A simple three step method for selective placement of organic groups in mesoporous silica thin films
- Autores
- Franceschini, Esteban Andrés; de la Llave, Ezequiel Pablo; Williams, Federico José; Soler Illia, Galo Juan de Avila Arturo
- Año de publicación
- 2016
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions.
Fil: Franceschini, Esteban Andrés. Comisión Nacional de Energía Atómica. Centro Atómico Constituyentes; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina
Fil: de la Llave, Ezequiel Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina
Fil: Williams, Federico José. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina
Fil: Soler Illia, Galo Juan de Avila Arturo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina. Universidad Nacional de San Martin. Instituto de Nanosistemas; Argentina - Materia
-
Nanostructures
Sol-Gel Growth
Surface Properties
Thin Films
Vapor Deposition
X-Ray Photo-Emission Spectroscopy (Xps) - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
- Repositorio
- Institución
- Consejo Nacional de Investigaciones Científicas y Técnicas
- OAI Identificador
- oai:ri.conicet.gov.ar:11336/38607
Ver los metadatos del registro completo
id |
CONICETDig_a69a8f4d75a8b33121073ce13d7f8f1b |
---|---|
oai_identifier_str |
oai:ri.conicet.gov.ar:11336/38607 |
network_acronym_str |
CONICETDig |
repository_id_str |
3498 |
network_name_str |
CONICET Digital (CONICET) |
spelling |
A simple three step method for selective placement of organic groups in mesoporous silica thin filmsFranceschini, Esteban Andrésde la Llave, Ezequiel PabloWilliams, Federico JoséSoler Illia, Galo Juan de Avila ArturoNanostructuresSol-Gel GrowthSurface PropertiesThin FilmsVapor DepositionX-Ray Photo-Emission Spectroscopy (Xps)https://purl.org/becyt/ford/1.4https://purl.org/becyt/ford/1Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions.Fil: Franceschini, Esteban Andrés. Comisión Nacional de Energía Atómica. Centro Atómico Constituyentes; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; ArgentinaFil: de la Llave, Ezequiel Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; ArgentinaFil: Williams, Federico José. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; ArgentinaFil: Soler Illia, Galo Juan de Avila Arturo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina. Universidad Nacional de San Martin. Instituto de Nanosistemas; ArgentinaElsevier Science Sa2016-02info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/38607Franceschini, Esteban Andrés; de la Llave, Ezequiel Pablo; Williams, Federico José; Soler Illia, Galo Juan de Avila Arturo; A simple three step method for selective placement of organic groups in mesoporous silica thin films; Elsevier Science Sa; Materials Chemistry and Physics; 169; 2-2016; 82-880254-0584CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1016/j.matchemphys.2015.11.033info:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S0254058415304600info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T09:51:44Zoai:ri.conicet.gov.ar:11336/38607instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 09:51:44.778CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse |
dc.title.none.fl_str_mv |
A simple three step method for selective placement of organic groups in mesoporous silica thin films |
title |
A simple three step method for selective placement of organic groups in mesoporous silica thin films |
spellingShingle |
A simple three step method for selective placement of organic groups in mesoporous silica thin films Franceschini, Esteban Andrés Nanostructures Sol-Gel Growth Surface Properties Thin Films Vapor Deposition X-Ray Photo-Emission Spectroscopy (Xps) |
title_short |
A simple three step method for selective placement of organic groups in mesoporous silica thin films |
title_full |
A simple three step method for selective placement of organic groups in mesoporous silica thin films |
title_fullStr |
A simple three step method for selective placement of organic groups in mesoporous silica thin films |
title_full_unstemmed |
A simple three step method for selective placement of organic groups in mesoporous silica thin films |
title_sort |
A simple three step method for selective placement of organic groups in mesoporous silica thin films |
dc.creator.none.fl_str_mv |
Franceschini, Esteban Andrés de la Llave, Ezequiel Pablo Williams, Federico José Soler Illia, Galo Juan de Avila Arturo |
author |
Franceschini, Esteban Andrés |
author_facet |
