Surface nanopatterning of hard and soft thin films by a replica-molding approach
- Autores
- Vázquez, Luis; Auger, M. A.; Azzaroni, Omar; Schilardi, Patricia Laura; Gago, R.; Fonticelli, Mariano Hernán; Sánchez, O.; Salvarezza, Roberto Carlos; Albella, J. M.
- Año de publicación
- 2004
- Idioma
- inglés
- Tipo de recurso
- documento de conferencia
- Estado
- versión publicada
- Descripción
- In this work, we report on our recent results obtained by a replica-molding approach for large-scale surface nanopatterning. Two materials with quite different mechanical properties have been naopatterned, namely: titanium nitride (TiN) films deposited by reactive sputtering and polystyrene films deposited by the casting procedure. In order to explore the capabilities of this strategy we have used in both cases as master surfaces to be replicated silicon surfaces previously nanostructured by low-energy ion-beam sputtering. The original template pattern was formed by an array of silicon lenticular nanodots, 6 nm of average height and 40-50 nm of lateral size, displaying short-range hexagonal order.
Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas - Materia
-
Física
Nanotecnología - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- http://creativecommons.org/licenses/by-nc-sa/4.0/
- Repositorio
- Institución
- Universidad Nacional de La Plata
- OAI Identificador
- oai:sedici.unlp.edu.ar:10915/123986
Ver los metadatos del registro completo
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Surface nanopatterning of hard and soft thin films by a replica-molding approachVázquez, LuisAuger, M. A.Azzaroni, OmarSchilardi, Patricia LauraGago, R.Fonticelli, Mariano HernánSánchez, O.Salvarezza, Roberto CarlosAlbella, J. M.FísicaNanotecnologíaIn this work, we report on our recent results obtained by a replica-molding approach for large-scale surface nanopatterning. Two materials with quite different mechanical properties have been naopatterned, namely: titanium nitride (TiN) films deposited by reactive sputtering and polystyrene films deposited by the casting procedure. In order to explore the capabilities of this strategy we have used in both cases as master surfaces to be replicated silicon surfaces previously nanostructured by low-energy ion-beam sputtering. The original template pattern was formed by an array of silicon lenticular nanodots, 6 nm of average height and 40-50 nm of lateral size, displaying short-range hexagonal order.Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas2004info:eu-repo/semantics/conferenceObjectinfo:eu-repo/semantics/publishedVersionResumenhttp://purl.org/coar/resource_type/c_5794info:ar-repo/semantics/documentoDeConferenciaapplication/pdfhttp://sedici.unlp.edu.ar/handle/10915/123986enginfo:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by-nc-sa/4.0/Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)reponame:SEDICI (UNLP)instname:Universidad Nacional de La Platainstacron:UNLP2025-09-29T11:29:43Zoai:sedici.unlp.edu.ar:10915/123986Institucionalhttp://sedici.unlp.edu.ar/Universidad públicaNo correspondehttp://sedici.unlp.edu.ar/oai/snrdalira@sedici.unlp.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:13292025-09-29 11:29:43.58SEDICI (UNLP) - Universidad Nacional de La Platafalse |
dc.title.none.fl_str_mv |
Surface nanopatterning of hard and soft thin films by a replica-molding approach |
title |
Surface nanopatterning of hard and soft thin films by a replica-molding approach |
spellingShingle |
Surface nanopatterning of hard and soft thin films by a replica-molding approach Vázquez, Luis Física Nanotecnología |
title_short |
Surface nanopatterning of hard and soft thin films by a replica-molding approach |
title_full |
Surface nanopatterning of hard and soft thin films by a replica-molding approach |
title_fullStr |
Surface nanopatterning of hard and soft thin films by a replica-molding approach |
title_full_unstemmed |
Surface nanopatterning of hard and soft thin films by a replica-molding approach |
title_sort |
Surface nanopatterning of hard and soft thin films by a replica-molding approach |
dc.creator.none.fl_str_mv |
Vázquez, Luis Auger, M. A. Azzaroni, Omar Schilardi, Patricia Laura Gago, R. Fonticelli, Mariano Hernán Sánchez, O. Salvarezza, Roberto Carlos Albella, J. M. |
author |
Vázquez, Luis |
author_facet |
Vázquez, Luis Auger, M. A. Azzaroni, Omar Schilardi, Patricia Laura Gago, R. Fonticelli, Mariano Hernán Sánchez, O. Salvarezza, Roberto Carlos Albella, J. M. |
author_role |
author |
author2 |
Auger, M. A. Azzaroni, Omar Schilardi, Patricia Laura Gago, R. Fonticelli, Mariano Hernán Sánchez, O. Salvarezza, Roberto Carlos Albella, J. M. |
author2_role |
author author author author author author author author |
dc.subject.none.fl_str_mv |
Física Nanotecnología |
topic |
Física Nanotecnología |
dc.description.none.fl_txt_mv |
In this work, we report on our recent results obtained by a replica-molding approach for large-scale surface nanopatterning. Two materials with quite different mechanical properties have been naopatterned, namely: titanium nitride (TiN) films deposited by reactive sputtering and polystyrene films deposited by the casting procedure. In order to explore the capabilities of this strategy we have used in both cases as master surfaces to be replicated silicon surfaces previously nanostructured by low-energy ion-beam sputtering. The original template pattern was formed by an array of silicon lenticular nanodots, 6 nm of average height and 40-50 nm of lateral size, displaying short-range hexagonal order. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas |
description |
In this work, we report on our recent results obtained by a replica-molding approach for large-scale surface nanopatterning. Two materials with quite different mechanical properties have been naopatterned, namely: titanium nitride (TiN) films deposited by reactive sputtering and polystyrene films deposited by the casting procedure. In order to explore the capabilities of this strategy we have used in both cases as master surfaces to be replicated silicon surfaces previously nanostructured by low-energy ion-beam sputtering. The original template pattern was formed by an array of silicon lenticular nanodots, 6 nm of average height and 40-50 nm of lateral size, displaying short-range hexagonal order. |
publishDate |
2004 |
dc.date.none.fl_str_mv |
2004 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/conferenceObject info:eu-repo/semantics/publishedVersion Resumen http://purl.org/coar/resource_type/c_5794 info:ar-repo/semantics/documentoDeConferencia |
format |
conferenceObject |
status_str |
publishedVersion |
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http://sedici.unlp.edu.ar/handle/10915/123986 |
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http://sedici.unlp.edu.ar/handle/10915/123986 |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by-nc-sa/4.0/ Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0) |
eu_rights_str_mv |
openAccess |
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http://creativecommons.org/licenses/by-nc-sa/4.0/ Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0) |
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application/pdf |
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