Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future

Autores
Wu, X. D.; Venkatesan, T.; Inam, A.; Xi, X. X.; Li, Qi; McLean, W. L.; Chang, C. C.; Hwang, D. M.; Ramesh, Ramamoorthy; Nazar, L.; Wilkens, B. J.; Schwarz, S. A.; Ravi, R. T.; Martínez, Jorge Alberto; England, P.; Tarascon, J. M.; Muenchausen, Ross E.; Foltyn, S. R.; Estler, R. C.; C. Dye, Robert; Garcia, A. R.; Nogar, Nicholas S.
Año de publicación
1990
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Pulsed laser deposition (PLD) has been widely used for deposition of high Tc superconducting thin films, and is recognized as one of the best physical vapor techniques for the preparation of these films. The most important advantage of this technique is stoichiometric deposition; films can be made with the same composition as the target. Utilizing PLD, not only thin films but also multilayers and superlattices of high Tc superconductors have been fabricated. In this paper, the performance of the technique will be reviewed, and speculations regarding the future would be made.
Facultad de Ciencias Exactas
Materia
Ciencias Exactas
Física
Pulsed laser deposition
Stoichiometric deposition
Tc superconducting thin films
Nivel de accesibilidad
acceso abierto
Condiciones de uso
http://creativecommons.org/licenses/by/4.0/
Repositorio
SEDICI (UNLP)
Institución
Universidad Nacional de La Plata
OAI Identificador
oai:sedici.unlp.edu.ar:10915/123207
Acceder
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network_acronym_str SEDICI
repository_id_str 1329
network_name_str SEDICI (UNLP)
spelling Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and futureWu, X. D.Venkatesan, T.Inam, A.Xi, X. X.Li, QiMcLean, W. L.Chang, C. C.Hwang, D. M.Ramesh, RamamoorthyNazar, L.Wilkens, B. J.Schwarz, S. A.Ravi, R. T.Martínez, Jorge AlbertoEngland, P.Tarascon, J. M.Muenchausen, Ross E.Foltyn, S. R.Estler, R. C.C. Dye, RobertGarcia, A. R.Nogar, Nicholas S.Ciencias ExactasFísicaPulsed laser depositionStoichiometric depositionTc superconducting thin filmsPulsed laser deposition (PLD) has been widely used for deposition of high Tc superconducting thin films, and is recognized as one of the best physical vapor techniques for the preparation of these films. The most important advantage of this technique is stoichiometric deposition; films can be made with the same composition as the target. Utilizing PLD, not only thin films but also multilayers and superlattices of high Tc superconductors have been fabricated. In this paper, the performance of the technique will be reviewed, and speculations regarding the future would be made.Facultad de Ciencias Exactas1990info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionArticulohttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfhttp://sedici.unlp.edu.ar/handle/10915/123207enginfo:eu-repo/semantics/altIdentifier/issn/0272-9172info:eu-repo/semantics/altIdentifier/issn/1946-4274info:eu-repo/semantics/altIdentifier/doi/10.1557/proc-191-129info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by/4.0/Creative Commons Attribution 4.0 International (CC BY 4.0)reponame:SEDICI (UNLP)instname:Universidad Nacional de La Platainstacron:UNLP2025-10-22T17:10:10Zoai:sedici.unlp.edu.ar:10915/123207Institucionalhttp://sedici.unlp.edu.ar/Universidad públicaNo correspondehttp://sedici.unlp.edu.ar/oai/snrdalira@sedici.unlp.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:13292025-10-22 17:10:10.29SEDICI (UNLP) - Universidad Nacional de La Platafalse
dc.title.none.fl_str_mv Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future
title Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future
spellingShingle Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future
Wu, X. D.
Ciencias Exactas
Física
Pulsed laser deposition
Stoichiometric deposition
Tc superconducting thin films
title_short Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future
title_full Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future
title_fullStr Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future
title_full_unstemmed Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future
title_sort Pulsed laser deposition of high T<sub>c</sub> superconducting thin films : Present and future
dc.creator.none.fl_str_mv Wu, X. D.
