X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition

Autores
Kleiman, Ariel Javier; Lamas, Diego Germán; Craievich, A. F.; Marquez, Adriana Beatriz
Año de publicación
2014
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
TiO2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO2 mass and different deposition and annealing temperatures were studied. A qualitative analysis of the XRD patterns indicated the presence of the anatase and/or rutile crystalline phases in most of the studied samples. From the analysis of the experimental XRR curves—which exhibited a wide angular range of oscillatory behavior—the thickness, mass density and interface roughness were determined. All XRR patterns were well fitted by modeled curves that assume the presence of a single and homogeneous TiO2 layer over which a very thin H2O layer is adsorbed. The thickest H2O adsorption layers were developed in films with the highest anatase content. Our overall results of the XRR analyses are consistent with those derived from the imaging techniques (SEM and AFM).
Fil: Kleiman, Ariel Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Fil: Lamas, Diego Germán. Universidad Nacional del Comahue. Facultad de Ingeniería; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina
Fil: Craievich, A. F.. Universidade de Sao Paulo; Brasil
Fil: Marquez, Adriana Beatriz. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Materia
Tio
Thin Films
Cathodic Arc Deposition
X-Ray Reflectivity
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/31292
Acceder
id CONICETDig_12cc0e3549cd330f83b1a15311c85d2b
oai_identifier_str oai:ri.conicet.gov.ar:11336/31292
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc DepositionKleiman, Ariel JavierLamas, Diego GermánCraievich, A. F.Marquez, Adriana BeatrizTioThin FilmsCathodic Arc DepositionX-Ray Reflectivityhttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1TiO2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO2 mass and different deposition and annealing temperatures were studied. A qualitative analysis of the XRD patterns indicated the presence of the anatase and/or rutile crystalline phases in most of the studied samples. From the analysis of the experimental XRR curves—which exhibited a wide angular range of oscillatory behavior—the thickness, mass density and interface roughness were determined. All XRR patterns were well fitted by modeled curves that assume the presence of a single and homogeneous TiO2 layer over which a very thin H2O layer is adsorbed. The thickest H2O adsorption layers were developed in films with the highest anatase content. Our overall results of the XRR analyses are consistent with those derived from the imaging techniques (SEM and AFM).Fil: Kleiman, Ariel Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; ArgentinaFil: Lamas, Diego Germán. Universidad Nacional del Comahue. Facultad de Ingeniería; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; ArgentinaFil: Craievich, A. F.. Universidade de Sao Paulo; BrasilFil: Marquez, Adriana Beatriz. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; ArgentinaAmerican Scientific Publishers2014-05info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/31292Marquez, Adriana Beatriz; Craievich, A. F.; Lamas, Diego Germán; Kleiman, Ariel Javier; X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition; American Scientific Publishers; Journal of Nanoscience and Nanotechnology; 14; 5; 5-2014; 3902-39091533-4880CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1166/jnn.2014.8017info:eu-repo/semantics/altIdentifier/url/http://www.ingentaconnect.com/content/asp/jnn/2014/00000014/00000005/art00120info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-10T13:22:58Zoai:ri.conicet.gov.ar:11336/31292instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-10 13:22:58.82CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition
title X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition
spellingShingle X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition
Kleiman, Ariel Javier
Tio
Thin Films
Cathodic Arc Deposition
X-Ray Reflectivity
title_short X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition
title_full X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition
title_fullStr X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition
title_full_unstemmed X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition
title_sort X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition
dc.creator.none.fl_str_mv Kleiman, Ariel Javier
Lamas, Diego Germán
Craievich, A. F.
Marquez, Adriana Beatriz
author Kleiman, Ariel Javier
author_facet Kleiman, Ariel Javier
Lamas, Diego Germán
Craievich, A. F.
Marquez, Adriana Beatriz
author_role author
author2 Lamas, Diego Germán
Craievich, A. F.
Marquez, Adriana Beatriz
author2_role author
author
author
dc.subject.none.fl_str_mv Tio
Thin Films
Cathodic Arc Deposition
X-Ray Reflectivity
topic Tio
Thin Films
Cathodic Arc Deposition
X-Ray Reflectivity
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv TiO2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO2 mass and different deposition and annealing temperatures were studied. A qualitative analysis of the XRD patterns indicated the presence of the anatase and/or rutile crystalline phases in most of the studied samples. From the analysis of the experimental XRR curves—which exhibited a wide angular range of oscillatory behavior—the thickness, mass density and interface roughness were determined. All XRR patterns were well fitted by modeled curves that assume the presence of a single and homogeneous TiO2 layer over which a very thin H2O layer is adsorbed. The thickest H2O adsorption layers were developed in films with the highest anatase content. Our overall results of the XRR analyses are consistent with those derived from the imaging techniques (SEM and AFM).
Fil: Kleiman, Ariel Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
Fil: Lamas, Diego Germán. Universidad Nacional del Comahue. Facultad de Ingeniería; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina
Fil: Craievich, A. F.. Universidade de Sao Paulo; Brasil
Fil: Marquez, Adriana Beatriz. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Física del Plasma. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Física del Plasma; Argentina
description TiO2 thin films deposited by a vacuum arc on a glass substrate were characterized by X-ray reflectivity (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). Several thin films with different amounts of deposited TiO2 mass and different deposition and annealing temperatures were studied. A qualitative analysis of the XRD patterns indicated the presence of the anatase and/or rutile crystalline phases in most of the studied samples. From the analysis of the experimental XRR curves—which exhibited a wide angular range of oscillatory behavior—the thickness, mass density and interface roughness were determined. All XRR patterns were well fitted by modeled curves that assume the presence of a single and homogeneous TiO2 layer over which a very thin H2O layer is adsorbed. The thickest H2O adsorption layers were developed in films with the highest anatase content. Our overall results of the XRR analyses are consistent with those derived from the imaging techniques (SEM and AFM).
publishDate 2014
dc.date.none.fl_str_mv 2014-05
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/31292
Marquez, Adriana Beatriz; Craievich, A. F.; Lamas, Diego Germán; Kleiman, Ariel Javier; X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition; American Scientific Publishers; Journal of Nanoscience and Nanotechnology; 14; 5; 5-2014; 3902-3909
1533-4880
CONICET Digital
CONICET
url http://hdl.handle.net/11336/31292
identifier_str_mv Marquez, Adriana Beatriz; Craievich, A. F.; Lamas, Diego Germán; Kleiman, Ariel Javier; X-Ray Reflectivity Analysis of Titanium Dioxide Thin Films Grown by Cathodic Arc Deposition; American Scientific Publishers; Journal of Nanoscience and Nanotechnology; 14; 5; 5-2014; 3902-3909
1533-4880
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/doi/10.1166/jnn.2014.8017
info:eu-repo/semantics/altIdentifier/url/http://www.ingentaconnect.com/content/asp/jnn/2014/00000014/00000005/art00120
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv American Scientific Publishers
publisher.none.fl_str_mv American Scientific Publishers
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1842981266382651392
score 12.48226

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