Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures

Autores
Salazar Alarcón, Leonardo; Martínez, E. D.; Rodríguez, L. M.; Pastoriza, Hernan
Año de publicación
2016
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained.
Fil: Salazar Alarcón, Leonardo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina
Fil: Martínez, E. D.. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina
Fil: Rodríguez, L. M.. Comisión Nacional de Energí­a Atómica. Gerencia del Area Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Balseiro). División Colisiones Atómicas; Argentina
Fil: Pastoriza, Hernan. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina
Materia
Microfabricación
Multicapas
Epoxy
Interdifusión
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/180091
Acceder
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network_name_str CONICET Digital (CONICET)
spelling Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer StructuresSalazar Alarcón, LeonardoMartínez, E. D.Rodríguez, L. M.Pastoriza, HernanMicrofabricaciónMulticapasEpoxyInterdifusiónhttps://purl.org/becyt/ford/2.5https://purl.org/becyt/ford/2https://purl.org/becyt/ford/2.5https://purl.org/becyt/ford/2https://purl.org/becyt/ford/2.5https://purl.org/becyt/ford/2During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained.Fil: Salazar Alarcón, Leonardo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; ArgentinaFil: Martínez, E. D.. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; ArgentinaFil: Rodríguez, L. M.. Comisión Nacional de Energí­a Atómica. Gerencia del Area Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Balseiro). División Colisiones Atómicas; ArgentinaFil: Pastoriza, Hernan. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; ArgentinaHindawi Publishing Corporation2016-05info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/180091Salazar Alarcón, Leonardo; Martínez, E. D.; Rodríguez, L. M.; Pastoriza, Hernan; Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures; Hindawi Publishing Corporation; Advances in Materials Science and Engineering; 2016; 5-2016; 1-81687-8442CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/http://www.hindawi.com/journals/amse/2016/5278102/info:eu-repo/semantics/altIdentifier/doi/10.1155/2016/5278102info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-22T11:07:27Zoai:ri.conicet.gov.ar:11336/180091instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-22 11:07:27.742CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
title Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
spellingShingle Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
Salazar Alarcón, Leonardo
Microfabricación
Multicapas
Epoxy
Interdifusión
title_short Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
title_full Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
title_fullStr Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
title_full_unstemmed Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
title_sort Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
dc.creator.none.fl_str_mv Salazar Alarcón, Leonardo
Martínez, E. D.
Rodríguez, L. M.
Pastoriza, Hernan
author Salazar Alarcón, Leonardo
author_facet Salazar Alarcón, Leonardo
Martínez, E. D.
Rodríguez, L. M.
Pastoriza, Hernan
author_role author
author2 Martínez, E. D.
Rodríguez, L. M.
Pastoriza, Hernan
author2_role author
author
author
dc.subject.none.fl_str_mv Microfabricación
Multicapas
Epoxy
Interdifusión
topic Microfabricación
Multicapas
Epoxy
Interdifusión
purl_subject.fl_str_mv https://purl.org/becyt/ford/2.5
https://purl.org/becyt/ford/2
https://purl.org/becyt/ford/2.5
https://purl.org/becyt/ford/2
https://purl.org/becyt/ford/2.5
https://purl.org/becyt/ford/2
dc.description.none.fl_txt_mv During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained.
Fil: Salazar Alarcón, Leonardo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina
Fil: Martínez, E. D.. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina
Fil: Rodríguez, L. M.. Comisión Nacional de Energí­a Atómica. Gerencia del Area Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Balseiro). División Colisiones Atómicas; Argentina
Fil: Pastoriza, Hernan. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina
description During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained.
publishDate 2016
dc.date.none.fl_str_mv 2016-05
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/180091
Salazar Alarcón, Leonardo; Martínez, E. D.; Rodríguez, L. M.; Pastoriza, Hernan; Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures; Hindawi Publishing Corporation; Advances in Materials Science and Engineering; 2016; 5-2016; 1-8
1687-8442
CONICET Digital
CONICET
url http://hdl.handle.net/11336/180091
identifier_str_mv Salazar Alarcón, Leonardo; Martínez, E. D.; Rodríguez, L. M.; Pastoriza, Hernan; Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures; Hindawi Publishing Corporation; Advances in Materials Science and Engineering; 2016; 5-2016; 1-8
1687-8442
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/http://www.hindawi.com/journals/amse/2016/5278102/
info:eu-repo/semantics/altIdentifier/doi/10.1155/2016/5278102
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv Hindawi Publishing Corporation
publisher.none.fl_str_mv Hindawi Publishing Corporation
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1846781389991575552
score 12.982451

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