciencias ExactasInstituto de Física La Plata2019-09-20info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionArticulohttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfhttp://sedici.unlp.edu.ar/handle/10915/123737enginfo:eu-repo/semantics/altIdentifier/issn/2523-3963info:eu-repo/semantics/altIdentifier/issn/2523-3971info:eu-repo/semantics/altIdentifier/doi/10.1007/s42452-019-1293-7info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by-nc-sa/4.0/Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)reponame:SEDICI (UNLP)instname:Universidad Nacional de La Platainstacron:UNLP2025-10-15T11:21:23Zoai:sedici.unlp.edu.ar:10915/123737Institucionalhttp://sedici.unlp.edu.ar/Universidad públicaNo correspondehttp://sedici.unlp.edu.ar/oai/snrdalira@sedici.unlp.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:13292025-10-15 11:21:23.283SEDICI (UNLP) - Universidad Nacional de La Platafalse
dc.title.none.fl_str_mv Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
spellingShingle Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
Reyes Tolosa, M. D.
Ciencias Exactas
ZnO flms
Electrodeposition
DC magnetron sputtering
Optical properties
Nanostructures
Band gap energy
title_short Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_full Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_fullStr Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_full_unstemmed Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
title_sort Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films
dc.creator.none.fl_str_mv Reyes Tolosa, M. D.
Alajami, M.
Montero Reguera, A. E.
Damonte, Laura Cristina
Hernández Fenollosa, M. A.
author Reyes Tolosa, M. D.
author_facet Reyes Tolosa, M. D.
Alajami, M.
Montero Reguera, A. E.
Damonte, Laura Cristina
Hernández Fenollosa, M. A.
author_role author
author2 Alajami, M.
Montero Reguera, A. E.
Damonte, Laura Cristina
Hernández Fenollosa, M. A.
author2_role author
author
author
author
dc.subject.none.fl_str_mv Ciencias Exactas
ZnO flms
Electrodeposition
DC magnetron sputtering
Optical properties
Nanostructures
Band gap energy
topic Ciencias Exactas
ZnO flms
Electrodeposition
DC magnetron sputtering
Optical properties
Nanostructures
Band gap energy
dc.description.none.fl_txt_mv The quality and properties of electrodeposited nanostructured ZnO films are improved when they are deposited on a crystal lattice-matching substrate. To this end, a highly conductive indium tin oxide substrate is covered with an interlayer of ZnO using direct-current magnetron sputtering. In this manuscript, we describe the effect of this interlayer on the morphological and optical properties of several nanostructured ZnO films grown by different electrodeposition methods. The thickness of the ZnO interlayer was varied starting from ultrathin layers of 10 nm all the way up to 230 nm as determined by ellipsometry. The structural and optical properties of the nanostructured ZnO films deposited on top of these interlayers were characterized using field emission scanning electron microscopy (FESEM), atomic force microscopy and UV–visible spectroscopy. Optimum properties of the nanostructured ZnO films for application in thin-film optoelectronic devices are obtained when the ZnO interlayer has a thickness of approximately 45 nm. This is the case for all the electrodeposition methods used in this work.
Facultad de Ciencias Exactas
Instituto de Física La Plata
description The quality and properties of electrodeposited nanostructured ZnO films are improved when they are deposited on a crystal lattice-matching substrate. To this end, a highly conductive indium tin oxide substrate is covered with an interlayer of ZnO using direct-current magnetron sputtering. In this manuscript, we describe the effect of this interlayer on the morphological and optical properties of several nanostructured ZnO films grown by different electrodeposition methods. The thickness of the ZnO interlayer was varied starting from ultrathin layers of 10 nm all the way up to 230 nm as determined by ellipsometry. The structural and optical properties of the nanostructured ZnO films deposited on top of these interlayers were characterized using field emission scanning electron microscopy (FESEM), atomic force microscopy and UV–visible spectroscopy. Optimum properties of the nanostructured ZnO films for application in thin-film optoelectronic devices are obtained when the ZnO interlayer has a thickness of approximately 45 nm. This is the case for all the electrodeposition methods used in this work.
publishDate 2019
dc.date.none.fl_str_mv 2019-09-20
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
Articulo
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://sedici.unlp.edu.ar/handle/10915/123737
url http://sedici.unlp.edu.ar/handle/10915/123737
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/issn/2523-3963
info:eu-repo/semantics/altIdentifier/issn/2523-3971
info:eu-repo/semantics/altIdentifier/doi/10.1007/s42452-019-1293-7
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by-nc-sa/4.0/
Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by-nc-sa/4.0/
Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:SEDICI (UNLP)
instname:Universidad Nacional de La Plata
instacron:UNLP
reponame_str SEDICI (UNLP)
collection SEDICI (UNLP)
instname_str Universidad Nacional de La Plata
instacron_str UNLP
institution UNLP
repository.name.fl_str_mv SEDICI (UNLP) - Universidad Nacional de La Plata
repository.mail.fl_str_mv alira@sedici.unlp.edu.ar
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score 13.22299

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