Franceschini, Esteban Andrés de la Llave, Ezequiel Pablo Williams, Federico José Soler Illia, Galo Juan de Avila Arturo |
author_role |
author |
author2 |
de la Llave, Ezequiel Pablo Williams, Federico José Soler Illia, Galo Juan de Avila Arturo |
author2_role |
author author author |
dc.subject.none.fl_str_mv |
Nanostructures Sol-Gel Growth Surface Properties Thin Films Vapor Deposition X-Ray Photo-Emission Spectroscopy (Xps) |
topic |
Nanostructures Sol-Gel Growth Surface Properties Thin Films Vapor Deposition X-Ray Photo-Emission Spectroscopy (Xps) |
purl_subject.fl_str_mv |
https://purl.org/becyt/ford/1.4 https://purl.org/becyt/ford/1 |
dc.description.none.fl_txt_mv |
Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions. Fil: Franceschini, Esteban Andrés. Comisión Nacional de Energía Atómica. Centro Atómico Constituyentes; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina Fil: de la Llave, Ezequiel Pablo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina Fil: Williams, Federico José. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina Fil: Soler Illia, Galo Juan de Avila Arturo. Consejo Nacional de Investigaciones Científicas y Técnicas. Oficina de Coordinación Administrativa Ciudad Universitaria. Instituto de Química, Física de los Materiales, Medioambiente y Energía. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Instituto de Química, Física de los Materiales, Medioambiente y Energía; Argentina. Universidad Nacional de San Martin. Instituto de Nanosistemas; Argentina |
description |
Selective functionalization of mesoporous silica thin films was achieved using a three step method. The first step consists in an outer surface functionalization, followed by washing off the structuring agent (second step), leaving the inner surface of the pores free to be functionalized in the third step. This reproducible method permits to anchor a volatile silane group in the outer film surface, and a second type of silane group in the inner surface of the pores. As a concept test we modified the outer surface of a mesoporous silica film with trimethylsilane (-Si-(CH3)3) groups and the inner pore surface with propylamino (-Si-(CH2)3-NH2) groups. The obtained silica films were characterized by Environmental Ellipsometric Porosimetry (EEP), EDS, XPS, contact angle and electron microscopy. The selectively functionalized silica (SF) shows an amount of surface amino functions 4.3 times lower than the one-step functionalized (OSF) silica samples. The method presented here can be extended to a combination of silane chlorides and alkoxides as functional groups, opening up a new route toward the synthesis of multifunctional mesoporous thin films with precisely localized organic functions. |
publishDate |
2016 |
dc.date.none.fl_str_mv |
2016-02 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
http://hdl.handle.net/11336/38607 Franceschini, Esteban Andrés; de la Llave, Ezequiel Pablo; Williams, Federico José; Soler Illia, Galo Juan de Avila Arturo; A simple three step method for selective placement of organic groups in mesoporous silica thin films; Elsevier Science Sa; Materials Chemistry and Physics; 169; 2-2016; 82-88 0254-0584 CONICET Digital CONICET |
url |
http://hdl.handle.net/11336/38607 |
identifier_str_mv |
Franceschini, Esteban Andrés; de la Llave, Ezequiel Pablo; Williams, Federico José; Soler Illia, Galo Juan de Avila Arturo; A simple three step method for selective placement of organic groups in mesoporous silica thin films; Elsevier Science Sa; Materials Chemistry and Physics; 169; 2-2016; 82-88 0254-0584 CONICET Digital CONICET |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.matchemphys.2015.11.033 info:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S0254058415304600 |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by-nc-nd/2.5/ar/ |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/ |
dc.format.none.fl_str_mv |
application/pdf application/pdf application/pdf application/pdf |
dc.publisher.none.fl_str_mv |
Elsevier Science Sa |
publisher.none.fl_str_mv |
Elsevier Science Sa |
dc.source.none.fl_str_mv |
reponame:CONICET Digital (CONICET) instname:Consejo Nacional de Investigaciones Científicas y Técnicas |
reponame_str |
CONICET Digital (CONICET) |
collection |
CONICET Digital (CONICET) |
instname_str |
Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.name.fl_str_mv |
CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.mail.fl_str_mv |
dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar |
_version_ |
1844613589495709696 |
score |
13.070432 |