Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)

Autores
Pratt, K. W.; Ortiz-Aparicio, J. L.; Matehuala-Sánchez, F. J.; Pawlina, M.; Kozowski, W.; Borges, P. P.; Silva Junior, W. B. da.; Borinsky, M. B.; Hernández, A.; Puelles, M.; Hatamleh, N.; Acosta, O.; Nunes, J.; Guiomar Lito, M. J.; Camões, M. F.; Filipe, E.; Hwang, E.; Lim, Y.; Bing, W.; Qian, W.; Chao, W.; Hioki, A.; Asakai, T.; Máriássy, M.; Hanková, Z.; Nagibin, S.; Manska, O.; Gavrilkin, V.; Kutovoy, V.
Año de publicación
2013
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
This key comparison (KC), CCQM-K73, was performed to demonstrate the capability of the participating National Metrology Institutes (NMIs) to measure the amount content of H+ , νH + , in an HCl solution with a nominal νH + of 0.1 mol·kg-1 . A parallel Pilot Study, CCQM-P19.2, was performed for NMIs that did not desire to participate in the KC. The comparison was a joint activity of the Electrochemical Working Group (EAWG) and Inorganic Analysis Working Group (IAWG) of the CCQM and was coordinated by NIST (USA) and CENAM (México). The method of determination of νH + was left to the individual participant. All participants used either coulometry or titrimetry with potentiometric determination of the endpoint. The agreement of the results was not commensurate with the claimed uncertainties of the subset of participants that claimed small uncertainties for this determination. A workshop on technical issues relating to the CCQM-K73 measurements was conducted at the joint IAWGEAWG meeting at the Bureau International des Poids et Mesures (BIPM), Paris (Sèvres) in April 2010. Several possible sources of bias were investigated, but none could explain the observed dispersion among the participants’ results. In the absence of a specific cause for the dispersion, the IAWG and EAWG decided to assign a Key Comparison Reference Value, KCRV, and standard uncertainty of the KCRV, uKCRV, based on the DerSimonian-Laird statistical estimator. The uKCRV is dominated by the between-laboratory scatter of results in CCQM-K73. The uncertainty estimates from the participants with the lowest reported uncertainties remain unsupported by this KC.
Fil: Pratt, K. W. National Institute of Standards and Technology (NIST); Estados Unidos
Fil: Ortiz-Aparicio, J. L. Centro Nacional de Metrología (CENAM); México
Fil: Matehuala-Sánchez, F. J. Centro Nacional de Metrología (CENAM); México
Fil: Jakobsen, P. T. Dansk Fundamental Metrology (DFM); Dinamarca
Fil: Pawlina, M. Gówny Urzd Miar (GUM); Polonia
Fil: Kozowski, W. Gówny Urzd Miar (GUM); Polonia
Fil: Borges, P. P. Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMetro); Brasil
Fil: Silva Junior, W. B. da. Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMetro); Brasil
Fil: Borinsky, M. B. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Hernández, A. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Puelles, M. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Hatamleh, N. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Acosta, O.. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Nunes, J. Instituto Português da Qualidade (IPQ); Portugal
Fil: Guiomar Lito, M. J. Instituto Português da Qualidade (IPQ); Portugal
Fil: Camões, M. F. Instituto Português da Qualidade (IPQ); Portugal
Fil: Filipe, E. Instituto Português da Qualidade (IPQ); Portugal
Fil: Hwang, E. Korea Research Institute of Standards and Science (KRISS); Corea del Sur
Fil: Lim, Y. Korea Research Institute of Standards and Science (KRISS); Corea del Sur
Fil: Bing, W. National Institute of Metrology (NIM); China
Fil: Qian, W. National Institute of Metrology (NIM); China
Fil: Chao, W. National Institute of Metrology (NIM); China
Fil: Hioki, A. National Metrology Institute of Japan (NMIJ); Japón
