Structural and optical properties of compensated microcrystalline silicon films

Autores
Dussan, A.; Koropecki, Roberto Roman; Arce, Roberto Delio; Schmidt, Javier Alejandro
Año de publicación
2007
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Boron-doped microcrystalline silicon films were deposited in a plasma enhanced chemical vapor deposition (PECVD) system using silane (SiH4) diluted in hydrogen, and diborane (B2H6) as a dopant gas. The effects of the Boron concentration on the optical and structural properties were investigated by the constant-photocurrent method (CPM) and atomic force microscopy (AFM) measurements. The variations in the optical constants (refractive index, absorption coefficient and optical gap) as a function of wavelength were carried out from the optical transmission and CPM spectra. By increasing the doping level, a systematic increase in the absorption coefficient spectra in the low-energy region between 0.7 - 1.2 eV was observed. It was found that the increase of Boron concentration in the samples results in changes of the grain size. Correlations between optical properties and the density of states (DOS) were also studied.
Fil: Dussan, A.. Universidad Nacional de Colombia; Colombia
Fil: Koropecki, Roberto Roman. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Arce, Roberto Delio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Schmidt, Javier Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Materia
MICROCRYSTALLINE SILICON
AFM
STRUCTURAL PROPERTIES
THIN FILMS
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/25942

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network_name_str CONICET Digital (CONICET)
spelling Structural and optical properties of compensated microcrystalline silicon filmsDussan, A.Koropecki, Roberto RomanArce, Roberto DelioSchmidt, Javier AlejandroMICROCRYSTALLINE SILICONAFMSTRUCTURAL PROPERTIESTHIN FILMShttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1Boron-doped microcrystalline silicon films were deposited in a plasma enhanced chemical vapor deposition (PECVD) system using silane (SiH4) diluted in hydrogen, and diborane (B2H6) as a dopant gas. The effects of the Boron concentration on the optical and structural properties were investigated by the constant-photocurrent method (CPM) and atomic force microscopy (AFM) measurements. The variations in the optical constants (refractive index, absorption coefficient and optical gap) as a function of wavelength were carried out from the optical transmission and CPM spectra. By increasing the doping level, a systematic increase in the absorption coefficient spectra in the low-energy region between 0.7 - 1.2 eV was observed. It was found that the increase of Boron concentration in the samples results in changes of the grain size. Correlations between optical properties and the density of states (DOS) were also studied.Fil: Dussan, A.. Universidad Nacional de Colombia; ColombiaFil: Koropecki, Roberto Roman. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaFil: Arce, Roberto Delio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaFil: Schmidt, Javier Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaSociedad Mexicana de Fisica2007-12info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/25942Dussan, A.; Koropecki, Roberto Roman; Arce, Roberto Delio; Schmidt, Javier Alejandro; Structural and optical properties of compensated microcrystalline silicon films; Sociedad Mexicana de Fisica; Revista Mexicana de Física; 53; 7; 12-2007; 253-2550035-001XCONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/https://rmf.smf.mx/pdf/rmf-s/53/7/53_7_253.pdfinfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-03T09:44:32Zoai:ri.conicet.gov.ar:11336/25942instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-03 09:44:32.505CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Structural and optical properties of compensated microcrystalline silicon films
title Structural and optical properties of compensated microcrystalline silicon films
spellingShingle Structural and optical properties of compensated microcrystalline silicon films
Dussan, A.
MICROCRYSTALLINE SILICON
AFM
STRUCTURAL PROPERTIES
THIN FILMS
title_short Structural and optical properties of compensated microcrystalline silicon films
title_full Structural and optical properties of compensated microcrystalline silicon films
title_fullStr Structural and optical properties of compensated microcrystalline silicon films
title_full_unstemmed Structural and optical properties of compensated microcrystalline silicon films
title_sort Structural and optical properties of compensated microcrystalline silicon films
dc.creator.none.fl_str_mv Dussan, A.
Koropecki, Roberto Roman
Arce, Roberto Delio
Schmidt, Javier Alejandro
author Dussan, A.
author_facet Dussan, A.
Koropecki, Roberto Roman
Arce, Roberto Delio
Schmidt, Javier Alejandro
author_role author
author2 Koropecki, Roberto Roman
Arce, Roberto Delio
Schmidt, Javier Alejandro
author2_role author
author
author
dc.subject.none.fl_str_mv MICROCRYSTALLINE SILICON
AFM
STRUCTURAL PROPERTIES
THIN FILMS
topic MICROCRYSTALLINE SILICON
AFM
STRUCTURAL PROPERTIES
THIN FILMS
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv Boron-doped microcrystalline silicon films were deposited in a plasma enhanced chemical vapor deposition (PECVD) system using silane (SiH4) diluted in hydrogen, and diborane (B2H6) as a dopant gas. The effects of the Boron concentration on the optical and structural properties were investigated by the constant-photocurrent method (CPM) and atomic force microscopy (AFM) measurements. The variations in the optical constants (refractive index, absorption coefficient and optical gap) as a function of wavelength were carried out from the optical transmission and CPM spectra. By increasing the doping level, a systematic increase in the absorption coefficient spectra in the low-energy region between 0.7 - 1.2 eV was observed. It was found that the increase of Boron concentration in the samples results in changes of the grain size. Correlations between optical properties and the density of states (DOS) were also studied.
Fil: Dussan, A.. Universidad Nacional de Colombia; Colombia
Fil: Koropecki, Roberto Roman. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Arce, Roberto Delio. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Schmidt, Javier Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
description Boron-doped microcrystalline silicon films were deposited in a plasma enhanced chemical vapor deposition (PECVD) system using silane (SiH4) diluted in hydrogen, and diborane (B2H6) as a dopant gas. The effects of the Boron concentration on the optical and structural properties were investigated by the constant-photocurrent method (CPM) and atomic force microscopy (AFM) measurements. The variations in the optical constants (refractive index, absorption coefficient and optical gap) as a function of wavelength were carried out from the optical transmission and CPM spectra. By increasing the doping level, a systematic increase in the absorption coefficient spectra in the low-energy region between 0.7 - 1.2 eV was observed. It was found that the increase of Boron concentration in the samples results in changes of the grain size. Correlations between optical properties and the density of states (DOS) were also studied.
publishDate 2007
dc.date.none.fl_str_mv 2007-12
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/25942
Dussan, A.; Koropecki, Roberto Roman; Arce, Roberto Delio; Schmidt, Javier Alejandro; Structural and optical properties of compensated microcrystalline silicon films; Sociedad Mexicana de Fisica; Revista Mexicana de Física; 53; 7; 12-2007; 253-255
0035-001X
CONICET Digital
CONICET
url http://hdl.handle.net/11336/25942
identifier_str_mv Dussan, A.; Koropecki, Roberto Roman; Arce, Roberto Delio; Schmidt, Javier Alejandro; Structural and optical properties of compensated microcrystalline silicon films; Sociedad Mexicana de Fisica; Revista Mexicana de Física; 53; 7; 12-2007; 253-255
0035-001X
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/https://rmf.smf.mx/pdf/rmf-s/53/7/53_7_253.pdf
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Sociedad Mexicana de Fisica
publisher.none.fl_str_mv Sociedad Mexicana de Fisica
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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