Automated and low cost method to manufacture addressable solid-state nanopores

Autores
Vega Moreno, Milena Amparo; Lerner, Betiana; Lasorsa, Carlos Alberto; Pierpauli, Karina Alejandra; Perez, Maximiliano Sebastian
Año de publicación
2014
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
In this paper an easy, reproducible and inexpensive technique for the production of solid state nanopores, using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid. Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23 µm/min etchings speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25ºC, ii) at 80°C and iii) at 80°C applying a potential. In these studies, it was found that nanopores can be obtained automatically, addressable and at a low cost. Additionally, a way to obtain the nanopores leaving the silicon wafer completely clean after the etching process was found. This method offers the possibility of an efficient scale-up from the laboratory to production scale.
Fil: Vega Moreno, Milena Amparo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina. Universidad Tecnológica Nacional; Argentina
Fil: Lerner, Betiana. Universidad Tecnológica Nacional; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina
Fil: Lasorsa, Carlos Alberto. Universidad Tecnológica Nacional; Argentina
Fil: Pierpauli, Karina Alejandra. Comisión Nacional de Energía Atómica; Argentina
Fil: Perez, Maximiliano Sebastian. Universidad Tecnológica Nacional; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Materia
NANOPORO
SECUENCIACION ADN
METODO QUIMICO
FRENADO ACIDO
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/109221
Acceder
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spelling Automated and low cost method to manufacture addressable solid-state nanoporesVega Moreno, Milena AmparoLerner, BetianaLasorsa, Carlos AlbertoPierpauli, Karina AlejandraPerez, Maximiliano SebastianNANOPOROSECUENCIACION ADNMETODO QUIMICOFRENADO ACIDOhttps://purl.org/becyt/ford/2.10https://purl.org/becyt/ford/2In this paper an easy, reproducible and inexpensive technique for the production of solid state nanopores, using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid. Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23 µm/min etchings speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25ºC, ii) at 80°C and iii) at 80°C applying a potential. In these studies, it was found that nanopores can be obtained automatically, addressable and at a low cost. Additionally, a way to obtain the nanopores leaving the silicon wafer completely clean after the etching process was found. This method offers the possibility of an efficient scale-up from the laboratory to production scale.Fil: Vega Moreno, Milena Amparo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina. Universidad Tecnológica Nacional; ArgentinaFil: Lerner, Betiana. Universidad Tecnológica Nacional; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; ArgentinaFil: Lasorsa, Carlos Alberto. Universidad Tecnológica Nacional; ArgentinaFil: Pierpauli, Karina Alejandra. Comisión Nacional de Energía Atómica; ArgentinaFil: Perez, Maximiliano Sebastian. Universidad Tecnológica Nacional; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaSpringer2014-12info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/109221Vega Moreno, Milena Amparo; Lerner, Betiana; Lasorsa, Carlos Alberto; Pierpauli, Karina Alejandra; Perez, Maximiliano Sebastian; Automated and low cost method to manufacture addressable solid-state nanopores; Springer; Microsystem Technologies-micro-and Nanosystems-information Storage And Processing Systems; 20; 12; 12-2014; 109-1170946-7076CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/http://link.springer.com/article/10.1007%2Fs00542-014-2399-xinfo:eu-repo/semantics/altIdentifier/doi/10.1007/s00542-014-2399-xinfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-03T10:11:04Zoai:ri.conicet.gov.ar:11336/109221instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-03 10:11:04.76CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Automated and low cost method to manufacture addressable solid-state nanopores
title Automated and low cost method to manufacture addressable solid-state nanopores
spellingShingle Automated and low cost method to manufacture addressable solid-state nanopores
Vega Moreno, Milena Amparo
NANOPORO
SECUENCIACION ADN
METODO QUIMICO
FRENADO ACIDO
title_short Automated and low cost method to manufacture addressable solid-state nanopores
title_full Automated and low cost method to manufacture addressable solid-state nanopores
