H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2)
- Autores
- Comedi, David Mario; Zalloum, O. H. Y.; Irving, E. A.; Wojcik, J.; Mascher, P.
- Año de publicación
- 2006
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- SiyO1−y:H (y=0.36 and 0.42) alloy films were fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition and subsequently annealed in (Ar+5%H2) at different temperatures. Glancing angle x-ray diffraction and Fourier transform infrared spectroscopy measurements revealed the formation of silicon nanoclusters (Si-ncl) in an amorphous SiO2 matrix for films annealed at temperatures of 900 °C and above. Negligible photoluminescence (PL) was observed at room temperature for the as-grown samples; however, PL bands appeared in the visible after the annealing treatments. The PL intensities are much higher and the spectra skewed to the red as compared to data obtained for similar samples annealed in pure Ar. These effects are attributed to the passivation by H atoms of nonradiative recombination centers in the materials annealed in (Ar+5%H2). The overall analysis of the PL data indicates that both quantum confinement and defect states contribute to the luminescence. Two-step annealing procedures [in Ar and then in (Ar+5%H2)] were found to yield slightly higher passivation efficiencies than single annealing steps in (Ar+5%H2).
Fil: Comedi, David Mario. Universidad Nacional de Tucumán. Facultad de Ciencias Exactas y Tecnología. Departamento de Física. Laboratorio de Física del Sólido; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tucumán; Argentina
Fil: Zalloum, O. H. Y.. Mc Master University; Canadá
Fil: Irving, E. A.. Mc Master University; Canadá
Fil: Wojcik, J.. Mc Master University; Canadá
Fil: Mascher, P.. Mc Master University; Canadá - Materia
-
Si nanocrystals
substoichiometric oxides
photoluminescence
Hydrogen - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
- Repositorio
- Institución
- Consejo Nacional de Investigaciones Científicas y Técnicas
- OAI Identificador
- oai:ri.conicet.gov.ar:11336/85502
Ver los metadatos del registro completo
id |
CONICETDig_7a82cf68426d5e6add00d202b72698f9 |
---|---|
oai_identifier_str |
oai:ri.conicet.gov.ar:11336/85502 |
network_acronym_str |
CONICETDig |
repository_id_str |
3498 |
network_name_str |
CONICET Digital (CONICET) |
spelling |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2)Comedi, David MarioZalloum, O. H. Y.Irving, E. A.Wojcik, J.Mascher, P.Si nanocrystalssubstoichiometric oxidesphotoluminescenceHydrogenhttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1SiyO1−y:H (y=0.36 and 0.42) alloy films were fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition and subsequently annealed in (Ar+5%H2) at different temperatures. Glancing angle x-ray diffraction and Fourier transform infrared spectroscopy measurements revealed the formation of silicon nanoclusters (Si-ncl) in an amorphous SiO2 matrix for films annealed at temperatures of 900 °C and above. Negligible photoluminescence (PL) was observed at room temperature for the as-grown samples; however, PL bands appeared in the visible after the annealing treatments. The PL intensities are much higher and the spectra skewed to the red as compared to data obtained for similar samples annealed in pure Ar. These effects are attributed to the passivation by H atoms of nonradiative recombination centers in the materials annealed in (Ar+5%H2). The overall analysis of the PL data indicates that both quantum confinement and defect states contribute to the luminescence. Two-step annealing procedures [in Ar and then in (Ar+5%H2)] were found to yield slightly higher passivation efficiencies than single annealing steps in (Ar+5%H2).Fil: Comedi, David Mario. Universidad Nacional de Tucumán. Facultad de Ciencias Exactas y Tecnología. Departamento de Física. Laboratorio de Física del Sólido; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tucumán; ArgentinaFil: Zalloum, O. H. Y.. Mc Master University; CanadáFil: Irving, E. A.. Mc Master University; CanadáFil: Wojcik, J.. Mc Master University; CanadáFil: Mascher, P.. Mc Master University; CanadáA V S Amer Inst Physics2006-12info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/85502Comedi, David Mario; Zalloum, O. H. Y.; Irving, E. A.; Wojcik, J.; Mascher, P.; H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2); A V S Amer Inst Physics; Journal Of Vacuum Science & Technology A - Vacuum Surfaces And Films; 24; 3; 12-2006; 817-8200734-2101CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1116/1.2177227info:eu-repo/semantics/altIdentifier/url/https://avs.scitation.org/doi/full/10.1116/1.2177227info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T09:47:11Zoai:ri.conicet.gov.ar:11336/85502instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 09:47:11.427CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse |
dc.title.none.fl_str_mv |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2) |
title |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2) |
spellingShingle |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2) Comedi, David Mario Si nanocrystals substoichiometric oxides photoluminescence Hydrogen |
title_short |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2) |
title_full |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2) |
title_fullStr |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2) |
