Plasma-CVD-coated glass beads as photocatalyst for water decontamination
- Autores
- Karches, Martin; Morstein, Marcus; Rudolf von Rohr, Philipp; Pozzo, Roberto Luis; Giombi, Jose Luis; Baltanas, Miguel Angel
- Año de publicación
- 2002
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- AmorphousTiO2 films were deposited on glass microbeads using a specially designed circulating fluidized bed plasma-CVD reactor. The film thickness was varied between 7 and 120 nm. While only little carbon impurity was found, XPS analysis revealed the presence of silicon, sodium and alkaline earth elements in the titania coating. Reduced amounts of these substrate-originating impurities were observed in the thicker films. By ToF-SIMS imaging, cross-sectional TEM and
time-resolved dissolution, the titania coatings were proven to be uniform, both per particle and in terms of the film thickness distribution.
The photocatalytic performance of the composite particles was evaluated in a fully irradiated fluidized-bed photoreactor. The thinnest films had some photocatalytic activity in the as-deposited state, possibly induced by the high specific power of the microwave plasma or silicon doping. The thicker films needed a post-deposition calcination at 723K to achieve catalytic activity. Both the degree of anatase crystallization and the activity were improved by applying thicker films and after UV irradiation-plus-calcining. All films showed good adhesion and abrasion resistance during the photocatalytic tests. The best plasma-CVD films were about 70% as efficient (per unit reactor volume) as the reference material, P-25 immobilized on quartz sand.
Fil: Karches, Martin. Eidgenossische Technische Hochschule Zurich;
Fil: Morstein, Marcus. Eidgenossische Technische Hochschule Zurich;
Fil: Rudolf von Rohr, Philipp. Eidgenossische Technische Hochschule Zurich;
Fil: Pozzo, Roberto Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Giombi, Jose Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina
Fil: Baltanas, Miguel Angel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina - Materia
-
Cvd
Fluidized Bed
Photocatalysis
Plasma
Supported Titania - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
- Repositorio
.jpg)
- Institución
- Consejo Nacional de Investigaciones Científicas y Técnicas
- OAI Identificador
- oai:ri.conicet.gov.ar:11336/30085
Ver los metadatos del registro completo
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Plasma-CVD-coated glass beads as photocatalyst for water decontaminationKarches, MartinMorstein, MarcusRudolf von Rohr, PhilippPozzo, Roberto LuisGiombi, Jose LuisBaltanas, Miguel AngelCvdFluidized BedPhotocatalysisPlasmaSupported Titaniahttps://purl.org/becyt/ford/2.4https://purl.org/becyt/ford/2AmorphousTiO2 films were deposited on glass microbeads using a specially designed circulating fluidized bed plasma-CVD reactor. The film thickness was varied between 7 and 120 nm. While only little carbon impurity was found, XPS analysis revealed the presence of silicon, sodium and alkaline earth elements in the titania coating. Reduced amounts of these substrate-originating impurities were observed in the thicker films. By ToF-SIMS imaging, cross-sectional TEM and<br />time-resolved dissolution, the titania coatings were proven to be uniform, both per particle and in terms of the film thickness distribution.<br />The photocatalytic performance of the composite particles was evaluated in a fully irradiated fluidized-bed photoreactor. The thinnest films had some photocatalytic activity in the as-deposited state, possibly induced by the high specific power of the microwave plasma or silicon doping. The thicker films needed a post-deposition calcination at 723K to achieve catalytic activity. Both the degree of anatase crystallization and the activity were improved by applying thicker films and after UV irradiation-plus-calcining. All films showed good adhesion and abrasion resistance during the photocatalytic tests. The best plasma-CVD films were about 70% as efficient (per unit reactor volume) as the reference material, P-25 immobilized on quartz sand.Fil: Karches, Martin. Eidgenossische Technische Hochschule Zurich;Fil: Morstein, Marcus. Eidgenossische Technische Hochschule Zurich;Fil: Rudolf von Rohr, Philipp. Eidgenossische Technische Hochschule Zurich;Fil: Pozzo, Roberto Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaFil: Giombi, Jose Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaFil: Baltanas, Miguel Angel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; ArgentinaElsevier Science2002-05info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/30085Karches, Martin; Morstein, Marcus; Rudolf von Rohr, Philipp; Pozzo, Roberto Luis; Giombi, Jose Luis; et al.; Plasma-CVD-coated glass beads as photocatalyst for water decontamination; Elsevier Science; Catalysis Today; 72; 5-2002; 267-2790920-5861CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1016/S0920-5861(01)00505-3info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-15T15:34:01Zoai:ri.conicet.gov.ar:11336/30085instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-15 15:34:01.811CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse |
| dc.title.none.fl_str_mv |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination |
| title |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination |
| spellingShingle |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination Karches, Martin Cvd Fluidized Bed Photocatalysis Plasma Supported Titania |
| title_short |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination |
| title_full |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination |
| title_fullStr |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination |
| title_full_unstemmed |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination |
| title_sort |
Plasma-CVD-coated glass beads as photocatalyst for water decontamination |
| dc.creator.none.fl_str_mv |
