Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction

Autores
Burgi, Juan Mauel; Newenschwander, R.; Kellermann, G.; García Molleja, Javier; Craievich, A.; Feugeas J.
Año de publicación
2013
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films by controlled deposition induced by a reactive sputtering magnetron and (ii) to perform a parallel in situ structural study of the deposited thin films by X-ray diffraction, in real time, during the whole growth process. The designed reactor allows for the control and precise variation of the relevant processing parameters, namely, magnetron target-to-sample distance, dc magnetron voltage, and nature of the gas mixture, gas pressure and temperature of the substrate. On the other hand, the chamber can be used in different X-ray diffraction scanning modes, namely, θ-2θ scanning, fixed α-2θ scanning, and also low angle techniques such as grazing incidence small angle X-ray scattering and X-ray reflectivity. The chamber was mounted on a standard four-circle diffractometer located in a synchrotron beam line and first used for a preliminary X-ray diffraction analysis of AlN thin films during their growth on the surface of a (100) silicon wafer. © 2013 American Institute of Physics
Fil: Burgi, Juan Mauel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
Fil: Newenschwander, R.. Laboratorio Nacional de Luz Sincrotron Campinas;
Fil: Kellermann, G.. Universidade Federal Do Parana;
Fil: García Molleja, Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
Fil: Craievich, A.. Instituto de Fi­sica Universidad de San Pablo;
Fil: Feugeas J.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
Materia
ALUMINIUM COMPOUNDS
GAS MIXTURES
III-V SEMICONDUCTORS
SEMICONDUCTOR GROWTH
SEMICONDUCTOR THIN FILM
SPUTTER DEPOSITION
SYNCHROTRONS
WIDE BAND GAP SEMICONDUCTORS
X-RAY DIFFRACTION
X-RAY DIFFRACTOMETERS
X-RAY REFLECTION
X-RAY SCATTERING
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/704
Acceder
id CONICETDig_addbee3b408edc1011be021d06103ec7
oai_identifier_str oai:ri.conicet.gov.ar:11336/704
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffractionBurgi, Juan MauelNewenschwander, R.Kellermann, G.García Molleja, JavierCraievich, A.Feugeas J.ALUMINIUM COMPOUNDSGAS MIXTURESIII-V SEMICONDUCTORSSEMICONDUCTOR GROWTHSEMICONDUCTOR THIN FILMSPUTTER DEPOSITIONSYNCHROTRONSWIDE BAND GAP SEMICONDUCTORSX-RAY DIFFRACTIONX-RAY DIFFRACTOMETERSX-RAY REFLECTIONX-RAY SCATTERINGhttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films by controlled deposition induced by a reactive sputtering magnetron and (ii) to perform a parallel in situ structural study of the deposited thin films by X-ray diffraction, in real time, during the whole growth process. The designed reactor allows for the control and precise variation of the relevant processing parameters, namely, magnetron target-to-sample distance, dc magnetron voltage, and nature of the gas mixture, gas pressure and temperature of the substrate. On the other hand, the chamber can be used in different X-ray diffraction scanning modes, namely, θ-2θ scanning, fixed α-2θ scanning, and also low angle techniques such as grazing incidence small angle X-ray scattering and X-ray reflectivity. The chamber was mounted on a standard four-circle diffractometer located in a synchrotron beam line and first used for a preliminary X-ray diffraction analysis of AlN thin films during their growth on the surface of a (100) silicon wafer. © 2013 American Institute of PhysicsFil: Burgi, Juan Mauel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); ArgentinaFil: Newenschwander, R.. Laboratorio Nacional de Luz Sincrotron Campinas;Fil: Kellermann, G.. Universidade Federal Do Parana;Fil: García Molleja, Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); ArgentinaFil: Craievich, A.. Instituto de Fi­sica Universidad de San Pablo;Fil: Feugeas J.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); ArgentinaAmer Inst Physics2013-01info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/704Burgi, Juan Mauel; Newenschwander, R.; Kellermann, G.; García Molleja, Javier; Craievich, A.; et al.; Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction; Amer Inst Physics; Review Of Scientific Instruments; 84; 1-2013; 151021-1510250034-6748enginfo:eu-repo/semantics/altIdentifier/doi/10.1063/1.4773002info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-29T11:45:43Zoai:ri.conicet.gov.ar:11336/704instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-29 11:45:43.843CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
title Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
spellingShingle Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
Burgi, Juan Mauel
ALUMINIUM COMPOUNDS
GAS MIXTURES
III-V SEMICONDUCTORS
SEMICONDUCTOR GROWTH
SEMICONDUCTOR THIN FILM
SPUTTER DEPOSITION
SYNCHROTRONS
WIDE BAND GAP SEMICONDUCTORS
X-RAY DIFFRACTION
X-RAY DIFFRACTOMETERS
X-RAY REFLECTION
X-RAY SCATTERING
title_short Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
title_full Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
title_fullStr Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
title_full_unstemmed Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
title_sort Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction
dc.creator.none.fl_str_mv Burgi, Juan Mauel
Newenschwander, R.