title_full_unstemmed |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2) |
title_sort |
H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2) |
dc.creator.none.fl_str_mv |
Comedi, David Mario Zalloum, O. H. Y. Irving, E. A. Wojcik, J. Mascher, P. |
author |
Comedi, David Mario |
author_facet |
Comedi, David Mario Zalloum, O. H. Y. Irving, E. A. Wojcik, J. Mascher, P. |
author_role |
author |
author2 |
Zalloum, O. H. Y. Irving, E. A. Wojcik, J. Mascher, P. |
author2_role |
author author author author |
dc.subject.none.fl_str_mv |
Si nanocrystals substoichiometric oxides photoluminescence Hydrogen |
topic |
Si nanocrystals substoichiometric oxides photoluminescence Hydrogen |
purl_subject.fl_str_mv |
https://purl.org/becyt/ford/1.3 https://purl.org/becyt/ford/1 |
dc.description.none.fl_txt_mv |
SiyO1−y:H (y=0.36 and 0.42) alloy films were fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition and subsequently annealed in (Ar+5%H2) at different temperatures. Glancing angle x-ray diffraction and Fourier transform infrared spectroscopy measurements revealed the formation of silicon nanoclusters (Si-ncl) in an amorphous SiO2 matrix for films annealed at temperatures of 900 °C and above. Negligible photoluminescence (PL) was observed at room temperature for the as-grown samples; however, PL bands appeared in the visible after the annealing treatments. The PL intensities are much higher and the spectra skewed to the red as compared to data obtained for similar samples annealed in pure Ar. These effects are attributed to the passivation by H atoms of nonradiative recombination centers in the materials annealed in (Ar+5%H2). The overall analysis of the PL data indicates that both quantum confinement and defect states contribute to the luminescence. Two-step annealing procedures [in Ar and then in (Ar+5%H2)] were found to yield slightly higher passivation efficiencies than single annealing steps in (Ar+5%H2). Fil: Comedi, David Mario. Universidad Nacional de Tucumán. Facultad de Ciencias Exactas y Tecnología. Departamento de Física. Laboratorio de Física del Sólido; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Tucumán; Argentina Fil: Zalloum, O. H. Y.. Mc Master University; Canadá Fil: Irving, E. A.. Mc Master University; Canadá Fil: Wojcik, J.. Mc Master University; Canadá Fil: Mascher, P.. Mc Master University; Canadá |
description |
SiyO1−y:H (y=0.36 and 0.42) alloy films were fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition and subsequently annealed in (Ar+5%H2) at different temperatures. Glancing angle x-ray diffraction and Fourier transform infrared spectroscopy measurements revealed the formation of silicon nanoclusters (Si-ncl) in an amorphous SiO2 matrix for films annealed at temperatures of 900 °C and above. Negligible photoluminescence (PL) was observed at room temperature for the as-grown samples; however, PL bands appeared in the visible after the annealing treatments. The PL intensities are much higher and the spectra skewed to the red as compared to data obtained for similar samples annealed in pure Ar. These effects are attributed to the passivation by H atoms of nonradiative recombination centers in the materials annealed in (Ar+5%H2). The overall analysis of the PL data indicates that both quantum confinement and defect states contribute to the luminescence. Two-step annealing procedures [in Ar and then in (Ar+5%H2)] were found to yield slightly higher passivation efficiencies than single annealing steps in (Ar+5%H2). |
publishDate |
2006 |
dc.date.none.fl_str_mv |
2006-12 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
http://hdl.handle.net/11336/85502 Comedi, David Mario; Zalloum, O. H. Y.; Irving, E. A.; Wojcik, J.; Mascher, P.; H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2); A V S Amer Inst Physics; Journal Of Vacuum Science & Technology A - Vacuum Surfaces And Films; 24; 3; 12-2006; 817-820 0734-2101 CONICET Digital CONICET |
url |
http://hdl.handle.net/11336/85502 |
identifier_str_mv |
Comedi, David Mario; Zalloum, O. H. Y.; Irving, E. A.; Wojcik, J.; Mascher, P.; H-Induced effects in luminescent silicon nanostructures obtained from PECVD grown SiyO1-y:H (y>1/3) thin films annealed in (Ar+5%H2); A V S Amer Inst Physics; Journal Of Vacuum Science & Technology A - Vacuum Surfaces And Films; 24; 3; 12-2006; 817-820 0734-2101 CONICET Digital CONICET |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
info:eu-repo/semantics/altIdentifier/doi/10.1116/1.2177227 info:eu-repo/semantics/altIdentifier/url/https://avs.scitation.org/doi/full/10.1116/1.2177227 |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by-nc-sa/2.5/ar/ |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/ |
dc.format.none.fl_str_mv |
application/pdf application/pdf |
dc.publisher.none.fl_str_mv |
A V S Amer Inst Physics |
publisher.none.fl_str_mv |
A V S Amer Inst Physics |
dc.source.none.fl_str_mv |
reponame:CONICET Digital (CONICET) instname:Consejo Nacional de Investigaciones Científicas y Técnicas |
reponame_str |
CONICET Digital (CONICET) |
collection |
CONICET Digital (CONICET) |
instname_str |
Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.name.fl_str_mv |
CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.mail.fl_str_mv |
dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar |
_version_ |
1844613470158323712 |
score |
13.070432 |