Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness

Autores
Fazio, Mariana Andrea; Vega, Daniel Roberto; Kleiman, Ariel Javier; Colombo, Diego Alejandro; Franco Arias, Lina Maria; Marquez, Adriana Beatriz
Año de publicación
2015
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Polycrystalline titanium thin films have been widely employed as interlayer between the substrate and different coatings in order to improve adhesion strength, corrosion resistance and wear performance, as well as to promote the growth of crystalline phases of the coating. The thickness of the Ti layer can be relevant on the behavior of the coatings, however very few studies have been carried out. In this work, the crystal structure of polycrystalline titanium films deposited with a vacuum arc discharge on monocrystalline silicon wafers (100) was studied and a dependence on the film thickness was found. The presence of the fcc phase of titanium was observed for the thinnest films with a critical thickness estimated in 300 nm, a much larger value than those reported for other deposition processes. For larger thicknesses, the films grew as α-titanium with a preferred orientation in the [100] direction. The obtained results agreed with a growth model based on the matching between the film and the substrate lattice. The characteristics of the films deposited in two steps, which had not been previously investigated, reinforced the suggested model.
Fil: Fazio, Mariana Andrea. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Fil: Vega, Daniel Roberto. Comisión Nacional de Energía Atómica. Gerencia del Área de Investigaciones y Aplicaciones no Nucleares. Gerencia de Física (Centro Atómico Constituyentes); Argentina
Fil: Kleiman, Ariel Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Fil: Colombo, Diego Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; Argentina
Fil: Franco Arias, Lina Maria. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Fil: Marquez, Adriana Beatriz. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Materia
FACE CENTERED CUBIC TITANIUM PHASE
FILMS
THIN FILMS
TITANIUM
VACUUM ARC DISCHARGE
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/128485
Acceder
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oai_identifier_str oai:ri.conicet.gov.ar:11336/128485
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thicknessFazio, Mariana AndreaVega, Daniel RobertoKleiman, Ariel JavierColombo, Diego AlejandroFranco Arias, Lina MariaMarquez, Adriana BeatrizFACE CENTERED CUBIC TITANIUM PHASEFILMSTHIN FILMSTITANIUMVACUUM ARC DISCHARGEhttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1Polycrystalline titanium thin films have been widely employed as interlayer between the substrate and different coatings in order to improve adhesion strength, corrosion resistance and wear performance, as well as to promote the growth of crystalline phases of the coating. The thickness of the Ti layer can be relevant on the behavior of the coatings, however very few studies have been carried out. In this work, the crystal structure of polycrystalline titanium films deposited with a vacuum arc discharge on monocrystalline silicon wafers (100) was studied and a dependence on the film thickness was found. The presence of the fcc phase of titanium was observed for the thinnest films with a critical thickness estimated in 300 nm, a much larger value than those reported for other deposition processes. For larger thicknesses, the films grew as α-titanium with a preferred orientation in the [100] direction. The obtained results agreed with a growth model based on the matching between the film and the substrate lattice. The characteristics of the films deposited in two steps, which had not been previously investigated, reinforced the suggested model.Fil: Fazio, Mariana Andrea. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; ArgentinaFil: Vega, Daniel Roberto. Comisión Nacional de Energía Atómica. Gerencia del Área de Investigaciones y Aplicaciones no Nucleares. Gerencia de Física (Centro Atómico Constituyentes); ArgentinaFil: Kleiman, Ariel Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; ArgentinaFil: Colombo, Diego Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; ArgentinaFil: Franco Arias, Lina Maria. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; ArgentinaFil: Marquez, Adriana Beatriz. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; ArgentinaElsevier Science SA2015-10info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/128485Fazio, Mariana Andrea; Vega, Daniel Roberto; Kleiman, Ariel Javier; Colombo, Diego Alejandro; Franco Arias, Lina Maria; et al.; Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness; Elsevier Science SA; Thin Solid Films; 593; 10-2015; 110-1150040-6090CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0040609015008822info:eu-repo/semantics/altIdentifier/doi/10.1016/j.tsf.2015.09.015info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T09:39:17Zoai:ri.conicet.gov.ar:11336/128485instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 09:39:17.934CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
title Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
spellingShingle Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
Fazio, Mariana Andrea
FACE CENTERED CUBIC TITANIUM PHASE
FILMS
THIN FILMS
TITANIUM
