Adsorbate-induced roughening of Si(100) by interactions at steps

Autores
Butera, R. E.; Mirabella, D. A.; Aldao, Celso Manuel; Weaver, J. H.
Año de publicación
2010
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Through a detailed study of Cl adsorption on Si(100) using scanning-tunneling microscopy, we identified sites at steps where adsorption leads to roughening and the formation of extended pits and regrowth structures. Using the equilibrium occupation probabilities obtained from experiment, we were able to identify first-nearest-neighbor interactions that destabilized the surface and, when included in Monte Carlo simulations, reproduced the observed pit and regrowth structures. These findings force a reevaluation of currently proposed mechanisms for roughening.
Fil: Butera, R. E.. University Of Illinois At Urbana; Estados Unidos
Fil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Weaver, J. H.. University Of Illinois At Urbana; Estados Unidos
Materia
Roughening
Silicon
Steps
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/13841
Acceder
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repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Adsorbate-induced roughening of Si(100) by interactions at stepsButera, R. E.Mirabella, D. A.Aldao, Celso ManuelWeaver, J. H.RougheningSiliconStepshttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1Through a detailed study of Cl adsorption on Si(100) using scanning-tunneling microscopy, we identified sites at steps where adsorption leads to roughening and the formation of extended pits and regrowth structures. Using the equilibrium occupation probabilities obtained from experiment, we were able to identify first-nearest-neighbor interactions that destabilized the surface and, when included in Monte Carlo simulations, reproduced the observed pit and regrowth structures. These findings force a reevaluation of currently proposed mechanisms for roughening.Fil: Butera, R. E.. University Of Illinois At Urbana; Estados UnidosFil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaFil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; ArgentinaFil: Weaver, J. H.. University Of Illinois At Urbana; Estados UnidosAmerican Physical Society2010-07-19info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/13841Butera, R. E.; Mirabella, D. A.; Aldao, Celso Manuel; Weaver, J. H.; Adsorbate-induced roughening of Si(100) by interactions at steps; American Physical Society; Physical Review B; 82; 4; 19-7-2010; 45309-453090163-1829enginfo:eu-repo/semantics/altIdentifier/url/http://journals.aps.org/prb/abstract/10.1103/PhysRevB.82.045309info:eu-repo/semantics/altIdentifier/doi/10.1103/PhysRevB.82.045309info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T10:07:07Zoai:ri.conicet.gov.ar:11336/13841instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 10:07:07.303CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Adsorbate-induced roughening of Si(100) by interactions at steps
title Adsorbate-induced roughening of Si(100) by interactions at steps
spellingShingle Adsorbate-induced roughening of Si(100) by interactions at steps
Butera, R. E.
Roughening
Silicon
Steps
title_short Adsorbate-induced roughening of Si(100) by interactions at steps
title_full Adsorbate-induced roughening of Si(100) by interactions at steps
title_fullStr Adsorbate-induced roughening of Si(100) by interactions at steps
title_full_unstemmed Adsorbate-induced roughening of Si(100) by interactions at steps
title_sort Adsorbate-induced roughening of Si(100) by interactions at steps
dc.creator.none.fl_str_mv Butera, R. E.
Mirabella, D. A.
Aldao, Celso Manuel
Weaver, J. H.
author Butera, R. E.
author_facet Butera, R. E.
Mirabella, D. A.
Aldao, Celso Manuel
Weaver, J. H.
author_role author
author2 Mirabella, D. A.
Aldao, Celso Manuel
Weaver, J. H.
author2_role author
author
author
dc.subject.none.fl_str_mv Roughening
Silicon
Steps
topic Roughening
Silicon
Steps
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv Through a detailed study of Cl adsorption on Si(100) using scanning-tunneling microscopy, we identified sites at steps where adsorption leads to roughening and the formation of extended pits and regrowth structures. Using the equilibrium occupation probabilities obtained from experiment, we were able to identify first-nearest-neighbor interactions that destabilized the surface and, when included in Monte Carlo simulations, reproduced the observed pit and regrowth structures. These findings force a reevaluation of currently proposed mechanisms for roughening.
Fil: Butera, R. E.. University Of Illinois At Urbana; Estados Unidos
Fil: Mirabella, D. A.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Aldao, Celso Manuel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Mar del Plata. Instituto de Investigación en Ciencia y Tecnología de Materiales (i); Argentina. Universidad Nacional de Mar del Plata. Facultad de Ingeniería; Argentina
Fil: Weaver, J. H.. University Of Illinois At Urbana; Estados Unidos
description Through a detailed study of Cl adsorption on Si(100) using scanning-tunneling microscopy, we identified sites at steps where adsorption leads to roughening and the formation of extended pits and regrowth structures. Using the equilibrium occupation probabilities obtained from experiment, we were able to identify first-nearest-neighbor interactions that destabilized the surface and, when included in Monte Carlo simulations, reproduced the observed pit and regrowth structures. These findings force a reevaluation of currently proposed mechanisms for roughening.
publishDate 2010
dc.date.none.fl_str_mv 2010-07-19
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/13841
Butera, R. E.; Mirabella, D. A.; Aldao, Celso Manuel; Weaver, J. H.; Adsorbate-induced roughening of Si(100) by interactions at steps; American Physical Society; Physical Review B; 82; 4; 19-7-2010; 45309-45309
0163-1829
url http://hdl.handle.net/11336/13841
identifier_str_mv Butera, R. E.; Mirabella, D. A.; Aldao, Celso Manuel; Weaver, J. H.; Adsorbate-induced roughening of Si(100) by interactions at steps; American Physical Society; Physical Review B; 82; 4; 19-7-2010; 45309-45309
0163-1829
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/http://journals.aps.org/prb/abstract/10.1103/PhysRevB.82.045309
info:eu-repo/semantics/altIdentifier/doi/10.1103/PhysRevB.82.045309
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv American Physical Society
publisher.none.fl_str_mv American Physical Society
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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score 13.070432

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