Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers

Autores
Vega Moreno, Milena Amparo; Granell, Pablo Nicolás; Lasorsa, Carlos Alberto; Lerner, Betiana; Perez, Maximiliano Sebastian
Año de publicación
2016
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
In this work an easy, reproducible and inexpensive technique for the production of solid state nanopores and micropores using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid (HCl). Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23μ m/min etching speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25°C, ii) at 80°C and iii) at 80°C applying an electric potential. In these studies, it was found that nanopores and micropores can be obtained automatically and at a low cost. Additionally, the process was optimized to obtain clean silicon wafers after the pore fabrication process. This method opens the possibility for an efficient scale-up from laboratory production.
Fil: Vega Moreno, Milena Amparo. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; Argentina
Fil: Granell, Pablo Nicolás. Instituto Nacional de Tecnología Industrial. Centro de Micro y Nanoelectrónica del Bicentenario; Argentina
Fil: Lasorsa, Carlos Alberto. Universidad Tecnológica Nacional; Argentina
Fil: Lerner, Betiana. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; Argentina
Fil: Perez, Maximiliano Sebastian. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; Argentina
Materia
NANOPORE
SILICON WAFER
METHOD
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/74912
Acceder
id CONICETDig_56dbc9d406583becc616151ae177ba9c
oai_identifier_str oai:ri.conicet.gov.ar:11336/74912
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafersVega Moreno, Milena AmparoGranell, Pablo NicolásLasorsa, Carlos AlbertoLerner, BetianaPerez, Maximiliano SebastianNANOPORESILICON WAFERMETHODhttps://purl.org/becyt/ford/2.10https://purl.org/becyt/ford/2In this work an easy, reproducible and inexpensive technique for the production of solid state nanopores and micropores using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid (HCl). Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23μ m/min etching speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25°C, ii) at 80°C and iii) at 80°C applying an electric potential. In these studies, it was found that nanopores and micropores can be obtained automatically and at a low cost. Additionally, the process was optimized to obtain clean silicon wafers after the pore fabrication process. This method opens the possibility for an efficient scale-up from laboratory production.Fil: Vega Moreno, Milena Amparo. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; ArgentinaFil: Granell, Pablo Nicolás. Instituto Nacional de Tecnología Industrial. Centro de Micro y Nanoelectrónica del Bicentenario; ArgentinaFil: Lasorsa, Carlos Alberto. Universidad Tecnológica Nacional; ArgentinaFil: Lerner, Betiana. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; ArgentinaFil: Perez, Maximiliano Sebastian. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; ArgentinaInstitute of Physics Publishing2016-02info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/74912Vega Moreno, Milena Amparo; Granell, Pablo Nicolás; Lasorsa, Carlos Alberto; Lerner, Betiana; Perez, Maximiliano Sebastian; Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers; Institute of Physics Publishing; Journal of Physics: Conference Series; 687; 1; 2-2016; 1-41742-6596CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/https://iopscience.iop.org/article/10.1088/1742-6596/687/1/012029info:eu-repo/semantics/altIdentifier/doi/10.1088/1742-6596/687/1/012029info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-03T10:05:41Zoai:ri.conicet.gov.ar:11336/74912instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-03 10:05:41.386CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
title Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
spellingShingle Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
Vega Moreno, Milena Amparo
NANOPORE
SILICON WAFER
METHOD
title_short Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
title_full Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
title_fullStr Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
title_full_unstemmed Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
title_sort Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers
dc.creator.none.fl_str_mv Vega Moreno, Milena Amparo
Granell, Pablo Nicolás
Lasorsa, Carlos Alberto
Lerner, Betiana
Perez, Maximiliano Sebastian
author Vega Moreno, Milena Amparo
author_facet Vega Moreno, Milena Amparo
Granell, Pablo Nicolás
Lasorsa, Carlos Alberto
Lerner, Betiana
Perez, Maximiliano Sebastian
author_role author
author2 Granell, Pablo Nicolás
Lasorsa, Carlos Alberto
Lerner, Betiana
Perez, Maximiliano Sebastian
author2_role author
author
author
author
dc.subject.none.fl_str_mv NANOPORE
SILICON WAFER
METHOD
topic NANOPORE
SILICON WAFER
METHOD
purl_subject.fl_str_mv https://purl.org/becyt/ford/2.10
https://purl.org/becyt/ford/2
dc.description.none.fl_txt_mv In this work an easy, reproducible and inexpensive technique for the production of solid state nanopores and micropores using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid (HCl). Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23μ m/min etching speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25°C, ii) at 80°C and iii) at 80°C applying an electric potential. In these studies, it was found that nanopores and micropores can be obtained automatically and at a low cost. Additionally, the process was optimized to obtain clean silicon wafers after the pore fabrication process. This method opens the possibility for an efficient scale-up from laboratory production.
Fil: Vega Moreno, Milena Amparo. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; Argentina
Fil: Granell, Pablo Nicolás. Instituto Nacional de Tecnología Industrial. Centro de Micro y Nanoelectrónica del Bicentenario; Argentina
Fil: Lasorsa, Carlos Alberto. Universidad Tecnológica Nacional; Argentina
Fil: Lerner, Betiana. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; Argentina
Fil: Perez, Maximiliano Sebastian. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Tecnológica Nacional; Argentina
description In this work an easy, reproducible and inexpensive technique for the production of solid state nanopores and micropores using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid (HCl). Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23μ m/min etching speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25°C, ii) at 80°C and iii) at 80°C applying an electric potential. In these studies, it was found that nanopores and micropores can be obtained automatically and at a low cost. Additionally, the process was optimized to obtain clean silicon wafers after the pore fabrication process. This method opens the possibility for an efficient scale-up from laboratory production.
publishDate 2016
dc.date.none.fl_str_mv 2016-02
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/74912
Vega Moreno, Milena Amparo; Granell, Pablo Nicolás; Lasorsa, Carlos Alberto; Lerner, Betiana; Perez, Maximiliano Sebastian; Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers; Institute of Physics Publishing; Journal of Physics: Conference Series; 687; 1; 2-2016; 1-4
1742-6596
CONICET Digital
CONICET
url http://hdl.handle.net/11336/74912
identifier_str_mv Vega Moreno, Milena Amparo; Granell, Pablo Nicolás; Lasorsa, Carlos Alberto; Lerner, Betiana; Perez, Maximiliano Sebastian; Automated and inexpensive method to manufacture solid- state nanopores and micropores in robust silicon wafers; Institute of Physics Publishing; Journal of Physics: Conference Series; 687; 1; 2-2016; 1-4
1742-6596
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/https://iopscience.iop.org/article/10.1088/1742-6596/687/1/012029
info:eu-repo/semantics/altIdentifier/doi/10.1088/1742-6596/687/1/012029
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Institute of Physics Publishing
publisher.none.fl_str_mv Institute of Physics Publishing
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1842269923194175488
score 13.13397

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