SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and IN...
- Autores
- Tonina, A.; Currás, M.; Navarro, M.
- Año de publicación
- 2014
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- The CIPM MRA states that its technical basis is a set of results obtained in a course of time through key comparisons carried out by the Consultative Committees of the CIPM, the BIPM and the Regional Metrology Organizations (RMOs). As part of this process, INTI (Argentina) has participated in several key and supplementary comparisons. By means of procedures for linking key comparison data, a bilateral comparison would help to provide assurance of equality in measurements between the participating laboratories. With this end, the comparison SIM.EM-S9.b of 1 ohm and 10 kiloohm standard resistors of INIMET (Cuba) and INTI was carried out from March to October 2012. The obtained results were very good. They show that the resistance standards maintained by INTI and INIMET were equivalent, within their combined uncertainties, on the mean date of the comparison.
Fil: Tonina, A. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Currás, M. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Navarro, M. Instituto Nacional de Investigaciones en Metrología (INIMET); Cuba - Fuente
- Metrología, 51
- Materia
-
Sistema Interamericano de Metrología
Metrología
Calibración
Patrones
Comparadores
Resistores - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by/3.0/
- Repositorio
- Institución
- Instituto Nacional de Tecnología Industrial
- OAI Identificador
- nuevadc:Tonina2014SIM_pdf
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SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)Tonina, A.Currás, M.Navarro, M.Sistema Interamericano de MetrologíaMetrologíaCalibraciónPatronesComparadoresResistoresThe CIPM MRA states that its technical basis is a set of results obtained in a course of time through key comparisons carried out by the Consultative Committees of the CIPM, the BIPM and the Regional Metrology Organizations (RMOs). As part of this process, INTI (Argentina) has participated in several key and supplementary comparisons. By means of procedures for linking key comparison data, a bilateral comparison would help to provide assurance of equality in measurements between the participating laboratories. With this end, the comparison SIM.EM-S9.b of 1 ohm and 10 kiloohm standard resistors of INIMET (Cuba) and INTI was carried out from March to October 2012. The obtained results were very good. They show that the resistance standards maintained by INTI and INIMET were equivalent, within their combined uncertainties, on the mean date of the comparison.Fil: Tonina, A. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Currás, M. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Navarro, M. Instituto Nacional de Investigaciones en Metrología (INIMET); CubaIOP Publishing2014info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfTonina2014SIM.pdfhttps://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Tonina20.dir/doc.pdfMetrología, 51reponame:Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)instname:Instituto Nacional de Tecnología Industrialenginfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by/3.0/openAccess2025-09-04T11:43:04Znuevadc:Tonina2014SIM_pdfinstacron:INTIInstitucionalhttps://app.inti.gob.ar/greenstone3/biblioOrganismo científico-tecnológicohttps://argentina.gob.ar/intihttps://app.inti.gob.ar/greenstone3/oaiserver?verb=Identifypfalcato@inti.gob.arArgentinaopendoar:2025-09-04 11:43:05.237Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) - Instituto Nacional de Tecnología Industrialfalse |
dc.title.none.fl_str_mv |
SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina) |
title |
SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina) |
spellingShingle |
SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina) Tonina, A. Sistema Interamericano de Metrología Metrología Calibración Patrones Comparadores Resistores |
title_short |
SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina) |
title_full |
SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina) |
title_fullStr |
SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina) |
title_full_unstemmed |
SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina) |
title_sort |
SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina) |
dc.creator.none.fl_str_mv |
Tonina, A. Currás, M. Navarro, M. |
author |
Tonina, A. |
author_facet |
Tonina, A. Currás, M. Navarro, M. |
author_role |
author |
author2 |
Currás, M. Navarro, M. |
author2_role |
author author |
dc.subject.none.fl_str_mv |
Sistema Interamericano de Metrología Metrología Calibración Patrones Comparadores Resistores |
topic |
Sistema Interamericano de Metrología Metrología Calibración Patrones Comparadores Resistores |
dc.description.none.fl_txt_mv |
The CIPM MRA states that its technical basis is a set of results obtained in a course of time through key comparisons carried out by the Consultative Committees of the CIPM, the BIPM and the Regional Metrology Organizations (RMOs). As part of this process, INTI (Argentina) has participated in several key and supplementary comparisons. By means of procedures for linking key comparison data, a bilateral comparison would help to provide assurance of equality in measurements between the participating laboratories. With this end, the comparison SIM.EM-S9.b of 1 ohm and 10 kiloohm standard resistors of INIMET (Cuba) and INTI was carried out from March to October 2012. The obtained results were very good. They show that the resistance standards maintained by INTI and INIMET were equivalent, within their combined uncertainties, on the mean date of the comparison. Fil: Tonina, A. Instituto Nacional de Tecnología Industrial (INTI); Argentina Fil: Currás, M. Instituto Nacional de Tecnología Industrial (INTI); Argentina Fil: Navarro, M. Instituto Nacional de Investigaciones en Metrología (INIMET); Cuba |
description |
The CIPM MRA states that its technical basis is a set of results obtained in a course of time through key comparisons carried out by the Consultative Committees of the CIPM, the BIPM and the Regional Metrology Organizations (RMOs). As part of this process, INTI (Argentina) has participated in several key and supplementary comparisons. By means of procedures for linking key comparison data, a bilateral comparison would help to provide assurance of equality in measurements between the participating laboratories. With this end, the comparison SIM.EM-S9.b of 1 ohm and 10 kiloohm standard resistors of INIMET (Cuba) and INTI was carried out from March to October 2012. The obtained results were very good. They show that the resistance standards maintained by INTI and INIMET were equivalent, within their combined uncertainties, on the mean date of the comparison. |
publishDate |
2014 |
dc.date.none.fl_str_mv |
2014 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
Tonina2014SIM.pdf https://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Tonina20.dir/doc.pdf |
identifier_str_mv |
Tonina2014SIM.pdf |
url |
https://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Tonina20.dir/doc.pdf |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by/3.0/ openAccess |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
https://creativecommons.org/licenses/by/3.0/ openAccess |
dc.format.none.fl_str_mv |
application/pdf |
dc.publisher.none.fl_str_mv |
IOP Publishing |
publisher.none.fl_str_mv |
IOP Publishing |
dc.source.none.fl_str_mv |
Metrología, 51 reponame:Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) instname:Instituto Nacional de Tecnología Industrial |
reponame_str |
Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) |
collection |
Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) |
instname_str |
Instituto Nacional de Tecnología Industrial |
repository.name.fl_str_mv |
Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) - Instituto Nacional de Tecnología Industrial |
repository.mail.fl_str_mv |
pfalcato@inti.gob.ar |
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1842346559048515584 |
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12.623145 |