Cita APA

Zazpe, R., Ungureanu, M., Golmar, F., Stoliar, P. A., Llopis, R., Casanova, F., . . . Hueso Falcon, I. (2014). Resistive switching dependence on atomic layer deposition parameters in HfO2-based memory devices. Web

Citación estilo Chicago

Zazpe, Raúl, Mariana Ungureanu, Federico Golmar, Pablo Alberto Stoliar, Roger Llopis, Félix Casanova, David F. Pickup, Celia Rogero, and Idaira Hueso Falcon. Resistive Switching Dependence On Atomic Layer Deposition Parameters in HfO2-based Memory Devices. 2014.

Cita MLA

Zazpe, Raúl, et al. Resistive Switching Dependence On Atomic Layer Deposition Parameters in HfO2-based Memory Devices. 2014.