Karches, Martin Morstein, Marcus Rudolf von Rohr, Philipp Pozzo, Roberto Luis Giombi, Jose Luis Baltanas, Miguel Angel |
| author |
Karches, Martin |
| author_facet |
Karches, Martin Morstein, Marcus Rudolf von Rohr, Philipp Pozzo, Roberto Luis Giombi, Jose Luis Baltanas, Miguel Angel |
| author_role |
author |
| author2 |
Morstein, Marcus Rudolf von Rohr, Philipp Pozzo, Roberto Luis Giombi, Jose Luis Baltanas, Miguel Angel |
| author2_role |
author author author author author |
| dc.subject.none.fl_str_mv |
Cvd Fluidized Bed Photocatalysis Plasma Supported Titania |
| topic |
Cvd Fluidized Bed Photocatalysis Plasma Supported Titania |
| purl_subject.fl_str_mv |
https://purl.org/becyt/ford/2.4 https://purl.org/becyt/ford/2 |
| dc.description.none.fl_txt_mv |
AmorphousTiO2 films were deposited on glass microbeads using a specially designed circulating fluidized bed plasma-CVD reactor. The film thickness was varied between 7 and 120 nm. While only little carbon impurity was found, XPS analysis revealed the presence of silicon, sodium and alkaline earth elements in the titania coating. Reduced amounts of these substrate-originating impurities were observed in the thicker films. By ToF-SIMS imaging, cross-sectional TEM and<br />time-resolved dissolution, the titania coatings were proven to be uniform, both per particle and in terms of the film thickness distribution.<br />The photocatalytic performance of the composite particles was evaluated in a fully irradiated fluidized-bed photoreactor. The thinnest films had some photocatalytic activity in the as-deposited state, possibly induced by the high specific power of the microwave plasma or silicon doping. The thicker films needed a post-deposition calcination at 723K to achieve catalytic activity. Both the degree of anatase crystallization and the activity were improved by applying thicker films and after UV irradiation-plus-calcining. All films showed good adhesion and abrasion resistance during the photocatalytic tests. The best plasma-CVD films were about 70% as efficient (per unit reactor volume) as the reference material, P-25 immobilized on quartz sand. Fil: Karches, Martin. Eidgenossische Technische Hochschule Zurich; Fil: Morstein, Marcus. Eidgenossische Technische Hochschule Zurich; Fil: Rudolf von Rohr, Philipp. Eidgenossische Technische Hochschule Zurich; Fil: Pozzo, Roberto Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina Fil: Giombi, Jose Luis. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina Fil: Baltanas, Miguel Angel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Santa Fe. Instituto de Desarrollo Tecnológico para la Industria Química. Universidad Nacional del Litoral. Instituto de Desarrollo Tecnológico para la Industria Química; Argentina |
| description |
AmorphousTiO2 films were deposited on glass microbeads using a specially designed circulating fluidized bed plasma-CVD reactor. The film thickness was varied between 7 and 120 nm. While only little carbon impurity was found, XPS analysis revealed the presence of silicon, sodium and alkaline earth elements in the titania coating. Reduced amounts of these substrate-originating impurities were observed in the thicker films. By ToF-SIMS imaging, cross-sectional TEM and<br />time-resolved dissolution, the titania coatings were proven to be uniform, both per particle and in terms of the film thickness distribution.<br />The photocatalytic performance of the composite particles was evaluated in a fully irradiated fluidized-bed photoreactor. The thinnest films had some photocatalytic activity in the as-deposited state, possibly induced by the high specific power of the microwave plasma or silicon doping. The thicker films needed a post-deposition calcination at 723K to achieve catalytic activity. Both the degree of anatase crystallization and the activity were improved by applying thicker films and after UV irradiation-plus-calcining. All films showed good adhesion and abrasion resistance during the photocatalytic tests. The best plasma-CVD films were about 70% as efficient (per unit reactor volume) as the reference material, P-25 immobilized on quartz sand. |
| publishDate |
2002 |
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2002-05 |
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info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
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article |
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publishedVersion |
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http://hdl.handle.net/11336/30085 Karches, Martin; Morstein, Marcus; Rudolf von Rohr, Philipp; Pozzo, Roberto Luis; Giombi, Jose Luis; et al.; Plasma-CVD-coated glass beads as photocatalyst for water decontamination; Elsevier Science; Catalysis Today; 72; 5-2002; 267-279 0920-5861 CONICET Digital CONICET |
| url |
http://hdl.handle.net/11336/30085 |
| identifier_str_mv |
Karches, Martin; Morstein, Marcus; Rudolf von Rohr, Philipp; Pozzo, Roberto Luis; Giombi, Jose Luis; et al.; Plasma-CVD-coated glass beads as photocatalyst for water decontamination; Elsevier Science; Catalysis Today; 72; 5-2002; 267-279 0920-5861 CONICET Digital CONICET |
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eng |
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eng |
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info:eu-repo/semantics/altIdentifier/doi/10.1016/S0920-5861(01)00505-3 |
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application/pdf application/pdf application/pdf |
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Elsevier Science |
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Elsevier Science |
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CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas |
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dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar |
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