VACUUM ARC DISCHARGE
title_short Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
title_full Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
title_fullStr Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
title_full_unstemmed Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
title_sort Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness
dc.creator.none.fl_str_mv Fazio, Mariana Andrea
Vega, Daniel Roberto
Kleiman, Ariel Javier
Colombo, Diego Alejandro
Franco Arias, Lina Maria
Marquez, Adriana Beatriz
author Fazio, Mariana Andrea
author_facet Fazio, Mariana Andrea
Vega, Daniel Roberto
Kleiman, Ariel Javier
Colombo, Diego Alejandro
Franco Arias, Lina Maria
Marquez, Adriana Beatriz
author_role author
author2 Vega, Daniel Roberto
Kleiman, Ariel Javier
Colombo, Diego Alejandro
Franco Arias, Lina Maria
Marquez, Adriana Beatriz
author2_role author
author
author
author
author
dc.subject.none.fl_str_mv FACE CENTERED CUBIC TITANIUM PHASE
FILMS
THIN FILMS
TITANIUM
VACUUM ARC DISCHARGE
topic FACE CENTERED CUBIC TITANIUM PHASE
FILMS
THIN FILMS
TITANIUM
VACUUM ARC DISCHARGE
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv Polycrystalline titanium thin films have been widely employed as interlayer between the substrate and different coatings in order to improve adhesion strength, corrosion resistance and wear performance, as well as to promote the growth of crystalline phases of the coating. The thickness of the Ti layer can be relevant on the behavior of the coatings, however very few studies have been carried out. In this work, the crystal structure of polycrystalline titanium films deposited with a vacuum arc discharge on monocrystalline silicon wafers (100) was studied and a dependence on the film thickness was found. The presence of the fcc phase of titanium was observed for the thinnest films with a critical thickness estimated in 300 nm, a much larger value than those reported for other deposition processes. For larger thicknesses, the films grew as α-titanium with a preferred orientation in the [100] direction. The obtained results agreed with a growth model based on the matching between the film and the substrate lattice. The characteristics of the films deposited in two steps, which had not been previously investigated, reinforced the suggested model.
Fil: Fazio, Mariana Andrea. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Fil: Vega, Daniel Roberto. Comisión Nacional de Energía Atómica. Gerencia del Área de Investigaciones y Aplicaciones no Nucleares. Gerencia de Física (Centro Atómico Constituyentes); Argentina
Fil: Kleiman, Ariel Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Fil: Colombo, Diego Alejandro. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; Argentina
Fil: Franco Arias, Lina Maria. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Fil: Marquez, Adriana Beatriz. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
description Polycrystalline titanium thin films have been widely employed as interlayer between the substrate and different coatings in order to improve adhesion strength, corrosion resistance and wear performance, as well as to promote the growth of crystalline phases of the coating. The thickness of the Ti layer can be relevant on the behavior of the coatings, however very few studies have been carried out. In this work, the crystal structure of polycrystalline titanium films deposited with a vacuum arc discharge on monocrystalline silicon wafers (100) was studied and a dependence on the film thickness was found. The presence of the fcc phase of titanium was observed for the thinnest films with a critical thickness estimated in 300 nm, a much larger value than those reported for other deposition processes. For larger thicknesses, the films grew as α-titanium with a preferred orientation in the [100] direction. The obtained results agreed with a growth model based on the matching between the film and the substrate lattice. The characteristics of the films deposited in two steps, which had not been previously investigated, reinforced the suggested model.
publishDate 2015
dc.date.none.fl_str_mv 2015-10
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/128485
Fazio, Mariana Andrea; Vega, Daniel Roberto; Kleiman, Ariel Javier; Colombo, Diego Alejandro; Franco Arias, Lina Maria; et al.; Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness; Elsevier Science SA; Thin Solid Films; 593; 10-2015; 110-115
0040-6090
CONICET Digital
CONICET
url http://hdl.handle.net/11336/128485
identifier_str_mv Fazio, Mariana Andrea; Vega, Daniel Roberto; Kleiman, Ariel Javier; Colombo, Diego Alejandro; Franco Arias, Lina Maria; et al.; Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness; Elsevier Science SA; Thin Solid Films; 593; 10-2015; 110-115
0040-6090
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/http://www.sciencedirect.com/science/article/pii/S0040609015008822
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.tsf.2015.09.015
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
application/pdf
application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier Science SA
publisher.none.fl_str_mv Elsevier Science SA
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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score 13.070432

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