In situ electrical characterization of palladium-based single electron transistors made by electromigration technique
- Autores
- Arzubiaga, L.; Golmar, F.; Llopis, R.; Casanova, F.; Hueso, L. E.
- Año de publicación
- 2014
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- We report the fabrication of single electron transistors (SETs) by feedback-controlled electromigration of palladium and palladium-nickel alloy nanowires. We have optimized a gradual electromigration process for obtaining devices consisting of three terminals (source, drain and gate electrodes), which are capacitively coupled to a metallic cluster of nanometric dimensions. This metal nanocluster forms into the inter-electrode channel during the electromigration process and constitutes the active element of each device, acting as a quantum dot that rules the electron flow between source and drain electrodes. The charge transport of the as-fabricated devices shows Coulomb blockade characteristics and the source to drain conductance can be modulated by electrostatic gating. We have thus achieved the fabrication and in situ measurement of palladium-based SETs inside a liquid helium cryostat chamber.
Fil: Arzubiaga, L. CIC nanoGUNE; España
Fil: Golmar, F. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Llopis, R. CIC nanoGUNE; España
Fil: Casanova, F. CIC nanoGUNE; España
Fil: Hueso, L. E. CIC nanoGUNE; España - Fuente
- AIP Advances, 4(11)
- Materia
-
Electricidad
Electrones
Transistores
Paladio
Electrodos
Aleaciones de níquel
Electrostática - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by/3.0/
- Repositorio
- Institución
- Instituto Nacional de Tecnología Industrial
- OAI Identificador
- nuevadc:Golmar2014Electrical_pdf
Ver los metadatos del registro completo
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nuevadc:Golmar2014Electrical_pdf |
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Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) |
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In situ electrical characterization of palladium-based single electron transistors made by electromigration techniqueArzubiaga, L.Golmar, F.Llopis, R.Casanova, F.Hueso, L. E.ElectricidadElectronesTransistoresPaladioElectrodosAleaciones de níquelElectrostáticaWe report the fabrication of single electron transistors (SETs) by feedback-controlled electromigration of palladium and palladium-nickel alloy nanowires. We have optimized a gradual electromigration process for obtaining devices consisting of three terminals (source, drain and gate electrodes), which are capacitively coupled to a metallic cluster of nanometric dimensions. This metal nanocluster forms into the inter-electrode channel during the electromigration process and constitutes the active element of each device, acting as a quantum dot that rules the electron flow between source and drain electrodes. The charge transport of the as-fabricated devices shows Coulomb blockade characteristics and the source to drain conductance can be modulated by electrostatic gating. We have thus achieved the fabrication and in situ measurement of palladium-based SETs inside a liquid helium cryostat chamber.Fil: Arzubiaga, L. CIC nanoGUNE; EspañaFil: Golmar, F. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Llopis, R. CIC nanoGUNE; EspañaFil: Casanova, F. CIC nanoGUNE; EspañaFil: Hueso, L. E. CIC nanoGUNE; EspañaAIP Publishing2014info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfGolmar2014Electrical.pdfhttps://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Golmar20.dir/doc.pdfAIP Advances, 4(11)reponame:Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)instname:Instituto Nacional de Tecnología Industrialenginfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by/3.0/openAccess2025-10-16T10:46:34Znuevadc:Golmar2014Electrical_pdfinstacron:INTIInstitucionalhttps://app.inti.gob.ar/greenstone3/biblioOrganismo científico-tecnológicohttps://argentina.gob.ar/intihttps://app.inti.gob.ar/greenstone3/oaiserver?verb=Identifypfalcato@inti.gob.arArgentinaopendoar:2025-10-16 10:46:35.328Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) - Instituto Nacional de Tecnología Industrialfalse |
dc.title.none.fl_str_mv |
In situ electrical characterization of palladium-based single electron transistors made by electromigration technique |
title |
In situ electrical characterization of palladium-based single electron transistors made by electromigration technique |
spellingShingle |
In situ electrical characterization of palladium-based single electron transistors made by electromigration technique Arzubiaga, L. Electricidad Electrones Transistores Paladio Electrodos Aleaciones de níquel Electrostática |