Fil: Asakai, T. National Metrology Institute of Japan (NMIJ); Japón
Fil: Máriássy, M. Slovenský Metrologický Ústav (SMU); Eslovaquia
Fil: Hanková, Z. Slovenský Metrologický Ústav (SMU); Eslovaquia
Fil: Nagibin, S. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); Ucrania
Fil: Manska, O. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); Ucrania
Fil: Gavrilkin, V. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); Ucrania
Fil: Kutovoy, V. All-Russian Scientific Institute for Physical-Technical and Radiological Measurements (VNIIFTRI); Rusia
Fuente
Metrología, 50
Materia
Metrología
Ácido clorhídrico
Hidrógeno
Cationes
Determinación (química)
Incertidumbre
Dispersión
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by/3.0/
Repositorio
Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
Institución
Instituto Nacional de Tecnología Industrial
OAI Identificador
nuevadc:Borinsky2013CCQM-K73_pdf

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network_acronym_str RIINTI
repository_id_str
network_name_str Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
spelling Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)Pratt, K. W.Ortiz-Aparicio, J. L.Matehuala-Sánchez, F. J.Pawlina, M.Kozowski, W.Borges, P. P.Silva Junior, W. B. da.Borinsky, M. B.Hernández, A.Puelles, M.Hatamleh, N.Acosta, O.Nunes, J.Guiomar Lito, M. J.Camões, M. F.Filipe, E.Hwang, E.Lim, Y.Bing, W.Qian, W.Chao, W.Hioki, A.Asakai, T.Máriássy, M.Hanková, Z.Nagibin, S.Manska, O.Gavrilkin, V.Kutovoy, V.MetrologíaÁcido clorhídricoHidrógenoCationesDeterminación (química)IncertidumbreDispersiónThis key comparison (KC), CCQM-K73, was performed to demonstrate the capability of the participating National Metrology Institutes (NMIs) to measure the amount content of H+ , νH + , in an HCl solution with a nominal νH + of 0.1 mol·kg-1 . A parallel Pilot Study, CCQM-P19.2, was performed for NMIs that did not desire to participate in the KC. The comparison was a joint activity of the Electrochemical Working Group (EAWG) and Inorganic Analysis Working Group (IAWG) of the CCQM and was coordinated by NIST (USA) and CENAM (México). The method of determination of νH + was left to the individual participant. All participants used either coulometry or titrimetry with potentiometric determination of the endpoint. The agreement of the results was not commensurate with the claimed uncertainties of the subset of participants that claimed small uncertainties for this determination. A workshop on technical issues relating to the CCQM-K73 measurements was conducted at the joint IAWGEAWG meeting at the Bureau International des Poids et Mesures (BIPM), Paris (Sèvres) in April 2010. Several possible sources of bias were investigated, but none could explain the observed dispersion among the participants’ results. In the absence of a specific cause for the dispersion, the IAWG and EAWG decided to assign a Key Comparison Reference Value, KCRV, and standard uncertainty of the KCRV, uKCRV, based on the DerSimonian-Laird statistical estimator. The uKCRV is dominated by the between-laboratory scatter of results in CCQM-K73. The uncertainty estimates from the participants with the lowest reported uncertainties remain unsupported by this KC.Fil: Pratt, K. W. National Institute of Standards and Technology (NIST); Estados UnidosFil: Ortiz-Aparicio, J. L. Centro Nacional de Metrología (CENAM); MéxicoFil: Matehuala-Sánchez, F. J. Centro Nacional de Metrología (CENAM); MéxicoFil: Jakobsen, P. T. Dansk Fundamental Metrology (DFM); DinamarcaFil: Pawlina, M. Gówny Urzd Miar (GUM); PoloniaFil: Kozowski, W. Gówny Urzd Miar (GUM); PoloniaFil: Borges, P. P. Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMetro); BrasilFil: Silva Junior, W. B. da. Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMetro); BrasilFil: Borinsky, M. B. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Hernández, A. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Puelles, M. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Hatamleh, N. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Acosta, O.. Instituto Nacional de Tecnología Industrial (INTI); ArgentinaFil: Nunes, J. Instituto Português da Qualidade (IPQ); PortugalFil: Guiomar Lito, M. J. Instituto Português da Qualidade (IPQ); PortugalFil: Camões, M. F. Instituto Português da Qualidade (IPQ); PortugalFil: Filipe, E. Instituto Português da Qualidade (IPQ); PortugalFil: Hwang, E. Korea Research Institute of Standards and Science (KRISS); Corea del SurFil: Lim, Y. Korea Research Institute of Standards and Science (KRISS); Corea del SurFil: Bing, W. National Institute of Metrology (NIM); ChinaFil: Qian, W. National Institute of Metrology (NIM); ChinaFil: Chao, W. National Institute of Metrology (NIM); ChinaFil: Hioki, A. National Metrology Institute of Japan (NMIJ); JapónFil: Asakai, T. National Metrology Institute of Japan (NMIJ); JapónFil: Máriássy, M. Slovenský Metrologický Ústav (SMU); EslovaquiaFil: Hanková, Z. Slovenský Metrologický Ústav (SMU); EslovaquiaFil: Nagibin, S. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); UcraniaFil: Manska, O. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); UcraniaFil: Gavrilkin, V. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); UcraniaFil: Kutovoy, V. All-Russian Scientific Institute for Physical-Technical and Radiological Measurements (VNIIFTRI); RusiaIOP Publishing2013info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfBorinsky2013CCQM-K73.pdfhttps://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Borinsky.dir/doc.pdfMetrología, 50reponame:Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)instname:Instituto Nacional de Tecnología Industrialenginfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by/3.0/openAccess2025-09-29T15:01:55Znuevadc:Borinsky2013CCQM-K73_pdfinstacron:INTIInstitucionalhttps://app.inti.gob.ar/greenstone3/biblioOrganismo científico-tecnológicohttps://argentina.gob.ar/intihttps://app.inti.gob.ar/greenstone3/oaiserver?verb=Identifypfalcato@inti.gob.arArgentinaopendoar:2025-09-29 15:01:56.374Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) - Instituto Nacional de Tecnología Industrialfalse
dc.title.none.fl_str_mv Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)
title Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)
spellingShingle Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)
Pratt, K. W.
Metrología
Ácido clorhídrico
Hidrógeno
Cationes
Determinación (química)
Incertidumbre
Dispersión
title_short Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)
title_full Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)
title_fullStr Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)
title_full_unstemmed Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)
title_sort Key comparison CCQM-K73 amount content of H+ in hydrochloric acid (0.1 mol·kg-1)
dc.creator.none.fl_str_mv Pratt, K. W.
Ortiz-Aparicio, J. L.
Matehuala-Sánchez, F. J.
Pawlina, M.
Kozowski, W.
Borges, P. P.
Silva Junior, W. B. da.
Borinsky, M. B.
Hernández, A.
Puelles, M.
Hatamleh, N.
Acosta, O.
Nunes, J.
Guiomar Lito, M. J.
Camões, M. F.
Filipe, E.
Hwang, E.
Lim, Y.
Bing, W.
Qian, W.
Chao, W.
Hioki, A.
Asakai, T.
Máriássy, M.
Hanková, Z.
Nagibin, S.
Manska, O.
Gavrilkin, V.
Kutovoy, V.
author Pratt, K. W.
author_facet Pratt, K. W.
Ortiz-Aparicio, J. L.
Matehuala-Sánchez, F. J.
Pawlina, M.
Kozowski, W.
Borges, P. P.
Silva Junior, W. B. da.
Borinsky, M. B.
Hernández, A.
Puelles, M.
Hatamleh, N.
Acosta, O.
Nunes, J.
Guiomar Lito, M. J.
