Plasma-CVD-coated glass beads as photocatalyst for water decontamination

Autores
Karches, Martin; Morstein, Marcus; Rudolf von Rohr, Philipp; Pozzo, Roberto Luis; Giombi, Jose Luis; Baltanas, Miguel Angel
Año de publicación
2002
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
AmorphousTiO2 films were deposited on glass microbeads using a specially designed circulating fluidized bed plasma-CVD reactor. The film thickness was varied between 7 and 120 nm. While only little carbon impurity was found, XPS analysis revealed the presence of silicon, sodium and alkaline earth elements in the titania coating. Reduced amounts of these substrate-originating impurities were observed in the thicker films. By ToF-SIMS imaging, cross-sectional TEM and
time-resolved dissolution, the titania coatings were proven to be uniform, both per particle and in terms of the film thickness distribution.
The photocatalytic performance of the composite particles was evaluated in a fully irradiated fluidized-bed photoreactor. The thinnest films had some photocatalytic activity in the as-deposited state, possibly induced by the high specific power of the microwave plasma or silicon doping. The thicker films needed a post-deposition calcination at 723K to achieve catalytic activity. Both the degree of anatase crystallization and the activity were improved by applying thicker films and after UV irradiation-plus-calcining. All films showed good adhesion and abrasion resistance during the photocatalytic tests. The best plasma-CVD films were about 70% as efficient (per unit reactor volume) as the reference material, P-25 immobilized on quartz sand.
Fil: Karches, Martin. Eidgenossische Technische Hochschule Zurich;
Fil: Morstein, Marcus. Eidgenossische Technische Hochschule Zurich;
Fil: Rudolf von Rohr, Philipp. Eidgenossische Technische Hochschule Zurich;
Fil: Pozzo, Roberto Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Giombi, Jose Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Baltanas, Miguel Angel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Materia
Cvd
Fluidized Bed
Photocatalysis
Plasma
Supported Titania
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/30085

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network_name_str CONICET Digital (CONICET)
spelling Plasma-CVD-coated glass beads as photocatalyst for water decontaminationKarches, MartinMorstein, MarcusRudolf von Rohr, PhilippPozzo, Roberto LuisGiombi, Jose LuisBaltanas, Miguel AngelCvdFluidized BedPhotocatalysisPlasmaSupported Titaniahttps://purl.org/becyt/ford/2.4https://purl.org/becyt/ford/2AmorphousTiO2 films were deposited on glass microbeads using a specially designed circulating fluidized bed plasma-CVD reactor. The film thickness was varied between 7 and 120 nm. While only little carbon impurity was found, XPS analysis revealed the presence of silicon, sodium and alkaline earth elements in the titania coating. Reduced amounts of these substrate-originating impurities were observed in the thicker films. By ToF-SIMS imaging, cross-sectional TEM and<br />time-resolved dissolution, the titania coatings were proven to be uniform, both per particle and in terms of the film thickness distribution.<br />The photocatalytic performance of the composite particles was evaluated in a fully irradiated fluidized-bed photoreactor. The thinnest films had some photocatalytic activity in the as-deposited state, possibly induced by the high specific power of the microwave plasma or silicon doping. The thicker films needed a post-deposition calcination at 723K to achieve catalytic activity. Both the degree of anatase crystallization and the activity were improved by applying thicker films and after UV irradiation-plus-calcining. All films showed good adhesion and abrasion resistance during the photocatalytic tests. The best plasma-CVD films were about 70% as efficient (per unit reactor volume) as the reference material, P-25 immobilized on quartz sand.Fil: Karches, Martin. Eidgenossische Technische Hochschule Zurich;Fil: Morstein, Marcus. Eidgenossische Technische Hochschule Zurich;Fil: Rudolf von Rohr, Philipp. Eidgenossische Technische Hochschule Zurich;Fil: Pozzo, Roberto Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaFil: Giombi, Jose Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaFil: Baltanas, Miguel Angel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaElsevier Science2002-05info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/30085Karches, Martin; Morstein, Marcus; Rudolf von Rohr, Philipp; Pozzo, Roberto Luis; Giombi, Jose Luis; et al.; Plasma-CVD-coated glass beads as photocatalyst for water decontamination; Elsevier Science; Catalysis Today; 72; 5-2002; 267-2790920-5861CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1016/S0920-5861(01)00505-3info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-15T15:34:01Zoai:ri.conicet.gov.ar:11336/30085instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-15 15:34:01.811CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Plasma-CVD-coated glass beads as photocatalyst for water decontamination
title Plasma-CVD-coated glass beads as photocatalyst for water decontamination
spellingShingle Plasma-CVD-coated glass beads as photocatalyst for water decontamination
Karches, Martin
Cvd
Fluidized Bed
Photocatalysis
Plasma
Supported Titania
