On the dynamics of cutting arc plasmas: the role of the power supply ripple
- Autores
- Prevosto, Leandro; Mancinelli, Beatriz; Kelly, Héctor
- Año de publicación
- 2012
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- The power sources used in cutting arc torches are usually poorly stabilized and have a large ripple factor. The strong oscillatory components in the voltage and arc current produce in turn, large fluctuations in the plasma quantities. Experimental observations on the dynamics of the nonequilibrium plasma inside the nozzle of a 30 A oxygen cutting torch with a 7 % ripple level of its power source are reported in this work. The observed electron temperature (mean value º 5400 K) shows a rms deviation º 5 % (≤ 300 K), which is of the order of the arc voltage ripple level. A considerable different situation occurs with the plasma density (mean value º 3 ´ 1019 m-3). In this case the rms deviation was º 75 %, much greater than that of the electron temperature.
Fil: Prevosto, Leandro. Universidad Tecnológica Nacional Facultad Regional Venado Tuerto. Departamento Ingeniería Electromecánica. Grupo de Descargas Eléctricas; Argentina.
Fil: Mancinelli, Beatriz. Universidad Tecnológica Nacional Facultad Regional Venado Tuerto. Departamento Ingeniería Electromecánica. Grupo de Descargas Eléctricas; Argentina.
Fil: Kelly, Héctor. CONICET. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Física. Instituto de Física del Plasma; Argentina.
Peer Reviewed - Materia
- cutting arc plasmas
- Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- http://creativecommons.org/licenses/by-nc-nd/4.0/
- Repositorio
- Institución
- Universidad Tecnológica Nacional
- OAI Identificador
- oai:ria.utn.edu.ar:20.500.12272/2169
Ver los metadatos del registro completo
id |
RIAUTN_1026d5e1a17c728b5ba98b8de6adac4c |
---|---|
oai_identifier_str |
oai:ria.utn.edu.ar:20.500.12272/2169 |
network_acronym_str |
RIAUTN |
repository_id_str |
a |
network_name_str |
Repositorio Institucional Abierto (UTN) |
spelling |
On the dynamics of cutting arc plasmas: the role of the power supply ripplePrevosto, LeandroMancinelli, BeatrizKelly, Héctorcutting arc plasmasThe power sources used in cutting arc torches are usually poorly stabilized and have a large ripple factor. The strong oscillatory components in the voltage and arc current produce in turn, large fluctuations in the plasma quantities. Experimental observations on the dynamics of the nonequilibrium plasma inside the nozzle of a 30 A oxygen cutting torch with a 7 % ripple level of its power source are reported in this work. The observed electron temperature (mean value º 5400 K) shows a rms deviation º 5 % (≤ 300 K), which is of the order of the arc voltage ripple level. A considerable different situation occurs with the plasma density (mean value º 3 ´ 1019 m-3). In this case the rms deviation was º 75 %, much greater than that of the electron temperature.Fil: Prevosto, Leandro. Universidad Tecnológica Nacional Facultad Regional Venado Tuerto. Departamento Ingeniería Electromecánica. Grupo de Descargas Eléctricas; Argentina.Fil: Mancinelli, Beatriz. Universidad Tecnológica Nacional Facultad Regional Venado Tuerto. Departamento Ingeniería Electromecánica. Grupo de Descargas Eléctricas; Argentina.Fil: Kelly, Héctor. CONICET. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Física. Instituto de Física del Plasma; Argentina.Peer ReviewedADVANCED ELECTROMAGNETICS2017-10-11T20:14:08Z2017-10-11T20:14:08Z2012-08info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/20.500.12272/2169enginfo:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by-nc-nd/4.0/ADVANCED ELECTROMAGNETICSLicencia Creative Commons. No comercial. Sin obras derivadas.Attribution-NonCommercial-NoDerivatives 4.0 Internacionalreponame:Repositorio Institucional Abierto (UTN)instname:Universidad Tecnológica Nacional2025-10-23T11:18:41Zoai:ria.utn.edu.ar:20.500.12272/2169instacron:UTNInstitucionalhttp://ria.utn.edu.ar/Universidad públicaNo correspondehttp://ria.utn.edu.ar/oaigestionria@rec.utn.edu.ar; fsuarez@rec.utn.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:a2025-10-23 11:18:41.379Repositorio Institucional Abierto (UTN) - Universidad Tecnológica Nacionalfalse |
dc.title.none.fl_str_mv |
On the dynamics of cutting arc plasmas: the role of the power supply ripple |
title |
On the dynamics of cutting arc plasmas: the role of the power supply ripple |
spellingShingle |
