SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and IN...

Autores
Tonina, A.; Currás, M.; Navarro, M.
Año de publicación
2014
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The CIPM MRA states that its technical basis is a set of results obtained in a course of time through key comparisons carried out by the Consultative Committees of the CIPM, the BIPM and the Regional Metrology Organizations (RMOs). As part of this process, INTI (Argentina) has participated in several key and supplementary comparisons. By means of procedures for linking key comparison data, a bilateral comparison would help to provide assurance of equality in measurements between the participating laboratories. With this end, the comparison SIM.EM-S9.b of 1 ohm and 10 kiloohm standard resistors of INIMET (Cuba) and INTI was carried out from March to October 2012. The obtained results were very good. They show that the resistance standards maintained by INTI and INIMET were equivalent, within their combined uncertainties, on the mean date of the comparison.
Fil: Tonina, A. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Currás, M. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Navarro, M. Instituto Nacional de Investigaciones en Metrología (INIMET); Cuba
Fuente
Metrología, 51
Materia
Sistema Interamericano de Metrología
Metrología
Calibración
Patrones
Comparadores
Resistores
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by/3.0/
Repositorio
Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
Institución
Instituto Nacional de Tecnología Industrial
OAI Identificador
nuevadc:Tonina2014SIM_pdf
Acceder
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oai_identifier_str nuevadc:Tonina2014SIM_pdf
network_acronym_str RIINTI
repository_id_str
network_name_str Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
spelling SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)Tonina, A.Currás, M.Navarro, M.Sistema Interamericano de MetrologíaMetrologíaCalibraciónPatronesComparadoresResistoresThe CIPM MRA states that its technical basis is a set of results obtained in a course of time through key comparisons carried out by the Consultative Committees of the CIPM, the BIPM and the Regional Metrology Organizations (RMOs). As part of this process, INTI (Argentina) has participated in several key and supplementary comparisons. By means of procedures for linking key comparison data, a bilateral comparison would help to provide assurance of equality in measurements between the participating laboratories. With this end, the comparison SIM.EM-S9.b of 1 ohm and 10 kiloohm standard resistors of INIMET (Cuba) and INTI was carried out from March to October 2012. The obtained results were very good. They show that the resistance standards maintained by INTI and INIMET were equivalent, within their combined uncertainties, on the mean date of the comparison.Fil: Tonina, A. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Currás, M. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Navarro, M. Instituto Nacional de Investigaciones en Metrología (INIMET); CubaIOP Publishing2014info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfTonina2014SIM.pdfhttps://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Tonina20.dir/doc.pdfMetrología, 51reponame:Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)instname:Instituto Nacional de Tecnología Industrialenginfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by/3.0/openAccess2025-09-29T15:02:09Znuevadc:Tonina2014SIM_pdfinstacron:INTIInstitucionalhttps://app.inti.gob.ar/greenstone3/biblioOrganismo científico-tecnológicohttps://argentina.gob.ar/intihttps://app.inti.gob.ar/greenstone3/oaiserver?verb=Identifypfalcato@inti.gob.arArgentinaopendoar:2025-09-29 15:02:09.386Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) - Instituto Nacional de Tecnología Industrialfalse
dc.title.none.fl_str_mv SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)
title SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)
spellingShingle SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)
Tonina, A.
Sistema Interamericano de Metrología
Metrología
Calibración
Patrones
Comparadores
Resistores
title_short SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)
title_full SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)
title_fullStr SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)
title_full_unstemmed SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)
title_sort SIM.EM – S9b, 1 Ω and 10 kΩ : 2012 Resistance Bilateral Comparison between SIM/COOMET Laboratories. Comparison of Resistance Standards at 1 Ω and 10 kΩ between INIMET (Cuba) and INTI (Argentina)
dc.creator.none.fl_str_mv Tonina, A.
Currás, M.
Navarro, M.
author Tonina, A.
author_facet Tonina, A.
Currás, M.
Navarro, M.
author_role author
author2 Currás, M.
Navarro, M.
author2_role author
author
dc.subject.none.fl_str_mv Sistema Interamericano de Metrología
Metrología
Calibración
Patrones
Comparadores
Resistores
topic Sistema Interamericano de Metrología
Metrología
Calibración
Patrones
Comparadores
Resistores
dc.description.none.fl_txt_mv The CIPM MRA states that its technical basis is a set of results obtained in a course of time through key comparisons carried out by the Consultative Committees of the CIPM, the BIPM and the Regional Metrology Organizations (RMOs). As part of this process, INTI (Argentina) has participated in several key and supplementary comparisons. By means of procedures for linking key comparison data, a bilateral comparison would help to provide assurance of equality in measurements between the participating laboratories. With this end, the comparison SIM.EM-S9.b of 1 ohm and 10 kiloohm standard resistors of INIMET (Cuba) and INTI was carried out from March to October 2012. The obtained results were very good. They show that the resistance standards maintained by INTI and INIMET were equivalent, within their combined uncertainties, on the mean date of the comparison.
Fil: Tonina, A. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Currás, M. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Navarro, M. Instituto Nacional de Investigaciones en Metrología (INIMET); Cuba
description The CIPM MRA states that its technical basis is a set of results obtained in a course of time through key comparisons carried out by the Consultative Committees of the CIPM, the BIPM and the Regional Metrology Organizations (RMOs). As part of this process, INTI (Argentina) has participated in several key and supplementary comparisons. By means of procedures for linking key comparison data, a bilateral comparison would help to provide assurance of equality in measurements between the participating laboratories. With this end, the comparison SIM.EM-S9.b of 1 ohm and 10 kiloohm standard resistors of INIMET (Cuba) and INTI was carried out from March to October 2012. The obtained results were very good. They show that the resistance standards maintained by INTI and INIMET were equivalent, within their combined uncertainties, on the mean date of the comparison.
publishDate 2014
dc.date.none.fl_str_mv 2014
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv Tonina2014SIM.pdf
https://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Tonina20.dir/doc.pdf
identifier_str_mv Tonina2014SIM.pdf
url https://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Tonina20.dir/doc.pdf
dc.language.none.fl_str_mv eng
language eng
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by/3.0/
openAccess
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by/3.0/
openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv IOP Publishing
publisher.none.fl_str_mv IOP Publishing
dc.source.none.fl_str_mv Metrología, 51
reponame:Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
instname:Instituto Nacional de Tecnología Industrial
reponame_str Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
collection Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
instname_str Instituto Nacional de Tecnología Industrial
repository.name.fl_str_mv Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) - Instituto Nacional de Tecnología Industrial
repository.mail.fl_str_mv pfalcato@inti.gob.ar
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score 12.559606

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