Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films

Autores
Orrillo, P. A.; Santalla, S. N.; Cuerno, R.; Vázquez, L.; Ribotta, S. B.; Gassa, Liliana Mabel; Mompean, F. J.; Salvarezza, Roberto Carlos; Vela, María Elena
Año de publicación
2017
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
We have assessed the stabilizing role that induced co-deposition has in the growth of nanostructured NiW alloy films by electrodeposition on polished steel substrates, under pulsed galvanostatic conditions. We have compared the kinetic roughening properties of NiW films with those of Ni films deposited under the same conditions, as assessed by Atomic Force Microscopy. The surface morphologies of both systems are super-rough at short times, but differ at long times: while a cauliflower-like structure dominates for Ni, the surfaces of NiW films display a nodular morphology consistent with more stable, conformal growth, whose height fluctuations are in the Kardar-Parisi- Zhang universality class of rough two-dimensional interfaces. These differences are explained by the mechanisms controlling surface growth in each case: mass transport through the electrolyte (Ni) and attachment of the incoming species to the growing interface (NiW). Thus, the long-time conformal growth regime is characteristic of electrochemical induced co-deposition under current conditions in which surface kinetics is hindered due to a complex reaction mechanism. These results agree with a theoretical model of surface growth in diffusion-limited systems, in which the key parameter is the relative importance of mass transport with respect to the kinetics of the attachment reaction.
Facultad de Ciencias Exactas
Materia
Química
Física
electrochemistry
statistical physics
Nivel de accesibilidad
acceso abierto
Condiciones de uso
http://creativecommons.org/licenses/by/4.0/
Repositorio
SEDICI (UNLP)
Institución
Universidad Nacional de La Plata
OAI Identificador
oai:sedici.unlp.edu.ar:10915/78393

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oai_identifier_str oai:sedici.unlp.edu.ar:10915/78393
network_acronym_str SEDICI
repository_id_str 1329
network_name_str SEDICI (UNLP)
spelling Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy filmsOrrillo, P. A.Santalla, S. N.Cuerno, R.Vázquez, L.Ribotta, S. B.Gassa, Liliana MabelMompean, F. J.Salvarezza, Roberto CarlosVela, María ElenaQuímicaFísicaelectrochemistrystatistical physicsWe have assessed the stabilizing role that induced co-deposition has in the growth of nanostructured NiW alloy films by electrodeposition on polished steel substrates, under pulsed galvanostatic conditions. We have compared the kinetic roughening properties of NiW films with those of Ni films deposited under the same conditions, as assessed by Atomic Force Microscopy. The surface morphologies of both systems are super-rough at short times, but differ at long times: while a cauliflower-like structure dominates for Ni, the surfaces of NiW films display a nodular morphology consistent with more stable, conformal growth, whose height fluctuations are in the Kardar-Parisi- Zhang universality class of rough two-dimensional interfaces. These differences are explained by the mechanisms controlling surface growth in each case: mass transport through the electrolyte (Ni) and attachment of the incoming species to the growing interface (NiW). Thus, the long-time conformal growth regime is characteristic of electrochemical induced co-deposition under current conditions in which surface kinetics is hindered due to a complex reaction mechanism. These results agree with a theoretical model of surface growth in diffusion-limited systems, in which the key parameter is the relative importance of mass transport with respect to the kinetics of the attachment reaction.Facultad de Ciencias Exactas2017-12info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionArticulohttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfhttp://sedici.unlp.edu.ar/handle/10915/78393enginfo:eu-repo/semantics/altIdentifier/issn/2045-2322info:eu-repo/semantics/altIdentifier/doi/10.1038/s41598-017-18155-7info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by/4.0/Creative Commons Attribution 4.0 International (CC BY 4.0)reponame:SEDICI (UNLP)instname:Universidad Nacional de La Platainstacron:UNLP2025-09-29T11:14:08Zoai:sedici.unlp.edu.ar:10915/78393Institucionalhttp://sedici.unlp.edu.ar/Universidad públicaNo correspondehttp://sedici.unlp.edu.ar/oai/snrdalira@sedici.unlp.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:13292025-09-29 11:14:08.736SEDICI (UNLP) - Universidad Nacional de La Platafalse
dc.title.none.fl_str_mv Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films
title Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films
spellingShingle Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films
Orrillo, P. A.