Camões, M. F.
Filipe, E.
Hwang, E.
Lim, Y.
Bing, W.
Qian, W.
Chao, W.
Hioki, A.
Asakai, T.
Máriássy, M.
Hanková, Z.
Nagibin, S.
Manska, O.
Gavrilkin, V.
Kutovoy, V.
author_role author
author2 Ortiz-Aparicio, J. L.
Matehuala-Sánchez, F. J.
Pawlina, M.
Kozowski, W.
Borges, P. P.
Silva Junior, W. B. da.
Borinsky, M. B.
Hernández, A.
Puelles, M.
Hatamleh, N.
Acosta, O.
Nunes, J.
Guiomar Lito, M. J.
Camões, M. F.
Filipe, E.
Hwang, E.
Lim, Y.
Bing, W.
Qian, W.
Chao, W.
Hioki, A.
Asakai, T.
Máriássy, M.
Hanková, Z.
Nagibin, S.
Manska, O.
Gavrilkin, V.
Kutovoy, V.
author2_role author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Metrología
Ácido clorhídrico
Hidrógeno
Cationes
Determinación (química)
Incertidumbre
Dispersión
topic Metrología
Ácido clorhídrico
Hidrógeno
Cationes
Determinación (química)
Incertidumbre
Dispersión
dc.description.none.fl_txt_mv This key comparison (KC), CCQM-K73, was performed to demonstrate the capability of the participating National Metrology Institutes (NMIs) to measure the amount content of H+ , νH + , in an HCl solution with a nominal νH + of 0.1 mol·kg-1 . A parallel Pilot Study, CCQM-P19.2, was performed for NMIs that did not desire to participate in the KC. The comparison was a joint activity of the Electrochemical Working Group (EAWG) and Inorganic Analysis Working Group (IAWG) of the CCQM and was coordinated by NIST (USA) and CENAM (México). The method of determination of νH + was left to the individual participant. All participants used either coulometry or titrimetry with potentiometric determination of the endpoint. The agreement of the results was not commensurate with the claimed uncertainties of the subset of participants that claimed small uncertainties for this determination. A workshop on technical issues relating to the CCQM-K73 measurements was conducted at the joint IAWGEAWG meeting at the Bureau International des Poids et Mesures (BIPM), Paris (Sèvres) in April 2010. Several possible sources of bias were investigated, but none could explain the observed dispersion among the participants’ results. In the absence of a specific cause for the dispersion, the IAWG and EAWG decided to assign a Key Comparison Reference Value, KCRV, and standard uncertainty of the KCRV, uKCRV, based on the DerSimonian-Laird statistical estimator. The uKCRV is dominated by the between-laboratory scatter of results in CCQM-K73. The uncertainty estimates from the participants with the lowest reported uncertainties remain unsupported by this KC.
