Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
- Autores
- Mirabella, D. A.; Suarez, Maria Patricia; Suárez, Gonzalo Pablo; Aldao, Celso Manuel
- Año de publicación
- 2013
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- Surface roughening due to anisotropic wet etching of silicon was studied experimentally and modeled using the Monte Carlo method. Simulations were used to determine the consequences of site-dependent detachment probabilities on surface morphology for a oneand two-dimensional substrate models, focusing on the formation mechanisms of etch hillocks. Dynamic scaling properties of the 1D model were also studied. Resorting to the height?height correlation function and the structure factor, it is shown that the model presents conventional and anomalous scaling (faceted) depending on the stability of the hillocks tops. We also found that there is an intermediate regime that cannot be described by the Family-Vicsek or anomalous scaling ansatz.
Fil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Suarez, Maria Patricia. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Suárez, Gonzalo Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigaciones Físicas de Mar del Plata; Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina - Materia
-
Silicon
Wet Etching
Hillocks
Dynamic Scaling Properties
Scaling
Etching Models
Monte Carlo Simulations - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
- Repositorio
- Institución
- Consejo Nacional de Investigaciones Científicas y Técnicas
- OAI Identificador
- oai:ri.conicet.gov.ar:11336/4949
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Silicon wet etching: hillock formation mechanisms and dynamic scaling propertiesMirabella, D. A.Suarez, Maria PatriciaSuárez, Gonzalo PabloAldao, Celso ManuelSiliconWet EtchingHillocksDynamic Scaling PropertiesScalingEtching ModelsMonte Carlo Simulationshttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1Surface roughening due to anisotropic wet etching of silicon was studied experimentally and modeled using the Monte Carlo method. Simulations were used to determine the consequences of site-dependent detachment probabilities on surface morphology for a oneand two-dimensional substrate models, focusing on the formation mechanisms of etch hillocks. Dynamic scaling properties of the 1D model were also studied. Resorting to the height?height correlation function and the structure factor, it is shown that the model presents conventional and anomalous scaling (faceted) depending on the stability of the hillocks tops. We also found that there is an intermediate regime that cannot be described by the Family-Vicsek or anomalous scaling ansatz.Fil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaFil: Suarez, Maria Patricia. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaFil: Suárez, Gonzalo Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigaciones Físicas de Mar del Plata; Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaFil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaElsevier2013-10-15info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/4949Mirabella, D. A.; Suarez, Maria Patricia; Suárez, Gonzalo Pablo; Aldao, Celso Manuel; Silicon wet etching: hillock formation mechanisms and dynamic scaling properties; Elsevier; Physica A: Statistical Mechanics and its Applications; 395; 15-10-2013; 105-1110378-4371enginfo:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0378437113009874info:eu-repo/semantics/altIdentifier/issn/0378-4371info:eu-repo/semantics/altIdentifier/doi/10.1016/j.physa.2013.09.071info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T10:26:02Zoai:ri.conicet.gov.ar:11336/4949instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 10:26:02.337CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse |
dc.title.none.fl_str_mv |
Silicon wet etching: hillock formation mechanisms and dynamic scaling properties |
title |
Silicon wet etching: hillock formation mechanisms and dynamic scaling properties |
spellingShingle |
Silicon wet etching: hillock formation mechanisms and dynamic scaling properties Mirabella, D. A. Silicon Wet Etching Hillocks Dynamic Scaling Properties Scaling Etching Models Monte Carlo Simulations |
title_short |
Silicon wet etching: hillock formation mechanisms and dynamic scaling properties |
title_full |
Silicon wet etching: hillock formation mechanisms and dynamic scaling properties |
title_fullStr |
Silicon wet etching: hillock formation mechanisms and dynamic scaling properties |
title_full_unstemmed |
