Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers

Autores
Ramos, José Angel; Espósito, Leandro Hernan; Fernández, Raquel; Zalakain, Iñaki; Goyanes, Silvia Nair; Avgeropoulos, Apostolos; Zafeiropoulos, Nikolaos E.; Kortaberria, Galder; Mondragon, Iñaki
Año de publicación
2012
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The gradient on block copolymer concentration through film thickness as well as the effects of casting solvents used on the nanostructuring of a thermosetting epoxy coating modified with an epoxidized poly(styrene-b- butadiene-b-styrene) (SBS) triblock copolymer was studied by means of atomic force microscopy and attenuated total reflectance infrared spectroscopy. Thin coating films based on a commercial epoxy-amine formulation consisting of diglycidyl ether of bisphenol A and a low-temperature fast curing amine were modified with several amounts of epoxidized SBS triblock copolymer. Toluene and a mixture of tetrahydrofuran and N,N-dimethylformamide were used as casting solvents. With epoxidation degrees higher than 45 mol % of polybutadiene block nanostructuring was achieved. Fast curing rate of the epoxy/amine system and the comparatively slow evaporation rate of the casting solvent led to a gradient of morphologies through the film cross section owing to the coalescence of small micelles into larger micellar domains in the case of low block copolymer content. For these reasons, different morphologies were also obtained in the midtransverse section of a film with variable thickness. Finally, pseudolamellar nanostructure at high copolymer contents was achieved as confirmed by parallel and perpendicular cuttings to the air/polymer interface. © 2012 American Chemical Society.
Fil: Ramos, José Angel. Universidad del País Vasco; España
Fil: Espósito, Leandro Hernan. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad del País Vasco; España
Fil: Fernández, Raquel. Universidad del País Vasco; España
Fil: Zalakain, Iñaki. Universidad del País Vasco; España
Fil: Goyanes, Silvia Nair. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Física. Laboratorio de Polímeros y Materiales Compuestos; Argentina
Fil: Avgeropoulos, Apostolos. University of Ioannina; Grecia
Fil: Zafeiropoulos, Nikolaos E.. University of Ioannina; Grecia
Fil: Kortaberria, Galder. Universidad del País Vasco; España
Fil: Mondragon, Iñaki. Universidad del País Vasco; España
Materia
Block Copolymer
Sbs
Nanostructuring
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/54979
Acceder
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oai_identifier_str oai:ri.conicet.gov.ar:11336/54979
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymersRamos, José AngelEspósito, Leandro HernanFernández, RaquelZalakain, IñakiGoyanes, Silvia NairAvgeropoulos, ApostolosZafeiropoulos, Nikolaos E.Kortaberria, GalderMondragon, IñakiBlock CopolymerSbsNanostructuringhttps://purl.org/becyt/ford/2.10https://purl.org/becyt/ford/2The gradient on block copolymer concentration through film thickness as well as the effects of casting solvents used on the nanostructuring of a thermosetting epoxy coating modified with an epoxidized poly(styrene-b- butadiene-b-styrene) (SBS) triblock copolymer was studied by means of atomic force microscopy and attenuated total reflectance infrared spectroscopy. Thin coating films based on a commercial epoxy-amine formulation consisting of diglycidyl ether of bisphenol A and a low-temperature fast curing amine were modified with several amounts of epoxidized SBS triblock copolymer. Toluene and a mixture of tetrahydrofuran and N,N-dimethylformamide were used as casting solvents. With epoxidation degrees higher than 45 mol % of polybutadiene block nanostructuring was achieved. Fast curing rate of the epoxy/amine system and the comparatively slow evaporation rate of the casting solvent led to a gradient of morphologies through the film cross section owing to the coalescence of small micelles into larger micellar domains in the case of low block copolymer content. For these reasons, different morphologies were also obtained in the midtransverse section of a film with variable thickness. Finally, pseudolamellar nanostructure at high copolymer contents was achieved as confirmed by parallel and perpendicular cuttings to the air/polymer interface. © 2012 American Chemical Society.Fil: Ramos, José Angel. Universidad del País Vasco; EspañaFil: Espósito, Leandro Hernan. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad del País Vasco; EspañaFil: Fernández, Raquel. Universidad del País Vasco; EspañaFil: Zalakain, Iñaki. Universidad del País Vasco; EspañaFil: Goyanes, Silvia Nair. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Física. Laboratorio de Polímeros y Materiales Compuestos; ArgentinaFil: Avgeropoulos, Apostolos. University of Ioannina; GreciaFil: Zafeiropoulos, Nikolaos E.. University of Ioannina; GreciaFil: Kortaberria, Galder. Universidad del País Vasco; EspañaFil: Mondragon, Iñaki. Universidad del País Vasco; EspañaAmerican Chemical Society2012-02info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/54979Ramos, José Angel; Espósito, Leandro Hernan; Fernández, Raquel; Zalakain, Iñaki; Goyanes, Silvia Nair; et al.; Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers; American Chemical Society; Macromolecules; 45; 3; 2-2012; 1483-14910024-9297CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1021/ma2018759info:eu-repo/semantics/altIdentifier/url/https://pubs.acs.org/doi/abs/10.1021/ma2018759info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T10:18:38Zoai:ri.conicet.gov.ar:11336/54979instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 10:18:39.246CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
title Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
spellingShingle Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
Ramos, José Angel
Block Copolymer
Sbs
Nanostructuring
title_short Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
title_full Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
title_fullStr Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
title_full_unstemmed Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
title_sort Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers
dc.creator.none.fl_str_mv Ramos, José Angel
Espósito, Leandro Hernan
Fernández, Raquel
Zalakain, Iñaki
Goyanes, Silvia Nair
Avgeropoulos, Apostolos
Zafeiropoulos, Nikolaos E.