Fil: Pratt, K. W. National Institute of Standards and Technology (NIST); Estados Unidos
Fil: Ortiz-Aparicio, J. L. Centro Nacional de Metrología (CENAM); México
Fil: Matehuala-Sánchez, F. J. Centro Nacional de Metrología (CENAM); México
Fil: Jakobsen, P. T. Dansk Fundamental Metrology (DFM); Dinamarca
Fil: Pawlina, M. Gówny Urzd Miar (GUM); Polonia
Fil: Kozowski, W. Gówny Urzd Miar (GUM); Polonia
Fil: Borges, P. P. Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMetro); Brasil
Fil: Silva Junior, W. B. da. Instituto Nacional de Metrologia, Qualidade e Tecnologia (INMetro); Brasil
Fil: Borinsky, M. B. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Hernández, A. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Puelles, M. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Hatamleh, N. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Acosta, O.. Instituto Nacional de Tecnología Industrial (INTI); Argentina
Fil: Nunes, J. Instituto Português da Qualidade (IPQ); Portugal
Fil: Guiomar Lito, M. J. Instituto Português da Qualidade (IPQ); Portugal
Fil: Camões, M. F. Instituto Português da Qualidade (IPQ); Portugal
Fil: Filipe, E. Instituto Português da Qualidade (IPQ); Portugal
Fil: Hwang, E. Korea Research Institute of Standards and Science (KRISS); Corea del Sur
Fil: Lim, Y. Korea Research Institute of Standards and Science (KRISS); Corea del Sur
Fil: Bing, W. National Institute of Metrology (NIM); China
Fil: Qian, W. National Institute of Metrology (NIM); China
Fil: Chao, W. National Institute of Metrology (NIM); China
Fil: Hioki, A. National Metrology Institute of Japan (NMIJ); Japón
Fil: Asakai, T. National Metrology Institute of Japan (NMIJ); Japón
Fil: Máriássy, M. Slovenský Metrologický Ústav (SMU); Eslovaquia
Fil: Hanková, Z. Slovenský Metrologický Ústav (SMU); Eslovaquia
Fil: Nagibin, S. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); Ucrania
Fil: Manska, O. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); Ucrania
Fil: Gavrilkin, V. Ukrainian State Research and Production Center of Standardization Metrology, Certification, and Consumers’ Rights Protection (UMTS); Ucrania
Fil: Kutovoy, V. All-Russian Scientific Institute for Physical-Technical and Radiological Measurements (VNIIFTRI); Rusia
description This key comparison (KC), CCQM-K73, was performed to demonstrate the capability of the participating National Metrology Institutes (NMIs) to measure the amount content of H+ , νH + , in an HCl solution with a nominal νH + of 0.1 mol·kg-1 . A parallel Pilot Study, CCQM-P19.2, was performed for NMIs that did not desire to participate in the KC. The comparison was a joint activity of the Electrochemical Working Group (EAWG) and Inorganic Analysis Working Group (IAWG) of the CCQM and was coordinated by NIST (USA) and CENAM (México). The method of determination of νH + was left to the individual participant. All participants used either coulometry or titrimetry with potentiometric determination of the endpoint. The agreement of the results was not commensurate with the claimed uncertainties of the subset of participants that claimed small uncertainties for this determination. A workshop on technical issues relating to the CCQM-K73 measurements was conducted at the joint IAWGEAWG meeting at the Bureau International des Poids et Mesures (BIPM), Paris (Sèvres) in April 2010. Several possible sources of bias were investigated, but none could explain the observed dispersion among the participants’ results. In the absence of a specific cause for the dispersion, the IAWG and EAWG decided to assign a Key Comparison Reference Value, KCRV, and standard uncertainty of the KCRV, uKCRV, based on the DerSimonian-Laird statistical estimator. The uKCRV is dominated by the between-laboratory scatter of results in CCQM-K73. The uncertainty estimates from the participants with the lowest reported uncertainties remain unsupported by this KC.
publishDate 2013
dc.date.none.fl_str_mv 2013
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv Borinsky2013CCQM-K73.pdf
https://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Borinsky.dir/doc.pdf
identifier_str_mv Borinsky2013CCQM-K73.pdf
url https://app.inti.gob.ar/greenstone3/sites/localsite/collect/nuevadc/index/assoc/Borinsky.dir/doc.pdf
dc.language.none.fl_str_mv eng
language eng
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by/3.0/
openAccess
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by/3.0/
openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv IOP Publishing
publisher.none.fl_str_mv IOP Publishing
dc.source.none.fl_str_mv Metrología, 50
reponame:Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
instname:Instituto Nacional de Tecnología Industrial
reponame_str Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
collection Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI)
instname_str Instituto Nacional de Tecnología Industrial
repository.name.fl_str_mv Repositorio Institucional del Instituto Nacional de Tecnología Industrial (INTI) - Instituto Nacional de Tecnología Industrial
repository.mail.fl_str_mv pfalcato@inti.gob.ar
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