Venkatesan, T.
Inam, A.
Xi, X. X.
Li, Qi
McLean, W. L.
Chang, C. C.
Hwang, D. M.
Ramesh, Ramamoorthy
Nazar, L.
Wilkens, B. J.
Schwarz, S. A.
Ravi, R. T.
Martínez, Jorge Alberto
England, P.
Tarascon, J. M.
Muenchausen, Ross E.
Foltyn, S. R.
Estler, R. C.
C. Dye, Robert
Garcia, A. R.
Nogar, Nicholas S.
author Wu, X. D.
author_facet Wu, X. D.
Venkatesan, T.
Inam, A.
Xi, X. X.
Li, Qi
McLean, W. L.
Chang, C. C.
Hwang, D. M.
Ramesh, Ramamoorthy
Nazar, L.
Wilkens, B. J.
Schwarz, S. A.
Ravi, R. T.
Martínez, Jorge Alberto
England, P.
Tarascon, J. M.
Muenchausen, Ross E.
Foltyn, S. R.
Estler, R. C.
C. Dye, Robert
Garcia, A. R.
Nogar, Nicholas S.
author_role author
author2 Venkatesan, T.
Inam, A.
Xi, X. X.
Li, Qi
McLean, W. L.
Chang, C. C.
Hwang, D. M.
Ramesh, Ramamoorthy
Nazar, L.
Wilkens, B. J.
Schwarz, S. A.
Ravi, R. T.
Martínez, Jorge Alberto
England, P.
Tarascon, J. M.
Muenchausen, Ross E.
Foltyn, S. R.
Estler, R. C.
C. Dye, Robert
Garcia, A. R.
Nogar, Nicholas S.
author2_role author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Ciencias Exactas
Física
Pulsed laser deposition
Stoichiometric deposition
Tc superconducting thin films
topic Ciencias Exactas
Física
Pulsed laser deposition
Stoichiometric deposition
Tc superconducting thin films
dc.description.none.fl_txt_mv Pulsed laser deposition (PLD) has been widely used for deposition of high Tc superconducting thin films, and is recognized as one of the best physical vapor techniques for the preparation of these films. The most important advantage of this technique is stoichiometric deposition; films can be made with the same composition as the target. Utilizing PLD, not only thin films but also multilayers and superlattices of high Tc superconductors have been fabricated. In this paper, the performance of the technique will be reviewed, and speculations regarding the future would be made.
Facultad de Ciencias Exactas
description Pulsed laser deposition (PLD) has been widely used for deposition of high Tc superconducting thin films, and is recognized as one of the best physical vapor techniques for the preparation of these films. The most important advantage of this technique is stoichiometric deposition; films can be made with the same composition as the target. Utilizing PLD, not only thin films but also multilayers and superlattices of high Tc superconductors have been fabricated. In this paper, the performance of the technique will be reviewed, and speculations regarding the future would be made.
publishDate 1990
dc.date.none.fl_str_mv 1990
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
Articulo
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info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://sedici.unlp.edu.ar/handle/10915/123207
url http://sedici.unlp.edu.ar/handle/10915/123207
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/issn/0272-9172
info:eu-repo/semantics/altIdentifier/issn/1946-4274
info:eu-repo/semantics/altIdentifier/doi/10.1557/proc-191-129
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by/4.0/
Creative Commons Attribution 4.0 International (CC BY 4.0)
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by/4.0/
Creative Commons Attribution 4.0 International (CC BY 4.0)
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:SEDICI (UNLP)
instname:Universidad Nacional de La Plata
instacron:UNLP
reponame_str SEDICI (UNLP)
collection SEDICI (UNLP)
instname_str Universidad Nacional de La Plata
instacron_str UNLP
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repository.name.fl_str_mv SEDICI (UNLP) - Universidad Nacional de La Plata
repository.mail.fl_str_mv alira@sedici.unlp.edu.ar
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