SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4

Autores
Alcaraz, A. N.; Codnia, Jorge; Azcárate, María Laura
Año de publicación
2009
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well.
Fil: Alcaraz, A. N.. Universidad de Buenos Aires. Facultad de Ingeniería. Departamento de Física; Argentina
Fil: Codnia, Jorge. Consejo Nacional de Investigaciones Científicas y Técnicas. Instituto de Investigaciones Científicas y Técnicas para la Defensa. Centro de Investigación en Láseres y Aplicaciones; Argentina
Fil: Azcárate, María Laura. Consejo Nacional de Investigaciones Científicas y Técnicas. Instituto de Investigaciones Científicas y Técnicas para la Defensa. Centro de Investigación en Láseres y Aplicaciones; Argentina
Materia
Infrared Multiphoton Dissociation
Reaction Rate
Silicon Tetrafluoride
Trifluorosilyl
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/82011
Acceder
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network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4Alcaraz, A. N.Codnia, JorgeAzcárate, María LauraInfrared Multiphoton DissociationReaction RateSilicon TetrafluorideTrifluorosilylhttps://purl.org/becyt/ford/1.4https://purl.org/becyt/ford/1The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well.Fil: Alcaraz, A. N.. Universidad de Buenos Aires. Facultad de Ingeniería. Departamento de Física; ArgentinaFil: Codnia, Jorge. Consejo Nacional de Investigaciones Científicas y Técnicas. Instituto de Investigaciones Científicas y Técnicas para la Defensa. Centro de Investigación en Láseres y Aplicaciones; ArgentinaFil: Azcárate, María Laura. Consejo Nacional de Investigaciones Científicas y Técnicas. Instituto de Investigaciones Científicas y Técnicas para la Defensa. Centro de Investigación en Láseres y Aplicaciones; ArgentinaElsevier Science Sa2009-06info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/82011Alcaraz, A. N.; Codnia, Jorge; Azcárate, María Laura; SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4; Elsevier Science Sa; Journal of Photochemistry and Photobiology A: Chemistry; 205; 2-3; 6-2009; 79-831010-6030CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S1010603009001488info:eu-repo/semantics/altIdentifier/doi/10.1016/j.jphotochem.2009.04.009info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T10:26:21Zoai:ri.conicet.gov.ar:11336/82011instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 10:26:21.913CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
spellingShingle SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
Alcaraz, A. N.
Infrared Multiphoton Dissociation
Reaction Rate
Silicon Tetrafluoride
Trifluorosilyl
title_short SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_full SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_fullStr SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_full_unstemmed SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
title_sort SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4
dc.creator.none.fl_str_mv Alcaraz, A. N.
Codnia, Jorge
Azcárate, María Laura
author Alcaraz, A. N.
author_facet Alcaraz, A. N.
Codnia, Jorge
Azcárate, María Laura
author_role author
author2 Codnia, Jorge
Azcárate, María Laura
author2_role author
author
dc.subject.none.fl_str_mv Infrared Multiphoton Dissociation
Reaction Rate
Silicon Tetrafluoride
Trifluorosilyl
topic Infrared Multiphoton Dissociation
Reaction Rate
Silicon Tetrafluoride
Trifluorosilyl
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.4
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well.
Fil: Alcaraz, A. N.. Universidad de Buenos Aires. Facultad de Ingeniería. Departamento de Física; Argentina
Fil: Codnia, Jorge. Consejo Nacional de Investigaciones Científicas y Técnicas. Instituto de Investigaciones Científicas y Técnicas para la Defensa. Centro de Investigación en Láseres y Aplicaciones; Argentina
Fil: Azcárate, María Laura. Consejo Nacional de Investigaciones Científicas y Técnicas. Instituto de Investigaciones Científicas y Técnicas para la Defensa. Centro de Investigación en Láseres y Aplicaciones; Argentina
description The infrared multiphoton dissociation (IRMPD) of SiF4 in the presence of CH4 has been studied using a tunable CO2 TEA laser. The siliconated reaction products have been identified. A kinetic scheme has been proposed to explain the experimental results. The reaction rate constant of the trifluorosilyl radical, SiF3, with CH4 has been obtained from the numerical solution of the differential equation system associated to the kinetic mechanism proposed as well as from non-linear regression methods. It has been additionally found that this reaction occurs through two channels. The relative importance of each and their reaction rate constants have been determined as well.
publishDate 2009
dc.date.none.fl_str_mv 2009-06
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/82011
Alcaraz, A. N.; Codnia, Jorge; Azcárate, María Laura; SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4; Elsevier Science Sa; Journal of Photochemistry and Photobiology A: Chemistry; 205; 2-3; 6-2009; 79-83
1010-6030
CONICET Digital
CONICET
url http://hdl.handle.net/11336/82011
identifier_str_mv Alcaraz, A. N.; Codnia, Jorge; Azcárate, María Laura; SiF4 IR Photodissociation: Gas phase reactions of SiF3 with CH4; Elsevier Science Sa; Journal of Photochemistry and Photobiology A: Chemistry; 205; 2-3; 6-2009; 79-83
1010-6030
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S1010603009001488
info:eu-repo/semantics/altIdentifier/doi/10.1016/j.jphotochem.2009.04.009
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier Science Sa
publisher.none.fl_str_mv Elsevier Science Sa
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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score 13.070432

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