Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
- Autores
- Azzaroni, Omar; Fonticelli, Mariano Hernán; Schilardi, Patricia Laura; Benitez, Guillermo Alfredo; Caretti, I.; Albella, José M.; Gago, Raúl; Vázquez, Luis; Salvarezza, Roberto Carlos
- Año de publicación
- 2004
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- Nanostructuring of metallic and semiconductor surfaces in the sub-100 nm range is a key point in the development of future technologies. In this work we describe a simple and low-cost method for metal nanostructuring with 50 nm lateral and 6 nm vertical resolutions based on metal film deposition on a silane-derivatized nanostructured silicon master. The silane monolayer anti-sticking properties allow nanopattern transfer from the master to the deposited metal films as well as easy film detachment. The method is non-destructive, allowing the use of the derivatized master several times without damaging. Potential applications of the method are in the field of high-density data storage, heterogeneous catalysis and electrocatalysis, microanalysis (sensors and biosensors) and new optical devices.
Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas - Materia
-
Química
Física
nanostructuring
metallic and semiconductor surfaces
metal - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- http://creativecommons.org/licenses/by/3.0/
- Repositorio
.jpg)
- Institución
- Universidad Nacional de La Plata
- OAI Identificador
- oai:sedici.unlp.edu.ar:10915/159818
Ver los metadatos del registro completo
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Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodotsAzzaroni, OmarFonticelli, Mariano HernánSchilardi, Patricia LauraBenitez, Guillermo AlfredoCaretti, I.Albella, José M.Gago, RaúlVázquez, LuisSalvarezza, Roberto CarlosQuímicaFísicananostructuringmetallic and semiconductor surfacesmetalNanostructuring of metallic and semiconductor surfaces in the sub-100 nm range is a key point in the development of future technologies. In this work we describe a simple and low-cost method for metal nanostructuring with 50 nm lateral and 6 nm vertical resolutions based on metal film deposition on a silane-derivatized nanostructured silicon master. The silane monolayer anti-sticking properties allow nanopattern transfer from the master to the deposited metal films as well as easy film detachment. The method is non-destructive, allowing the use of the derivatized master several times without damaging. Potential applications of the method are in the field of high-density data storage, heterogeneous catalysis and electrocatalysis, microanalysis (sensors and biosensors) and new optical devices.Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas2004-04info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionArticulohttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfS197-S200http://sedici.unlp.edu.ar/handle/10915/159818enginfo:eu-repo/semantics/altIdentifier/issn/0957-4484info:eu-repo/semantics/altIdentifier/issn/1361-6528info:eu-repo/semantics/altIdentifier/doi/10.1088/0957-4484/15/4/014info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by/3.0/Creative Commons Attribution 3.0 Unported (CC BY 3.0)reponame:SEDICI (UNLP)instname:Universidad Nacional de La Platainstacron:UNLP2025-10-22T17:22:43Zoai:sedici.unlp.edu.ar:10915/159818Institucionalhttp://sedici.unlp.edu.ar/Universidad públicaNo correspondehttp://sedici.unlp.edu.ar/oai/snrdalira@sedici.unlp.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:13292025-10-22 17:22:44.067SEDICI (UNLP) - Universidad Nacional de La Platafalse |
| dc.title.none.fl_str_mv |
Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots |
| title |
Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots |
| spellingShingle |
Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots Azzaroni, Omar Química Física nanostructuring metallic and semiconductor surfaces metal |
| title_short |
Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots |
| title_full |
Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots |
| title_fullStr |
Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots |
| title_full_unstemmed |
Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots |
| title_sort |
Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots |
| dc.creator.none.fl_str_mv |
Azzaroni, Omar Fonticelli, Mariano Hernán Schilardi, Patricia Laura Benitez, Guillermo Alfredo Caretti, I. Albella, José M. Gago, Raúl Vázquez, Luis Salvarezza, Roberto Carlos |
| author |
Azzaroni, Omar |
| author_facet |
Azzaroni, Omar Fonticelli, Mariano Hernán Schilardi, Patricia Laura Benitez, Guillermo Alfredo Caretti, I. Albella, José M. Gago, Raúl Vázquez, Luis Salvarezza, Roberto Carlos |
| author_role |
author |
| author2 |
Fonticelli, Mariano Hernán Schilardi, Patricia Laura Benitez, Guillermo Alfredo Caretti, I. Albella, José M. Gago, Raúl Vázquez, Luis Salvarezza, Roberto Carlos |
| author2_role |
author author author author author author author author |
| dc.subject.none.fl_str_mv |
Química Física nanostructuring metallic and semiconductor surfaces metal |
| topic |
Química Física nanostructuring metallic and semiconductor surfaces metal |
| dc.description.none.fl_txt_mv |
Nanostructuring of metallic and semiconductor surfaces in the sub-100 nm range is a key point in the development of future technologies. In this work we describe a simple and low-cost method for metal nanostructuring with 50 nm lateral and 6 nm vertical resolutions based on metal film deposition on a silane-derivatized nanostructured silicon master. The silane monolayer anti-sticking properties allow nanopattern transfer from the master to the deposited metal films as well as easy film detachment. The method is non-destructive, allowing the use of the derivatized master several times without damaging. Potential applications of the method are in the field of high-density data storage, heterogeneous catalysis and electrocatalysis, microanalysis (sensors and biosensors) and new optical devices. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas |
| description |
Nanostructuring of metallic and semiconductor surfaces in the sub-100 nm range is a key point in the development of future technologies. In this work we describe a simple and low-cost method for metal nanostructuring with 50 nm lateral and 6 nm vertical resolutions based on metal film deposition on a silane-derivatized nanostructured silicon master. The silane monolayer anti-sticking properties allow nanopattern transfer from the master to the deposited metal films as well as easy film detachment. The method is non-destructive, allowing the use of the derivatized master several times without damaging. Potential applications of the method are in the field of high-density data storage, heterogeneous catalysis and electrocatalysis, microanalysis (sensors and biosensors) and new optical devices. |
| publishDate |
2004 |
| dc.date.none.fl_str_mv |
2004-04 |
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info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion Articulo http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
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article |
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publishedVersion |
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http://sedici.unlp.edu.ar/handle/10915/159818 |
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| dc.language.none.fl_str_mv |
eng |
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eng |
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