Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures
- Autores
- Salazar Alarcón, Leonardo; Martínez, E. D.; Rodríguez, L. M.; Pastoriza, Hernan
- Año de publicación
- 2016
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained.
Fil: Salazar Alarcón, Leonardo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina
Fil: Martínez, E. D.. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina
Fil: Rodríguez, L. M.. Comisión Nacional de Energía Atómica. Gerencia del Area Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Balseiro). División Colisiones Atómicas; Argentina
Fil: Pastoriza, Hernan. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina - Materia
-
Microfabricación
Multicapas
Epoxy
Interdifusión - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
- Repositorio
- Institución
- Consejo Nacional de Investigaciones Científicas y Técnicas
- OAI Identificador
- oai:ri.conicet.gov.ar:11336/180091
Ver los metadatos del registro completo
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Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer StructuresSalazar Alarcón, LeonardoMartínez, E. D.Rodríguez, L. M.Pastoriza, HernanMicrofabricaciónMulticapasEpoxyInterdifusiónhttps://purl.org/becyt/ford/2.5https://purl.org/becyt/ford/2https://purl.org/becyt/ford/2.5https://purl.org/becyt/ford/2https://purl.org/becyt/ford/2.5https://purl.org/becyt/ford/2During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained.Fil: Salazar Alarcón, Leonardo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; ArgentinaFil: Martínez, E. D.. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; ArgentinaFil: Rodríguez, L. M.. Comisión Nacional de Energía Atómica. Gerencia del Area Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Balseiro). División Colisiones Atómicas; ArgentinaFil: Pastoriza, Hernan. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; ArgentinaHindawi Publishing Corporation2016-05info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/180091Salazar Alarcón, Leonardo; Martínez, E. D.; Rodríguez, L. M.; Pastoriza, Hernan; Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures; Hindawi Publishing Corporation; Advances in Materials Science and Engineering; 2016; 5-2016; 1-81687-8442CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/http://www.hindawi.com/journals/amse/2016/5278102/info:eu-repo/semantics/altIdentifier/doi/10.1155/2016/5278102info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T09:39:07Zoai:ri.conicet.gov.ar:11336/180091instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 09:39:07.762CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse |
dc.title.none.fl_str_mv |
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures |
title |
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures |
spellingShingle |
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures Salazar Alarcón, Leonardo Microfabricación Multicapas Epoxy Interdifusión |
title_short |
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures |
title_full |
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures |
title_fullStr |
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures |
title_full_unstemmed |
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures |
title_sort |
Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures |
dc.creator.none.fl_str_mv |
Salazar Alarcón, Leonardo Martínez, E. D. Rodríguez, L. M. Pastoriza, Hernan |
author |
Salazar Alarcón, Leonardo |
author_facet |
Salazar Alarcón, Leonardo Martínez, E. D. Rodríguez, L. M. Pastoriza, Hernan |
author_role |
author |
author2 |
Martínez, E. D. Rodríguez, L. M. Pastoriza, Hernan |
author2_role |
author author author |
dc.subject.none.fl_str_mv |
Microfabricación Multicapas Epoxy Interdifusión |
topic |
Microfabricación Multicapas Epoxy Interdifusión |
purl_subject.fl_str_mv |
https://purl.org/becyt/ford/2.5 https://purl.org/becyt/ford/2 https://purl.org/becyt/ford/2.5 https://purl.org/becyt/ford/2 https://purl.org/becyt/ford/2.5 https://purl.org/becyt/ford/2 |
dc.description.none.fl_txt_mv |
During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained. Fil: Salazar Alarcón, Leonardo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina Fil: Martínez, E. D.. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina Fil: Rodríguez, L. M.. Comisión Nacional de Energía Atómica. Gerencia del Area Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Balseiro). División Colisiones Atómicas; Argentina Fil: Pastoriza, Hernan. Comisión Nacional de Energía Atómica. Gerencia del Area de Investigación y Aplicaciones No Nucleares. Gerencia de Física (Centro Atómico Bariloche). División Bajas Temperaturas; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Patagonia Norte; Argentina |
description |
During SU-8 standard photolithography process, a patterned topography is formed with a characteristic height profile produced by the different shrinkage of the UV exposed and masked regions. We study the change of wettability, film solubility, and topographic modifications on SU-8 films of different thicknesses and show its relevance in the formation of spinning-flow arrays on top layers made from positive photoresists. Also, considerable contrast in film solubility and surface energy as observed from contact angle measurements is produced. Interface diffusion of the photoresists was also observed and followed by Rutherford Back Scattering. We discuss the derivations of the mentioned effects concerning the limitations to multilayered microfabrication processes and possibilities to take advantage of the surface profiles obtained. |
publishDate |
2016 |
dc.date.none.fl_str_mv |
2016-05 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
http://hdl.handle.net/11336/180091 Salazar Alarcón, Leonardo; Martínez, E. D.; Rodríguez, L. M.; Pastoriza, Hernan; Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures; Hindawi Publishing Corporation; Advances in Materials Science and Engineering; 2016; 5-2016; 1-8 1687-8442 CONICET Digital CONICET |
url |
http://hdl.handle.net/11336/180091 |
identifier_str_mv |
Salazar Alarcón, Leonardo; Martínez, E. D.; Rodríguez, L. M.; Pastoriza, Hernan; Topographical and Physicochemical Contrast in Photopatterned SU-8 Films for Microfabrication of Multilayer Structures; Hindawi Publishing Corporation; Advances in Materials Science and Engineering; 2016; 5-2016; 1-8 1687-8442 CONICET Digital CONICET |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
info:eu-repo/semantics/altIdentifier/url/http://www.hindawi.com/journals/amse/2016/5278102/ info:eu-repo/semantics/altIdentifier/doi/10.1155/2016/5278102 |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by-nc-sa/2.5/ar/ |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/ |
dc.format.none.fl_str_mv |
application/pdf application/pdf |
dc.publisher.none.fl_str_mv |
Hindawi Publishing Corporation |
publisher.none.fl_str_mv |
Hindawi Publishing Corporation |
dc.source.none.fl_str_mv |
reponame:CONICET Digital (CONICET) instname:Consejo Nacional de Investigaciones Científicas y Técnicas |
reponame_str |
CONICET Digital (CONICET) |
collection |
CONICET Digital (CONICET) |
instname_str |
Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.name.fl_str_mv |
CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.mail.fl_str_mv |
dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar |
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1844613237238136832 |
score |
13.070432 |