title_fullStr Automated and low cost method to manufacture addressable solid-state nanopores
title_full_unstemmed Automated and low cost method to manufacture addressable solid-state nanopores
title_sort Automated and low cost method to manufacture addressable solid-state nanopores
dc.creator.none.fl_str_mv Vega Moreno, Milena Amparo
Lerner, Betiana
Lasorsa, Carlos Alberto
Pierpauli, Karina Alejandra
Perez, Maximiliano Sebastian
author Vega Moreno, Milena Amparo
author_facet Vega Moreno, Milena Amparo
Lerner, Betiana
Lasorsa, Carlos Alberto
Pierpauli, Karina Alejandra
Perez, Maximiliano Sebastian
author_role author
author2 Lerner, Betiana
Lasorsa, Carlos Alberto
Pierpauli, Karina Alejandra
Perez, Maximiliano Sebastian
author2_role author
author
author
author
dc.subject.none.fl_str_mv NANOPORO
SECUENCIACION ADN
METODO QUIMICO
FRENADO ACIDO
topic NANOPORO
SECUENCIACION ADN
METODO QUIMICO
FRENADO ACIDO
purl_subject.fl_str_mv https://purl.org/becyt/ford/2.10
https://purl.org/becyt/ford/2
dc.description.none.fl_txt_mv In this paper an easy, reproducible and inexpensive technique for the production of solid state nanopores, using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid. Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23 µm/min etchings speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25ºC, ii) at 80°C and iii) at 80°C applying a potential. In these studies, it was found that nanopores can be obtained automatically, addressable and at a low cost. Additionally, a way to obtain the nanopores leaving the silicon wafer completely clean after the etching process was found. This method offers the possibility of an efficient scale-up from the laboratory to production scale.
Fil: Vega Moreno, Milena Amparo. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina. Universidad Tecnológica Nacional; Argentina
Fil: Lerner, Betiana. Universidad Tecnológica Nacional; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina
Fil: Lasorsa, Carlos Alberto. Universidad Tecnológica Nacional; Argentina
Fil: Pierpauli, Karina Alejandra. Comisión Nacional de Energía Atómica; Argentina
Fil: Perez, Maximiliano Sebastian. Universidad Tecnológica Nacional; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
description In this paper an easy, reproducible and inexpensive technique for the production of solid state nanopores, using silicon wafer substrate is proposed. The technique is based on control of pore formation, by neutralization etchant (KOH) with a strong acid. Thus, a local neutralization is produced around the nanopore, which stops the silicon etching. The etching process was performed with 7M KOH at 80°C, where 1.23 µm/min etchings speed was obtained, similar to those published in literature. The control of the pore formation with the braking acid method was done using 12M HCl and different extreme conditions: i) at 25ºC, ii) at 80°C and iii) at 80°C applying a potential. In these studies, it was found that nanopores can be obtained automatically, addressable and at a low cost. Additionally, a way to obtain the nanopores leaving the silicon wafer completely clean after the etching process was found. This method offers the possibility of an efficient scale-up from the laboratory to production scale.
publishDate 2014
dc.date.none.fl_str_mv 2014-12
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/109221
Vega Moreno, Milena Amparo; Lerner, Betiana; Lasorsa, Carlos Alberto; Pierpauli, Karina Alejandra; Perez, Maximiliano Sebastian; Automated and low cost method to manufacture addressable solid-state nanopores; Springer; Microsystem Technologies-micro-and Nanosystems-information Storage And Processing Systems; 20; 12; 12-2014; 109-117
0946-7076
CONICET Digital
CONICET
url http://hdl.handle.net/11336/109221
identifier_str_mv Vega Moreno, Milena Amparo; Lerner, Betiana; Lasorsa, Carlos Alberto; Pierpauli, Karina Alejandra; Perez, Maximiliano Sebastian; Automated and low cost method to manufacture addressable solid-state nanopores; Springer; Microsystem Technologies-micro-and Nanosystems-information Storage And Processing Systems; 20; 12; 12-2014; 109-117
0946-7076
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/http://link.springer.com/article/10.1007%2Fs00542-014-2399-x
info:eu-repo/semantics/altIdentifier/doi/10.1007/s00542-014-2399-x
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Springer
publisher.none.fl_str_mv Springer
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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score 13.13397

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