Kortaberria, Galder
Mondragon, Iñaki
author Ramos, José Angel
author_facet Ramos, José Angel
Espósito, Leandro Hernan
Fernández, Raquel
Zalakain, Iñaki
Goyanes, Silvia Nair
Avgeropoulos, Apostolos
Zafeiropoulos, Nikolaos E.
Kortaberria, Galder
Mondragon, Iñaki
author_role author
author2 Espósito, Leandro Hernan
Fernández, Raquel
Zalakain, Iñaki
Goyanes, Silvia Nair
Avgeropoulos, Apostolos
Zafeiropoulos, Nikolaos E.
Kortaberria, Galder
Mondragon, Iñaki
author2_role author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Block Copolymer
Sbs
Nanostructuring
topic Block Copolymer
Sbs
Nanostructuring
purl_subject.fl_str_mv https://purl.org/becyt/ford/2.10
https://purl.org/becyt/ford/2
dc.description.none.fl_txt_mv The gradient on block copolymer concentration through film thickness as well as the effects of casting solvents used on the nanostructuring of a thermosetting epoxy coating modified with an epoxidized poly(styrene-b- butadiene-b-styrene) (SBS) triblock copolymer was studied by means of atomic force microscopy and attenuated total reflectance infrared spectroscopy. Thin coating films based on a commercial epoxy-amine formulation consisting of diglycidyl ether of bisphenol A and a low-temperature fast curing amine were modified with several amounts of epoxidized SBS triblock copolymer. Toluene and a mixture of tetrahydrofuran and N,N-dimethylformamide were used as casting solvents. With epoxidation degrees higher than 45 mol % of polybutadiene block nanostructuring was achieved. Fast curing rate of the epoxy/amine system and the comparatively slow evaporation rate of the casting solvent led to a gradient of morphologies through the film cross section owing to the coalescence of small micelles into larger micellar domains in the case of low block copolymer content. For these reasons, different morphologies were also obtained in the midtransverse section of a film with variable thickness. Finally, pseudolamellar nanostructure at high copolymer contents was achieved as confirmed by parallel and perpendicular cuttings to the air/polymer interface. © 2012 American Chemical Society.
Fil: Ramos, José Angel. Universidad del País Vasco; España
Fil: Espósito, Leandro Hernan. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad del País Vasco; España
Fil: Fernández, Raquel. Universidad del País Vasco; España
Fil: Zalakain, Iñaki. Universidad del País Vasco; España
Fil: Goyanes, Silvia Nair. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Física. Laboratorio de Polímeros y Materiales Compuestos; Argentina
Fil: Avgeropoulos, Apostolos. University of Ioannina; Grecia
Fil: Zafeiropoulos, Nikolaos E.. University of Ioannina; Grecia
Fil: Kortaberria, Galder. Universidad del País Vasco; España
Fil: Mondragon, Iñaki. Universidad del País Vasco; España
description The gradient on block copolymer concentration through film thickness as well as the effects of casting solvents used on the nanostructuring of a thermosetting epoxy coating modified with an epoxidized poly(styrene-b- butadiene-b-styrene) (SBS) triblock copolymer was studied by means of atomic force microscopy and attenuated total reflectance infrared spectroscopy. Thin coating films based on a commercial epoxy-amine formulation consisting of diglycidyl ether of bisphenol A and a low-temperature fast curing amine were modified with several amounts of epoxidized SBS triblock copolymer. Toluene and a mixture of tetrahydrofuran and N,N-dimethylformamide were used as casting solvents. With epoxidation degrees higher than 45 mol % of polybutadiene block nanostructuring was achieved. Fast curing rate of the epoxy/amine system and the comparatively slow evaporation rate of the casting solvent led to a gradient of morphologies through the film cross section owing to the coalescence of small micelles into larger micellar domains in the case of low block copolymer content. For these reasons, different morphologies were also obtained in the midtransverse section of a film with variable thickness. Finally, pseudolamellar nanostructure at high copolymer contents was achieved as confirmed by parallel and perpendicular cuttings to the air/polymer interface. © 2012 American Chemical Society.
publishDate 2012
dc.date.none.fl_str_mv 2012-02
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/54979
Ramos, José Angel; Espósito, Leandro Hernan; Fernández, Raquel; Zalakain, Iñaki; Goyanes, Silvia Nair; et al.; Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers; American Chemical Society; Macromolecules; 45; 3; 2-2012; 1483-1491
0024-9297
CONICET Digital
CONICET
url http://hdl.handle.net/11336/54979
identifier_str_mv Ramos, José Angel; Espósito, Leandro Hernan; Fernández, Raquel; Zalakain, Iñaki; Goyanes, Silvia Nair; et al.; Block copolymer concentration gradient and solvent effects on nanostructuring of thin epoxy coatings modified with epoxidized styrene-butadiene-styrene block copolymers; American Chemical Society; Macromolecules; 45; 3; 2-2012; 1483-1491
0024-9297
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/doi/10.1021/ma2018759
info:eu-repo/semantics/altIdentifier/url/https://pubs.acs.org/doi/abs/10.1021/ma2018759
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv American Chemical Society
publisher.none.fl_str_mv American Chemical Society
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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score 13.070432

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