Silicon wet etching: hillock formation mechanisms and dynamic scaling properties |
title_sort |
Silicon wet etching: hillock formation mechanisms and dynamic scaling properties |
dc.creator.none.fl_str_mv |
Mirabella, D. A. Suarez, Maria Patricia Suárez, Gonzalo Pablo Aldao, Celso Manuel |
author |
Mirabella, D. A. |
author_facet |
Mirabella, D. A. Suarez, Maria Patricia Suárez, Gonzalo Pablo Aldao, Celso Manuel |
author_role |
author |
author2 |
Suarez, Maria Patricia Suárez, Gonzalo Pablo Aldao, Celso Manuel |
author2_role |
author author author |
dc.subject.none.fl_str_mv |
Silicon Wet Etching Hillocks Dynamic Scaling Properties Scaling Etching Models Monte Carlo Simulations |
topic |
Silicon Wet Etching Hillocks Dynamic Scaling Properties Scaling Etching Models Monte Carlo Simulations |
purl_subject.fl_str_mv |
https://purl.org/becyt/ford/1.3 https://purl.org/becyt/ford/1 |
dc.description.none.fl_txt_mv |
Surface roughening due to anisotropic wet etching of silicon was studied experimentally and modeled using the Monte Carlo method. Simulations were used to determine the consequences of site-dependent detachment probabilities on surface morphology for a oneand two-dimensional substrate models, focusing on the formation mechanisms of etch hillocks. Dynamic scaling properties of the 1D model were also studied. Resorting to the height?height correlation function and the structure factor, it is shown that the model presents conventional and anomalous scaling (faceted) depending on the stability of the hillocks tops. We also found that there is an intermediate regime that cannot be described by the Family-Vicsek or anomalous scaling ansatz. Fil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina Fil: Suarez, Maria Patricia. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina Fil: Suárez, Gonzalo Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigaciones Físicas de Mar del Plata; Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina |
description |
Surface roughening due to anisotropic wet etching of silicon was studied experimentally and modeled using the Monte Carlo method. Simulations were used to determine the consequences of site-dependent detachment probabilities on surface morphology for a oneand two-dimensional substrate models, focusing on the formation mechanisms of etch hillocks. Dynamic scaling properties of the 1D model were also studied. Resorting to the height?height correlation function and the structure factor, it is shown that the model presents conventional and anomalous scaling (faceted) depending on the stability of the hillocks tops. We also found that there is an intermediate regime that cannot be described by the Family-Vicsek or anomalous scaling ansatz. |
publishDate |
2013 |
dc.date.none.fl_str_mv |
2013-10-15 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
http://hdl.handle.net/11336/4949 Mirabella, D. A.; Suarez, Maria Patricia; Suárez, Gonzalo Pablo; Aldao, Celso Manuel; Silicon wet etching: hillock formation mechanisms and dynamic scaling properties; Elsevier; Physica A: Statistical Mechanics and its Applications; 395; 15-10-2013; 105-111 0378-4371 |
url |
http://hdl.handle.net/11336/4949 |
identifier_str_mv |
Mirabella, D. A.; Suarez, Maria Patricia; Suárez, Gonzalo Pablo; Aldao, Celso Manuel; Silicon wet etching: hillock formation mechanisms and dynamic scaling properties; Elsevier; Physica A: Statistical Mechanics and its Applications; 395; 15-10-2013; 105-111 0378-4371 |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
info:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0378437113009874 info:eu-repo/semantics/altIdentifier/issn/0378-4371 info:eu-repo/semantics/altIdentifier/doi/10.1016/j.physa.2013.09.071 |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by-nc-nd/2.5/ar/ |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/ |
dc.format.none.fl_str_mv |
application/pdf application/pdf application/pdf application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier |
publisher.none.fl_str_mv |
Elsevier |
dc.source.none.fl_str_mv |
reponame:CONICET Digital (CONICET) instname:Consejo Nacional de Investigaciones Científicas y Técnicas |
reponame_str |
CONICET Digital (CONICET) |
collection |
CONICET Digital (CONICET) |
instname_str |
Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.name.fl_str_mv |
CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.mail.fl_str_mv |
dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar |
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13.070432 |