Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂

Autores
Cobos, Carlos Jorge; Sölter, Lars; Tellbach, Elsa; Troe, J.
Año de publicación
2021
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The thermal dissociation of Si(CH₃)₂F₂ was studied in shock waves between 1400 and 1900 K. UV absorption-time profiles of its dissociation products SiF₂ and CH₃ were monitored. The reaction proceeds as a unimolecular process not far from the high-pressure limit. Comparing modelled and experimental results, an asymmetric representation of the falloff curves was shown to be most realistic. Modelled limiting high-pressure rate constants agreed well with the experimental data. The UV absorption spectrum of SiF₂ was shown to be quasi-continuous, with a maximum near 222 nm and a wavelength-integrated absorption cross section of 4.3 (±1) × 10⁻²³ cm³ (between 195 and 255 nm, base e), the latter being consistent with radiative lifetimes from the literature. Experiments over the range 1900-3200 K showed that SiF₂ was not consumed by a simple bond fission SiF₂ →SiF + F, but by a bimolecular reaction SiF₂ + SiF₂ → SiF + SiF₃ (rate constant in the range 10¹¹-10¹² cm³ mol⁻¹ s⁻¹), followed by the unimolecular dissociation SiF₃ → SiF₂ + F such that the reaction becomes catalyzed by the reactant SiF₂. The analogy to a pathway CF₂ + CF₂ → CF + CF₃, followed by CF₃ → CF₂ + F, in high-temperature fluorocarbon chemistry is stressed. Besides the high-temperature absorption cross sections of SiF₂, analogous data for SiF are also reported.
Facultad de Ciencias Exactas
Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas
Materia
Física
unimolecular dissociation
spectroscopic and kinetic properties
Nivel de accesibilidad
acceso abierto
Condiciones de uso
http://creativecommons.org/licenses/by-nc/3.0/
Repositorio
SEDICI (UNLP)
Institución
Universidad Nacional de La Plata
OAI Identificador
oai:sedici.unlp.edu.ar:10915/133175

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spelling Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂Cobos, Carlos JorgeSölter, LarsTellbach, ElsaTroe, J.Físicaunimolecular dissociationspectroscopic and kinetic propertiesThe thermal dissociation of Si(CH₃)₂F₂ was studied in shock waves between 1400 and 1900 K. UV absorption-time profiles of its dissociation products SiF₂ and CH₃ were monitored. The reaction proceeds as a unimolecular process not far from the high-pressure limit. Comparing modelled and experimental results, an asymmetric representation of the falloff curves was shown to be most realistic. Modelled limiting high-pressure rate constants agreed well with the experimental data. The UV absorption spectrum of SiF₂ was shown to be quasi-continuous, with a maximum near 222 nm and a wavelength-integrated absorption cross section of 4.3 (±1) × 10⁻²³ cm³ (between 195 and 255 nm, base e), the latter being consistent with radiative lifetimes from the literature. Experiments over the range 1900-3200 K showed that SiF₂ was not consumed by a simple bond fission SiF₂ →SiF + F, but by a bimolecular reaction SiF₂ + SiF₂ → SiF + SiF₃ (rate constant in the range 10¹¹-10¹² cm³ mol⁻¹ s⁻¹), followed by the unimolecular dissociation SiF₃ → SiF₂ + F such that the reaction becomes catalyzed by the reactant SiF₂. The analogy to a pathway CF₂ + CF₂ → CF + CF₃, followed by CF₃ → CF₂ + F, in high-temperature fluorocarbon chemistry is stressed. Besides the high-temperature absorption cross sections of SiF₂, analogous data for SiF are also reported.Facultad de Ciencias ExactasInstituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas2021-10info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionArticulohttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdf22437-22442http://sedici.unlp.edu.ar/handle/10915/133175enginfo:eu-repo/semantics/altIdentifier/issn/1463-9084info:eu-repo/semantics/altIdentifier/issn/1463-9076info:eu-repo/semantics/altIdentifier/doi/10.1039/d1cp03298dinfo:eu-repo/semantics/altIdentifier/pmid/34585693info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by-nc/3.0/Creative Commons Attribution-NonCommercial 3.0 Unported (CC BY-NC 3.0)reponame:SEDICI (UNLP)instname:Universidad Nacional de La Platainstacron:UNLP2025-09-29T11:31:52Zoai:sedici.unlp.edu.ar:10915/133175Institucionalhttp://sedici.unlp.edu.ar/Universidad públicaNo correspondehttp://sedici.unlp.edu.ar/oai/snrdalira@sedici.unlp.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:13292025-09-29 11:31:52.449SEDICI (UNLP) - Universidad Nacional de La Platafalse
dc.title.none.fl_str_mv Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
spellingShingle Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
Cobos, Carlos Jorge
Física
unimolecular dissociation
spectroscopic and kinetic properties
title_short Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_full Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_fullStr Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_full_unstemmed Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
title_sort Shock wave and modelling study of the unimolecular dissociation of Si(CH₃)₂F₂: an access to spectroscopic and kinetic properties of SiF₂
dc.creator.none.fl_str_mv Cobos, Carlos Jorge
Sölter, Lars
Tellbach, Elsa
Troe, J.
