Silicon wet etching: hillock formation mechanisms and dynamic scaling properties

Autores
Mirabella, D. A.; Suarez, Maria Patricia; Suárez, Gonzalo Pablo; Aldao, Celso Manuel
Año de publicación
2013
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Surface roughening due to anisotropic wet etching of silicon was studied experimentally and modeled using the Monte Carlo method. Simulations were used to determine the consequences of site-dependent detachment probabilities on surface morphology for a oneand two-dimensional substrate models, focusing on the formation mechanisms of etch hillocks. Dynamic scaling properties of the 1D model were also studied. Resorting to the height?height correlation function and the structure factor, it is shown that the model presents conventional and anomalous scaling (faceted) depending on the stability of the hillocks tops. We also found that there is an intermediate regime that cannot be described by the Family-Vicsek or anomalous scaling ansatz.
Fil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Suarez, Maria Patricia. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Suárez, Gonzalo Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigaciones Físicas de Mar del Plata; Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Materia
Silicon
Wet Etching
Hillocks
Dynamic Scaling Properties
Scaling
Etching Models
Monte Carlo Simulations
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/4949
Acceder
id CONICETDig_c37d1f69cbb668731fb0bf53b89a1cb7
oai_identifier_str oai:ri.conicet.gov.ar:11336/4949
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Silicon wet etching: hillock formation mechanisms and dynamic scaling propertiesMirabella, D. A.Suarez, Maria PatriciaSuárez, Gonzalo PabloAldao, Celso ManuelSiliconWet EtchingHillocksDynamic Scaling PropertiesScalingEtching ModelsMonte Carlo Simulationshttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1Surface roughening due to anisotropic wet etching of silicon was studied experimentally and modeled using the Monte Carlo method. Simulations were used to determine the consequences of site-dependent detachment probabilities on surface morphology for a oneand two-dimensional substrate models, focusing on the formation mechanisms of etch hillocks. Dynamic scaling properties of the 1D model were also studied. Resorting to the height?height correlation function and the structure factor, it is shown that the model presents conventional and anomalous scaling (faceted) depending on the stability of the hillocks tops. We also found that there is an intermediate regime that cannot be described by the Family-Vicsek or anomalous scaling ansatz.Fil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaFil: Suarez, Maria Patricia. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaFil: Suárez, Gonzalo Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigaciones Físicas de Mar del Plata; Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaFil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaElsevier2013-10-15info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/4949Mirabella, D. A.; Suarez, Maria Patricia; Suárez, Gonzalo Pablo; Aldao, Celso Manuel; Silicon wet etching: hillock formation mechanisms and dynamic scaling properties; Elsevier; Physica A: Statistical Mechanics and its Applications; 395; 15-10-2013; 105-1110378-4371enginfo:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0378437113009874info:eu-repo/semantics/altIdentifier/issn/0378-4371info:eu-repo/semantics/altIdentifier/doi/10.1016/j.physa.2013.09.071info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-15T15:23:09Zoai:ri.conicet.gov.ar:11336/4949instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-15 15:23:09.585CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
title Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
spellingShingle Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
Mirabella, D. A.
Silicon
Wet Etching
Hillocks
Dynamic Scaling Properties
Scaling
Etching Models
Monte Carlo Simulations
title_short Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
title_full Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
title_fullStr Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
title_full_unstemmed Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
title_sort Silicon wet etching: hillock formation mechanisms and dynamic scaling properties
dc.creator.none.fl_str_mv Mirabella, D. A.
Suarez, Maria Patricia
Suárez, Gonzalo Pablo
Aldao, Celso Manuel
author Mirabella, D. A.
author_facet Mirabella, D. A.
Suarez, Maria Patricia
Suárez, Gonzalo Pablo
Aldao, Celso Manuel
author_role author
author2 Suarez, Maria Patricia
Suárez, Gonzalo Pablo
Aldao, Celso Manuel
author2_role author
author
author
dc.subject.none.fl_str_mv Silicon
Wet Etching
Hillocks
Dynamic Scaling Properties
Scaling
Etching Models
Monte Carlo Simulations
topic Silicon
Wet Etching
Hillocks
Dynamic Scaling Properties
Scaling
Etching Models
Monte Carlo Simulations
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv Surface roughening due to anisotropic wet etching of silicon was studied experimentally and modeled using the Monte Carlo method. Simulations were used to determine the consequences of site-dependent detachment probabilities on surface morphology for a oneand two-dimensional substrate models, focusing on the formation mechanisms of etch hillocks. Dynamic scaling properties of the 1D model were also studied. Resorting to the height?height correlation function and the structure factor, it is shown that the model presents conventional and anomalous scaling (faceted) depending on the stability of the hillocks tops. We also found that there is an intermediate regime that cannot be described by the Family-Vicsek or anomalous scaling ansatz.
Fil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Suarez, Maria Patricia. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Suárez, Gonzalo Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigaciones Físicas de Mar del Plata; Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación En Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
description Surface roughening due to anisotropic wet etching of silicon was studied experimentally and modeled using the Monte Carlo method. Simulations were used to determine the consequences of site-dependent detachment probabilities on surface morphology for a oneand two-dimensional substrate models, focusing on the formation mechanisms of etch hillocks. Dynamic scaling properties of the 1D model were also studied. Resorting to the height?height correlation function and the structure factor, it is shown that the model presents conventional and anomalous scaling (faceted) depending on the stability of the hillocks tops. We also found that there is an intermediate regime that cannot be described by the Family-Vicsek or anomalous scaling ansatz.
publishDate 2013
dc.date.none.fl_str_mv 2013-10-15
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/4949
Mirabella, D. A.; Suarez, Maria Patricia; Suárez, Gonzalo Pablo; Aldao, Celso Manuel; Silicon wet etching: hillock formation mechanisms and dynamic scaling properties; Elsevier; Physica A: Statistical Mechanics and its Applications; 395; 15-10-2013; 105-111
0378-4371
url http://hdl.handle.net/11336/4949
identifier_str_mv Mirabella, D. A.; Suarez, Maria Patricia; Suárez, Gonzalo Pablo; Aldao, Celso Manuel; Silicon wet etching: hillock formation mechanisms and dynamic scaling properties; Elsevier; Physica A: Statistical Mechanics and its Applications; 395; 15-10-2013; 105-111
0378-4371
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0378437113009874
info:eu-repo/semantics/altIdentifier/issn/0378-4371
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.physa.2013.09.071
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier
publisher.none.fl_str_mv Elsevier
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1846083378401509376
score 13.22299

Publicaciones similares