Química
Física
electrochemistry
statistical physics
title_short Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films
title_full Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films
title_fullStr Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films
title_full_unstemmed Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films
title_sort Morphological stabilization and KPZ scaling by electrochemically induced co-deposition of nanostructured NiW alloy films
dc.creator.none.fl_str_mv Orrillo, P. A.
Santalla, S. N.
Cuerno, R.
Vázquez, L.
Ribotta, S. B.
Gassa, Liliana Mabel
Mompean, F. J.
Salvarezza, Roberto Carlos
Vela, María Elena
author Orrillo, P. A.
author_facet Orrillo, P. A.
Santalla, S. N.
Cuerno, R.
Vázquez, L.
Ribotta, S. B.
Gassa, Liliana Mabel
Mompean, F. J.
Salvarezza, Roberto Carlos
Vela, María Elena
author_role author
author2 Santalla, S. N.
Cuerno, R.
Vázquez, L.
Ribotta, S. B.
Gassa, Liliana Mabel
Mompean, F. J.
Salvarezza, Roberto Carlos
Vela, María Elena
author2_role author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Química
Física
electrochemistry
statistical physics
topic Química
Física
electrochemistry
statistical physics
dc.description.none.fl_txt_mv We have assessed the stabilizing role that induced co-deposition has in the growth of nanostructured NiW alloy films by electrodeposition on polished steel substrates, under pulsed galvanostatic conditions. We have compared the kinetic roughening properties of NiW films with those of Ni films deposited under the same conditions, as assessed by Atomic Force Microscopy. The surface morphologies of both systems are super-rough at short times, but differ at long times: while a cauliflower-like structure dominates for Ni, the surfaces of NiW films display a nodular morphology consistent with more stable, conformal growth, whose height fluctuations are in the Kardar-Parisi- Zhang universality class of rough two-dimensional interfaces. These differences are explained by the mechanisms controlling surface growth in each case: mass transport through the electrolyte (Ni) and attachment of the incoming species to the growing interface (NiW). Thus, the long-time conformal growth regime is characteristic of electrochemical induced co-deposition under current conditions in which surface kinetics is hindered due to a complex reaction mechanism. These results agree with a theoretical model of surface growth in diffusion-limited systems, in which the key parameter is the relative importance of mass transport with respect to the kinetics of the attachment reaction.
Facultad de Ciencias Exactas
description We have assessed the stabilizing role that induced co-deposition has in the growth of nanostructured NiW alloy films by electrodeposition on polished steel substrates, under pulsed galvanostatic conditions. We have compared the kinetic roughening properties of NiW films with those of Ni films deposited under the same conditions, as assessed by Atomic Force Microscopy. The surface morphologies of both systems are super-rough at short times, but differ at long times: while a cauliflower-like structure dominates for Ni, the surfaces of NiW films display a nodular morphology consistent with more stable, conformal growth, whose height fluctuations are in the Kardar-Parisi- Zhang universality class of rough two-dimensional interfaces. These differences are explained by the mechanisms controlling surface growth in each case: mass transport through the electrolyte (Ni) and attachment of the incoming species to the growing interface (NiW). Thus, the long-time conformal growth regime is characteristic of electrochemical induced co-deposition under current conditions in which surface kinetics is hindered due to a complex reaction mechanism. These results agree with a theoretical model of surface growth in diffusion-limited systems, in which the key parameter is the relative importance of mass transport with respect to the kinetics of the attachment reaction.
publishDate 2017
dc.date.none.fl_str_mv 2017-12
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
Articulo
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://sedici.unlp.edu.ar/handle/10915/78393
url http://sedici.unlp.edu.ar/handle/10915/78393
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/issn/2045-2322
info:eu-repo/semantics/altIdentifier/doi/10.1038/s41598-017-18155-7
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by/4.0/
Creative Commons Attribution 4.0 International (CC BY 4.0)
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by/4.0/
Creative Commons Attribution 4.0 International (CC BY 4.0)
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:SEDICI (UNLP)
instname:Universidad Nacional de La Plata
instacron:UNLP
reponame_str SEDICI (UNLP)
collection SEDICI (UNLP)
instname_str Universidad Nacional de La Plata
instacron_str UNLP
institution UNLP
repository.name.fl_str_mv SEDICI (UNLP) - Universidad Nacional de La Plata
repository.mail.fl_str_mv alira@sedici.unlp.edu.ar
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