Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots

Autores
Azzaroni, Omar; Fonticelli, Mariano Hernán; Schilardi, Patricia Laura; Benitez, Guillermo Alfredo; Caretti, I.; Albella, José M.; Gago, Raúl; Vázquez, Luis; Salvarezza, Roberto Carlos
Año de publicación
2004
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Nanostructuring of metallic and semiconductor surfaces in the sub-100 nm range is a key point in the development of future technologies. In this work we describe a simple and low-cost method for metal nanostructuring with 50 nm lateral and 6 nm vertical resolutions based on metal film deposition on a silane-derivatized nanostructured silicon master. The silane monolayer anti-sticking properties allow nanopattern transfer from the master to the deposited metal films as well as easy film detachment. The method is non-destructive, allowing the use of the derivatized master several times without damaging. Potential applications of the method are in the field of high-density data storage, heterogeneous catalysis and electrocatalysis, microanalysis (sensors and biosensors) and new optical devices.
Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas
Materia
Química
Física
nanostructuring
metallic and semiconductor surfaces
metal
Nivel de accesibilidad
acceso abierto
Condiciones de uso
http://creativecommons.org/licenses/by/3.0/
Repositorio
SEDICI (UNLP)
Institución
Universidad Nacional de La Plata
OAI Identificador
oai:sedici.unlp.edu.ar:10915/159818

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network_name_str SEDICI (UNLP)
spelling Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodotsAzzaroni, OmarFonticelli, Mariano HernánSchilardi, Patricia LauraBenitez, Guillermo AlfredoCaretti, I.Albella, José M.Gago, RaúlVázquez, LuisSalvarezza, Roberto CarlosQuímicaFísicananostructuringmetallic and semiconductor surfacesmetalNanostructuring of metallic and semiconductor surfaces in the sub-100 nm range is a key point in the development of future technologies. In this work we describe a simple and low-cost method for metal nanostructuring with 50 nm lateral and 6 nm vertical resolutions based on metal film deposition on a silane-derivatized nanostructured silicon master. The silane monolayer anti-sticking properties allow nanopattern transfer from the master to the deposited metal films as well as easy film detachment. The method is non-destructive, allowing the use of the derivatized master several times without damaging. Potential applications of the method are in the field of high-density data storage, heterogeneous catalysis and electrocatalysis, microanalysis (sensors and biosensors) and new optical devices.Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas2004-04info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionArticulohttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfS197-S200http://sedici.unlp.edu.ar/handle/10915/159818enginfo:eu-repo/semantics/altIdentifier/issn/0957-4484info:eu-repo/semantics/altIdentifier/issn/1361-6528info:eu-repo/semantics/altIdentifier/doi/10.1088/0957-4484/15/4/014info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by/3.0/Creative Commons Attribution 3.0 Unported (CC BY 3.0)reponame:SEDICI (UNLP)instname:Universidad Nacional de La Platainstacron:UNLP2025-09-29T11:41:47Zoai:sedici.unlp.edu.ar:10915/159818Institucionalhttp://sedici.unlp.edu.ar/Universidad públicaNo correspondehttp://sedici.unlp.edu.ar/oai/snrdalira@sedici.unlp.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:13292025-09-29 11:41:47.654SEDICI (UNLP) - Universidad Nacional de La Platafalse
dc.title.none.fl_str_mv Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
title Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
spellingShingle Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
Azzaroni, Omar
Química
Física
nanostructuring
metallic and semiconductor surfaces
metal
title_short Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
title_full Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
title_fullStr Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
title_full_unstemmed Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
title_sort Surface nanopatterning of metal thin films by physical vapour deposition onto surface-modified silicon nanodots
dc.creator.none.fl_str_mv Azzaroni, Omar
Fonticelli, Mariano Hernán
Schilardi, Patricia Laura
Benitez, Guillermo Alfredo
Caretti, I.
Albella, José M.
Gago, Raúl
Vázquez, Luis
Salvarezza, Roberto Carlos
author Azzaroni, Omar
author_facet Azzaroni, Omar
Fonticelli, Mariano Hernán
Schilardi, Patricia Laura
Benitez, Guillermo Alfredo
Caretti, I.
Albella, José M.
Gago, Raúl
Vázquez, Luis
Salvarezza, Roberto Carlos
author_role author
author2 Fonticelli, Mariano Hernán
Schilardi, Patricia Laura
Benitez, Guillermo Alfredo
Caretti, I.
Albella, José M.
Gago, Raúl
Vázquez, Luis
Salvarezza, Roberto Carlos
author2_role author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Química
Física
nanostructuring
metallic and semiconductor surfaces
metal
topic Química
Física
nanostructuring
metallic and semiconductor surfaces
metal
dc.description.none.fl_txt_mv Nanostructuring of metallic and semiconductor surfaces in the sub-100 nm range is a key point in the development of future technologies. In this work we describe a simple and low-cost method for metal nanostructuring with 50 nm lateral and 6 nm vertical resolutions based on metal film deposition on a silane-derivatized nanostructured silicon master. The silane monolayer anti-sticking properties allow nanopattern transfer from the master to the deposited metal films as well as easy film detachment. The method is non-destructive, allowing the use of the derivatized master several times without damaging. Potential applications of the method are in the field of high-density data storage, heterogeneous catalysis and electrocatalysis, microanalysis (sensors and biosensors) and new optical devices.
Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas
description Nanostructuring of metallic and semiconductor surfaces in the sub-100 nm range is a key point in the development of future technologies. In this work we describe a simple and low-cost method for metal nanostructuring with 50 nm lateral and 6 nm vertical resolutions based on metal film deposition on a silane-derivatized nanostructured silicon master. The silane monolayer anti-sticking properties allow nanopattern transfer from the master to the deposited metal films as well as easy film detachment. The method is non-destructive, allowing the use of the derivatized master several times without damaging. Potential applications of the method are in the field of high-density data storage, heterogeneous catalysis and electrocatalysis, microanalysis (sensors and biosensors) and new optical devices.
publishDate 2004
dc.date.none.fl_str_mv 2004-04
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
Articulo
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://sedici.unlp.edu.ar/handle/10915/159818
url http://sedici.unlp.edu.ar/handle/10915/159818
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/issn/0957-4484
info:eu-repo/semantics/altIdentifier/issn/1361-6528
info:eu-repo/semantics/altIdentifier/doi/10.1088/0957-4484/15/4/014
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by/3.0/
Creative Commons Attribution 3.0 Unported (CC BY 3.0)
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by/3.0/
Creative Commons Attribution 3.0 Unported (CC BY 3.0)
dc.format.none.fl_str_mv application/pdf
S197-S200
dc.source.none.fl_str_mv reponame:SEDICI (UNLP)
instname:Universidad Nacional de La Plata
instacron:UNLP
reponame_str SEDICI (UNLP)
collection SEDICI (UNLP)
instname_str Universidad Nacional de La Plata
instacron_str UNLP
institution UNLP
repository.name.fl_str_mv SEDICI (UNLP) - Universidad Nacional de La Plata
repository.mail.fl_str_mv alira@sedici.unlp.edu.ar
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