A simple three step method for selective placement of organic groups in mesoporous silica thin films

Autores
Franceschini, Esteban Andrés; de la Llave, Ezequiel Pablo; Williams, Federico José; Soler Illia, Galo Juan de Avila Arturo
Año de publicación
2016
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions.
Fil: Franceschini, Esteban Andrés. Comisión Nacional de Energía Atómica. Centro Atómico Constituyentes; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina
Fil: de la Llave, Ezequiel Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina
Fil: Williams, Federico José. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina
Fil: Soler Illia, Galo Juan de Avila Arturo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina. Universidad Nacional de San Martin. Instituto de Nanosistemas; Argentina
Materia
Nanostructures
Sol-Gel Growth
Surface Properties
Thin Films
Vapor Deposition
X-Ray Photo-Emission Spectroscopy (Xps)
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/38607
Acceder
id CONICETDig_a69a8f4d75a8b33121073ce13d7f8f1b
oai_identifier_str oai:ri.conicet.gov.ar:11336/38607
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling A simple three step method for selective placement of organic groups in mesoporous silica thin filmsFranceschini, Esteban Andrésde la Llave, Ezequiel PabloWilliams, Federico JoséSoler Illia, Galo Juan de Avila ArturoNanostructuresSol-Gel GrowthSurface PropertiesThin FilmsVapor DepositionX-Ray Photo-Emission Spectroscopy (Xps)https://purl.org/becyt/ford/1.4https://purl.org/becyt/ford/1Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions.Fil: Franceschini, Esteban Andrés. Comisión Nacional de Energía Atómica. Centro Atómico Constituyentes; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; ArgentinaFil: de la Llave, Ezequiel Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; ArgentinaFil: Williams, Federico José. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; ArgentinaFil: Soler Illia, Galo Juan de Avila Arturo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina. Universidad Nacional de San Martin. Instituto de Nanosistemas; ArgentinaElsevier Science Sa2016-02info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/38607Franceschini, Esteban Andrés; de la Llave, Ezequiel Pablo; Williams, Federico José; Soler Illia, Galo Juan de Avila Arturo; A simple three step method for selective placement of organic groups in mesoporous silica thin films; Elsevier Science Sa; Materials Chemistry and Physics; 169; 2-2016; 82-880254-0584CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1016/j.matchemphys.2015.11.033info:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S0254058415304600info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-22T11:21:09Zoai:ri.conicet.gov.ar:11336/38607instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-22 11:21:10.016CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv A simple three step method for selective placement of organic groups in mesoporous silica thin films
title A simple three step method for selective placement of organic groups in mesoporous silica thin films
spellingShingle A simple three step method for selective placement of organic groups in mesoporous silica thin films
Franceschini, Esteban Andrés
Nanostructures
Sol-Gel Growth
Surface Properties
Thin Films
Vapor Deposition
X-Ray Photo-Emission Spectroscopy (Xps)
title_short A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_full A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_fullStr A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_full_unstemmed A simple three step method for selective placement of organic groups in mesoporous silica thin films
title_sort A simple three step method for selective placement of organic groups in mesoporous silica thin films
dc.creator.none.fl_str_mv Franceschini, Esteban Andrés
de la Llave, Ezequiel Pablo
Williams, Federico José
Soler Illia, Galo Juan de Avila Arturo
author Franceschini, Esteban Andrés
author_facet Franceschini, Esteban Andrés
de la Llave, Ezequiel Pablo
Williams, Federico José
Soler Illia, Galo Juan de Avila Arturo
author_role author
author2 de la Llave, Ezequiel Pablo
Williams, Federico José
Soler Illia, Galo Juan de Avila Arturo
author2_role author
author
author
dc.subject.none.fl_str_mv Nanostructures
Sol-Gel Growth
Surface Properties
Thin Films
Vapor Deposition
X-Ray Photo-Emission Spectroscopy (Xps)
topic Nanostructures
Sol-Gel Growth
Surface Properties
Thin Films
Vapor Deposition
X-Ray Photo-Emission Spectroscopy (Xps)
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.4
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions.
Fil: Franceschini, Esteban Andrés. Comisión Nacional de Energía Atómica. Centro Atómico Constituyentes; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina
Fil: de la Llave, Ezequiel Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina
Fil: Williams, Federico José. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina
Fil: Soler Illia, Galo Juan de Avila Arturo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina. Universidad Nacional de San Martin. Instituto de Nanosistemas; Argentina
description Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions.
publishDate 2016
dc.date.none.fl_str_mv 2016-02
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/38607
Franceschini, Esteban Andrés; de la Llave, Ezequiel Pablo; Williams, Federico José; Soler Illia, Galo Juan de Avila Arturo; A simple three step method for selective placement of organic groups in mesoporous silica thin films; Elsevier Science Sa; Materials Chemistry and Physics; 169; 2-2016; 82-88
0254-0584
CONICET Digital
CONICET
url http://hdl.handle.net/11336/38607
identifier_str_mv Franceschini, Esteban Andrés; de la Llave, Ezequiel Pablo; Williams, Federico José; Soler Illia, Galo Juan de Avila Arturo; A simple three step method for selective placement of organic groups in mesoporous silica thin films; Elsevier Science Sa; Materials Chemistry and Physics; 169; 2-2016; 82-88
0254-0584
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/doi/10.1016/j.matchemphys.2015.11.033
info:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S0254058415304600
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier Science Sa
publisher.none.fl_str_mv Elsevier Science Sa
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1846781710677573632
score 12.982451

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