title_short Plasma-CVD-coated glass beads as photocatalyst for water decontamination
title_full Plasma-CVD-coated glass beads as photocatalyst for water decontamination
title_fullStr Plasma-CVD-coated glass beads as photocatalyst for water decontamination
title_full_unstemmed Plasma-CVD-coated glass beads as photocatalyst for water decontamination
title_sort Plasma-CVD-coated glass beads as photocatalyst for water decontamination
dc.creator.none.fl_str_mv Karches, Martin
Morstein, Marcus
Rudolf von Rohr, Philipp
Pozzo, Roberto Luis
Giombi, Jose Luis
Baltanas, Miguel Angel
author Karches, Martin
author_facet Karches, Martin
Morstein, Marcus
Rudolf von Rohr, Philipp
Pozzo, Roberto Luis
Giombi, Jose Luis
Baltanas, Miguel Angel
author_role author
author2 Morstein, Marcus
Rudolf von Rohr, Philipp
Pozzo, Roberto Luis
Giombi, Jose Luis
Baltanas, Miguel Angel
author2_role author
author
author
author
author
dc.subject.none.fl_str_mv Cvd
Fluidized Bed
Photocatalysis
Plasma
Supported Titania
topic Cvd
Fluidized Bed
Photocatalysis
Plasma
Supported Titania
purl_subject.fl_str_mv https://purl.org/becyt/ford/2.4
https://purl.org/becyt/ford/2
dc.description.none.fl_txt_mv AmorphousTiO2 films were deposited on glass microbeads using a specially designed circulating fluidized bed plasma-CVD reactor. The film thickness was varied between 7 and 120 nm. While only little carbon impurity was found, XPS analysis revealed the presence of silicon, sodium and alkaline earth elements in the titania coating. Reduced amounts of these substrate-originating impurities were observed in the thicker films. By ToF-SIMS imaging, cross-sectional TEM and<br />time-resolved dissolution, the titania coatings were proven to be uniform, both per particle and in terms of the film thickness distribution.<br />The photocatalytic performance of the composite particles was evaluated in a fully irradiated fluidized-bed photoreactor. The thinnest films had some photocatalytic activity in the as-deposited state, possibly induced by the high specific power of the microwave plasma or silicon doping. The thicker films needed a post-deposition calcination at 723K to achieve catalytic activity. Both the degree of anatase crystallization and the activity were improved by applying thicker films and after UV irradiation-plus-calcining. All films showed good adhesion and abrasion resistance during the photocatalytic tests. The best plasma-CVD films were about 70% as efficient (per unit reactor volume) as the reference material, P-25 immobilized on quartz sand.
Fil: Karches, Martin. Eidgenossische Technische Hochschule Zurich;
Fil: Morstein, Marcus. Eidgenossische Technische Hochschule Zurich;
Fil: Rudolf von Rohr, Philipp. Eidgenossische Technische Hochschule Zurich;
Fil: Pozzo, Roberto Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Giombi, Jose Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Baltanas, Miguel Angel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
description AmorphousTiO2 films were deposited on glass microbeads using a specially designed circulating fluidized bed plasma-CVD reactor. The film thickness was varied between 7 and 120 nm. While only little carbon impurity was found, XPS analysis revealed the presence of silicon, sodium and alkaline earth elements in the titania coating. Reduced amounts of these substrate-originating impurities were observed in the thicker films. By ToF-SIMS imaging, cross-sectional TEM and<br />time-resolved dissolution, the titania coatings were proven to be uniform, both per particle and in terms of the film thickness distribution.<br />The photocatalytic performance of the composite particles was evaluated in a fully irradiated fluidized-bed photoreactor. The thinnest films had some photocatalytic activity in the as-deposited state, possibly induced by the high specific power of the microwave plasma or silicon doping. The thicker films needed a post-deposition calcination at 723K to achieve catalytic activity. Both the degree of anatase crystallization and the activity were improved by applying thicker films and after UV irradiation-plus-calcining. All films showed good adhesion and abrasion resistance during the photocatalytic tests. The best plasma-CVD films were about 70% as efficient (per unit reactor volume) as the reference material, P-25 immobilized on quartz sand.
publishDate 2002
dc.date.none.fl_str_mv 2002-05
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/30085
Karches, Martin; Morstein, Marcus; Rudolf von Rohr, Philipp; Pozzo, Roberto Luis; Giombi, Jose Luis; et al.; Plasma-CVD-coated glass beads as photocatalyst for water decontamination; Elsevier Science; Catalysis Today; 72; 5-2002; 267-279
0920-5861
CONICET Digital
CONICET
url http://hdl.handle.net/11336/30085
identifier_str_mv Karches, Martin; Morstein, Marcus; Rudolf von Rohr, Philipp; Pozzo, Roberto Luis; Giombi, Jose Luis; et al.; Plasma-CVD-coated glass beads as photocatalyst for water decontamination; Elsevier Science; Catalysis Today; 72; 5-2002; 267-279
0920-5861
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/doi/10.1016/S0920-5861(01)00505-3
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Elsevier Science
publisher.none.fl_str_mv Elsevier Science
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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