title_short |
In situ electrical characterization of palladium-based single electron transistors made by electromigration technique |
title_full |
In situ electrical characterization of palladium-based single electron transistors made by electromigration technique |
title_fullStr |
In situ electrical characterization of palladium-based single electron transistors made by electromigration technique |
title_full_unstemmed |
In situ electrical characterization of palladium-based single electron transistors made by electromigration technique |
title_sort |
In situ electrical characterization of palladium-based single electron transistors made by electromigration technique |
dc.creator.none.fl_str_mv |
Arzubiaga, L. Golmar, F. Llopis, R. Casanova, F. Hueso, L. E. |
author |
Arzubiaga, L. |
author_facet |
Arzubiaga, L. Golmar, F. Llopis, R. Casanova, F. Hueso, L. E. |
author_role |
author |
author2 |
Golmar, F. Llopis, R. Casanova, F. Hueso, L. E. |
author2_role |
author author author author |
dc.subject.none.fl_str_mv |
Electricidad Electrones Transistores Paladio Electrodos Aleaciones de níquel Electrostática |
topic |
Electricidad Electrones Transistores Paladio Electrodos Aleaciones de níquel Electrostática |
dc.description.none.fl_txt_mv |
We report the fabrication of single electron transistors (SETs) by feedback-controlled electromigration of palladium and palladium-nickel alloy nanowires. We have optimized a gradual electromigration process for obtaining devices consisting of three terminals (source, drain and gate electrodes), which are capacitively coupled to a metallic cluster of nanometric dimensions. This metal nanocluster forms into the inter-electrode channel during the electromigration process and constitutes the active element of each device, acting as a quantum dot that rules the electron flow between source and drain electrodes. The charge transport of the as-fabricated devices shows Coulomb blockade characteristics and the source to drain conductance can be modulated by electrostatic gating. We have thus achieved the fabrication and in situ measurement of palladium-based SETs inside a liquid helium cryostat chamber. Fil: Arzubiaga, L. CIC nanoGUNE; España Fil: Golmar, F. Instituto Nacional de Tecnología Industrial (INTI); Argentina Fil: Llopis, R. CIC nanoGUNE; España Fil: Casanova, F. CIC nanoGUNE; España Fil: Hueso, L. E. CIC nanoGUNE; España |
description |
We report the fabrication of single electron transistors (SETs) by feedback-controlled electromigration of palladium and palladium-nickel alloy nanowires. We have optimized a gradual electromigration process for obtaining devices consisting of three terminals (source, drain and gate electrodes), which are capacitively coupled to a metallic cluster of nanometric dimensions. This metal nanocluster forms into the inter-electrode channel during the electromigration process and constitutes the active element of each device, acting as a quantum dot that rules the electron flow between source and drain electrodes. The charge transport of the as-fabricated devices shows Coulomb blockade characteristics and the source to drain conductance can be modulated by electrostatic gating. We have thus achieved the fabrication and in situ measurement of palladium-based SETs inside a liquid helium cryostat chamber. |
publishDate |
2014 |
dc.date.none.fl_str_mv |
2014 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
Golmar2014Electrical.pdf https://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Golmar20.dir/doc.pdf |
identifier_str_mv |
Golmar2014Electrical.pdf |
url |
https://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Golmar20.dir/doc.pdf |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by/3.0/ openAccess |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
https://creativecommons.org/licenses/by/3.0/ openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
AIP Publishing |
publisher.none.fl_str_mv |
AIP Publishing |
dc.source.none.fl_str_mv |
AIP Advances, 4(11) reponame:Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) instname:Instituto Nacional de Tecnología Industrial |
reponame_str |
Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) |
collection |
Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) |
instname_str |
Instituto Nacional de Tecnología Industrial |
repository.name.fl_str_mv |
Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) - Instituto Nacional de Tecnología Industrial |
repository.mail.fl_str_mv |
pfalcato@inti.gob.ar |
_version_ |
1846147088185819136 |
score |
12.712165 |