On the dynamics of cutting arc plasmas: the role of the power supply ripple Prevosto, Leandro cutting arc plasmas |
title_short |
On the dynamics of cutting arc plasmas: the role of the power supply ripple |
title_full |
On the dynamics of cutting arc plasmas: the role of the power supply ripple |
title_fullStr |
On the dynamics of cutting arc plasmas: the role of the power supply ripple |
title_full_unstemmed |
On the dynamics of cutting arc plasmas: the role of the power supply ripple |
title_sort |
On the dynamics of cutting arc plasmas: the role of the power supply ripple |
dc.creator.none.fl_str_mv |
Prevosto, Leandro Mancinelli, Beatriz Kelly, Héctor |
author |
Prevosto, Leandro |
author_facet |
Prevosto, Leandro Mancinelli, Beatriz Kelly, Héctor |
author_role |
author |
author2 |
Mancinelli, Beatriz Kelly, Héctor |
author2_role |
author author |
dc.subject.none.fl_str_mv |
cutting arc plasmas |
topic |
cutting arc plasmas |
dc.description.none.fl_txt_mv |
The power sources used in cutting arc torches are usually poorly stabilized and have a large ripple factor. The strong oscillatory components in the voltage and arc current produce in turn, large fluctuations in the plasma quantities. Experimental observations on the dynamics of the nonequilibrium plasma inside the nozzle of a 30 A oxygen cutting torch with a 7 % ripple level of its power source are reported in this work. The observed electron temperature (mean value º 5400 K) shows a rms deviation º 5 % (≤ 300 K), which is of the order of the arc voltage ripple level. A considerable different situation occurs with the plasma density (mean value º 3 ´ 1019 m-3). In this case the rms deviation was º 75 %, much greater than that of the electron temperature. Fil: Prevosto, Leandro. Universidad Tecnológica Nacional Facultad Regional Venado Tuerto. Departamento Ingeniería Electromecánica. Grupo de Descargas Eléctricas; Argentina. Fil: Mancinelli, Beatriz. Universidad Tecnológica Nacional Facultad Regional Venado Tuerto. Departamento Ingeniería Electromecánica. Grupo de Descargas Eléctricas; Argentina. Fil: Kelly, Héctor. CONICET. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Física. Instituto de Física del Plasma; Argentina. Peer Reviewed |
description |
The power sources used in cutting arc torches are usually poorly stabilized and have a large ripple factor. The strong oscillatory components in the voltage and arc current produce in turn, large fluctuations in the plasma quantities. Experimental observations on the dynamics of the nonequilibrium plasma inside the nozzle of a 30 A oxygen cutting torch with a 7 % ripple level of its power source are reported in this work. The observed electron temperature (mean value º 5400 K) shows a rms deviation º 5 % (≤ 300 K), which is of the order of the arc voltage ripple level. A considerable different situation occurs with the plasma density (mean value º 3 ´ 1019 m-3). In this case the rms deviation was º 75 %, much greater than that of the electron temperature. |
publishDate |
2012 |
dc.date.none.fl_str_mv |
2012-08 2017-10-11T20:14:08Z 2017-10-11T20:14:08Z |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
http://hdl.handle.net/20.500.12272/2169 |
url |
http://hdl.handle.net/20.500.12272/2169 |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess http://creativecommons.org/licenses/by-nc-nd/4.0/ ADVANCED ELECTROMAGNETICS Licencia Creative Commons. No comercial. Sin obras derivadas. Attribution-NonCommercial-NoDerivatives 4.0 Internacional |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
http://creativecommons.org/licenses/by-nc-nd/4.0/ ADVANCED ELECTROMAGNETICS Licencia Creative Commons. No comercial. Sin obras derivadas. Attribution-NonCommercial-NoDerivatives 4.0 Internacional |
dc.format.none.fl_str_mv |
application/pdf application/pdf |
dc.publisher.none.fl_str_mv |
ADVANCED ELECTROMAGNETICS |
publisher.none.fl_str_mv |
ADVANCED ELECTROMAGNETICS |
dc.source.none.fl_str_mv |
reponame:Repositorio Institucional Abierto (UTN) instname:Universidad Tecnológica Nacional |
reponame_str |
Repositorio Institucional Abierto (UTN) |
collection |
Repositorio Institucional Abierto (UTN) |
instname_str |
Universidad Tecnológica Nacional |
repository.name.fl_str_mv |
Repositorio Institucional Abierto (UTN) - Universidad Tecnológica Nacional |
repository.mail.fl_str_mv |
gestionria@rec.utn.edu.ar; fsuarez@rec.utn.edu.ar |
_version_ |
1846787943415414784 |
score |
12.471625 |