Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K

Autores
Xu, G. J.; Khare, S.V.; Nakayama, Koji S.; Aldao, Celso Manuel; Weaver, J. H.
Año de publicación
2003
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The evolution and equilibrium morphology of Si(100) with 0.1 monolayer of adsorbed Cl was studied at 700 K with variable temperature scanning tunneling microscopy. Chlorine caused surface roughening with monolayer pits and regrowth islands. The aspect ratio of these features then increased with their size because of the surface-stress anisotropy. By analyzing the equilibrium feature shape as a function of size, we found that the ratio of step free energies for A- and B-type steps was Fb/Fa = 2.44 for regrowth islands and 3.33 for pits. These ratios are higher than for clean Si(100), Fb/Fa = 2.13, because the steps are destabilized.
Fil: Xu, G. J.. University of Illinois at Urbana; Estados Unidos
Fil: Khare, S.V.. University of Illinois at Urbana; Estados Unidos
Fil: Nakayama, Koji S.. University of Illinois at Urbana; Estados Unidos
Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; Argentina
Fil: Weaver, J. H.. University of Illinois at Urbana; Estados Unidos
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/77068
Acceder
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spelling Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 KXu, G. J.Khare, S.V.Nakayama, Koji S.Aldao, Celso ManuelWeaver, J. H.https://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1The evolution and equilibrium morphology of Si(100) with 0.1 monolayer of adsorbed Cl was studied at 700 K with variable temperature scanning tunneling microscopy. Chlorine caused surface roughening with monolayer pits and regrowth islands. The aspect ratio of these features then increased with their size because of the surface-stress anisotropy. By analyzing the equilibrium feature shape as a function of size, we found that the ratio of step free energies for A- and B-type steps was Fb/Fa = 2.44 for regrowth islands and 3.33 for pits. These ratios are higher than for clean Si(100), Fb/Fa = 2.13, because the steps are destabilized.Fil: Xu, G. J.. University of Illinois at Urbana; Estados UnidosFil: Khare, S.V.. University of Illinois at Urbana; Estados UnidosFil: Nakayama, Koji S.. University of Illinois at Urbana; Estados UnidosFil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; ArgentinaFil: Weaver, J. H.. University of Illinois at Urbana; Estados UnidosAmerican Physical Society2003-12info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/77068Xu, G. J.; Khare, S.V.; Nakayama, Koji S.; Aldao, Celso Manuel; Weaver, J. H.; Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K; American Physical Society; Physical Review B: Condensed Matter and Materials Physics; 68; 23; 12-2003; 1-5; 2353181098-0121CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/https://journals.aps.org/prb/abstract/10.1103/PhysRevB.68.235318info:eu-repo/semantics/altIdentifier/doi/10.1103/PhysRevB.68.235318info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T09:59:08Zoai:ri.conicet.gov.ar:11336/77068instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 09:59:08.894CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K
title Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K
spellingShingle Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K
Xu, G. J.
title_short Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K
title_full Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K
title_fullStr Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K
title_full_unstemmed Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K
title_sort Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K
dc.creator.none.fl_str_mv Xu, G. J.
Khare, S.V.
Nakayama, Koji S.
Aldao, Celso Manuel
Weaver, J. H.
author Xu, G. J.
author_facet Xu, G. J.
Khare, S.V.
Nakayama, Koji S.
Aldao, Celso Manuel
Weaver, J. H.
author_role author
author2 Khare, S.V.
Nakayama, Koji S.
Aldao, Celso Manuel
Weaver, J. H.
author2_role author
author
author
author
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv The evolution and equilibrium morphology of Si(100) with 0.1 monolayer of adsorbed Cl was studied at 700 K with variable temperature scanning tunneling microscopy. Chlorine caused surface roughening with monolayer pits and regrowth islands. The aspect ratio of these features then increased with their size because of the surface-stress anisotropy. By analyzing the equilibrium feature shape as a function of size, we found that the ratio of step free energies for A- and B-type steps was Fb/Fa = 2.44 for regrowth islands and 3.33 for pits. These ratios are higher than for clean Si(100), Fb/Fa = 2.13, because the steps are destabilized.
Fil: Xu, G. J.. University of Illinois at Urbana; Estados Unidos
Fil: Khare, S.V.. University of Illinois at Urbana; Estados Unidos
Fil: Nakayama, Koji S.. University of Illinois at Urbana; Estados Unidos
Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; Argentina
Fil: Weaver, J. H.. University of Illinois at Urbana; Estados Unidos
description The evolution and equilibrium morphology of Si(100) with 0.1 monolayer of adsorbed Cl was studied at 700 K with variable temperature scanning tunneling microscopy. Chlorine caused surface roughening with monolayer pits and regrowth islands. The aspect ratio of these features then increased with their size because of the surface-stress anisotropy. By analyzing the equilibrium feature shape as a function of size, we found that the ratio of step free energies for A- and B-type steps was Fb/Fa = 2.44 for regrowth islands and 3.33 for pits. These ratios are higher than for clean Si(100), Fb/Fa = 2.13, because the steps are destabilized.
publishDate 2003
dc.date.none.fl_str_mv 2003-12
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/77068
Xu, G. J.; Khare, S.V.; Nakayama, Koji S.; Aldao, Celso Manuel; Weaver, J. H.; Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K; American Physical Society; Physical Review B: Condensed Matter and Materials Physics; 68; 23; 12-2003; 1-5; 235318
1098-0121
CONICET Digital
CONICET
url http://hdl.handle.net/11336/77068
identifier_str_mv Xu, G. J.; Khare, S.V.; Nakayama, Koji S.; Aldao, Celso Manuel; Weaver, J. H.; Step free energies, surface stress, and adsorbate interactions for Cl-Si(100) at 700 K; American Physical Society; Physical Review B: Condensed Matter and Materials Physics; 68; 23; 12-2003; 1-5; 235318
1098-0121
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/https://journals.aps.org/prb/abstract/10.1103/PhysRevB.68.235318
info:eu-repo/semantics/altIdentifier/doi/10.1103/PhysRevB.68.235318
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv American Physical Society
publisher.none.fl_str_mv American Physical Society
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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score 13.070432

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