author Cobos, Carlos Jorge
author_facet Cobos, Carlos Jorge
Sölter, Lars
Tellbach, Elsa
Troe, J.
author_role author
author2 Sölter, Lars
Tellbach, Elsa
Troe, J.
author2_role author
author
author
dc.subject.none.fl_str_mv Física
unimolecular dissociation
spectroscopic and kinetic properties
topic Física
unimolecular dissociation
spectroscopic and kinetic properties
dc.description.none.fl_txt_mv The thermal dissociation of Si(CH₃)₂F₂ was studied in shock waves between 1400 and 1900 K. UV absorption-time profiles of its dissociation products SiF₂ and CH₃ were monitored. The reaction proceeds as a unimolecular process not far from the high-pressure limit. Comparing modelled and experimental results, an asymmetric representation of the falloff curves was shown to be most realistic. Modelled limiting high-pressure rate constants agreed well with the experimental data. The UV absorption spectrum of SiF₂ was shown to be quasi-continuous, with a maximum near 222 nm and a wavelength-integrated absorption cross section of 4.3 (±1) × 10⁻²³ cm³ (between 195 and 255 nm, base e), the latter being consistent with radiative lifetimes from the literature. Experiments over the range 1900-3200 K showed that SiF₂ was not consumed by a simple bond fission SiF₂ →SiF + F, but by a bimolecular reaction SiF₂ + SiF₂ → SiF + SiF₃ (rate constant in the range 10¹¹-10¹² cm³ mol⁻¹ s⁻¹), followed by the unimolecular dissociation SiF₃ → SiF₂ + F such that the reaction becomes catalyzed by the reactant SiF₂. The analogy to a pathway CF₂ + CF₂ → CF + CF₃, followed by CF₃ → CF₂ + F, in high-temperature fluorocarbon chemistry is stressed. Besides the high-temperature absorption cross sections of SiF₂, analogous data for SiF are also reported.
Facultad de Ciencias Exactas
Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas
description The thermal dissociation of Si(CH₃)₂F₂ was studied in shock waves between 1400 and 1900 K. UV absorption-time profiles of its dissociation products SiF₂ and CH₃ were monitored. The reaction proceeds as a unimolecular process not far from the high-pressure limit. Comparing modelled and experimental results, an asymmetric representation of the falloff curves was shown to be most realistic. Modelled limiting high-pressure rate constants agreed well with the experimental data. The UV absorption spectrum of SiF₂ was shown to be quasi-continuous, with a maximum near 222 nm and a wavelength-integrated absorption cross section of 4.3 (±1) × 10⁻²³ cm³ (between 195 and 255 nm, base e), the latter being consistent with radiative lifetimes from the literature. Experiments over the range 1900-3200 K showed that SiF₂ was not consumed by a simple bond fission SiF₂ →SiF + F, but by a bimolecular reaction SiF₂ + SiF₂ → SiF + SiF₃ (rate constant in the range 10¹¹-10¹² cm³ mol⁻¹ s⁻¹), followed by the unimolecular dissociation SiF₃ → SiF₂ + F such that the reaction becomes catalyzed by the reactant SiF₂. The analogy to a pathway CF₂ + CF₂ → CF + CF₃, followed by CF₃ → CF₂ + F, in high-temperature fluorocarbon chemistry is stressed. Besides the high-temperature absorption cross sections of SiF₂, analogous data for SiF are also reported.
publishDate 2021
dc.date.none.fl_str_mv 2021-10
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
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status_str publishedVersion
dc.identifier.none.fl_str_mv http://sedici.unlp.edu.ar/handle/10915/133175
url http://sedici.unlp.edu.ar/handle/10915/133175
dc.language.none.fl_str_mv eng
language eng
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info:eu-repo/semantics/altIdentifier/issn/1463-9076
info:eu-repo/semantics/altIdentifier/doi/10.1039/d1cp03298d
info:eu-repo/semantics/altIdentifier/pmid/34585693
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by-nc/3.0/
Creative Commons Attribution-NonCommercial 3.0 Unported (CC BY-NC 3.0)
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by-nc/3.0/
Creative Commons Attribution-NonCommercial 3.0 Unported (CC BY-NC 3.0)
dc.format.none.fl_str_mv application/pdf
22437-22442
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repository.name.fl_str_mv SEDICI (UNLP) - Universidad Nacional de La Plata
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