Kellermann, G.
García Molleja, Javier
Craievich, A.
Feugeas J.
author Burgi, Juan Mauel
author_facet Burgi, Juan Mauel
Newenschwander, R.
Kellermann, G.
García Molleja, Javier
Craievich, A.
Feugeas J.
author_role author
author2 Newenschwander, R.
Kellermann, G.
García Molleja, Javier
Craievich, A.
Feugeas J.
author2_role author
author
author
author
author
dc.subject.none.fl_str_mv ALUMINIUM COMPOUNDS
GAS MIXTURES
III-V SEMICONDUCTORS
SEMICONDUCTOR GROWTH
SEMICONDUCTOR THIN FILM
SPUTTER DEPOSITION
SYNCHROTRONS
WIDE BAND GAP SEMICONDUCTORS
X-RAY DIFFRACTION
X-RAY DIFFRACTOMETERS
X-RAY REFLECTION
X-RAY SCATTERING
topic ALUMINIUM COMPOUNDS
GAS MIXTURES
III-V SEMICONDUCTORS
SEMICONDUCTOR GROWTH
SEMICONDUCTOR THIN FILM
SPUTTER DEPOSITION
SYNCHROTRONS
WIDE BAND GAP SEMICONDUCTORS
X-RAY DIFFRACTION
X-RAY DIFFRACTOMETERS
X-RAY REFLECTION
X-RAY SCATTERING
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films by controlled deposition induced by a reactive sputtering magnetron and (ii) to perform a parallel in situ structural study of the deposited thin films by X-ray diffraction, in real time, during the whole growth process. The designed reactor allows for the control and precise variation of the relevant processing parameters, namely, magnetron target-to-sample distance, dc magnetron voltage, and nature of the gas mixture, gas pressure and temperature of the substrate. On the other hand, the chamber can be used in different X-ray diffraction scanning modes, namely, θ-2θ scanning, fixed α-2θ scanning, and also low angle techniques such as grazing incidence small angle X-ray scattering and X-ray reflectivity. The chamber was mounted on a standard four-circle diffractometer located in a synchrotron beam line and first used for a preliminary X-ray diffraction analysis of AlN thin films during their growth on the surface of a (100) silicon wafer. © 2013 American Institute of Physics
Fil: Burgi, Juan Mauel. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
Fil: Newenschwander, R.. Laboratorio Nacional de Luz Sincrotron Campinas;
Fil: Kellermann, G.. Universidade Federal Do Parana;
Fil: García Molleja, Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
Fil: Craievich, A.. Instituto de Fi­sica Universidad de San Pablo;
Fil: Feugeas J.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico - CONICET - Rosario. Instituto de Fisica de Rosario (i); Argentina
description The purpose of the designed reactor is (i) to obtain polycrystalline and/or amorphous thin films by controlled deposition induced by a reactive sputtering magnetron and (ii) to perform a parallel in situ structural study of the deposited thin films by X-ray diffraction, in real time, during the whole growth process. The designed reactor allows for the control and precise variation of the relevant processing parameters, namely, magnetron target-to-sample distance, dc magnetron voltage, and nature of the gas mixture, gas pressure and temperature of the substrate. On the other hand, the chamber can be used in different X-ray diffraction scanning modes, namely, θ-2θ scanning, fixed α-2θ scanning, and also low angle techniques such as grazing incidence small angle X-ray scattering and X-ray reflectivity. The chamber was mounted on a standard four-circle diffractometer located in a synchrotron beam line and first used for a preliminary X-ray diffraction analysis of AlN thin films during their growth on the surface of a (100) silicon wafer. © 2013 American Institute of Physics
publishDate 2013
dc.date.none.fl_str_mv 2013-01
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/704
Burgi, Juan Mauel; Newenschwander, R.; Kellermann, G.; García Molleja, Javier; Craievich, A.; et al.; Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction; Amer Inst Physics; Review Of Scientific Instruments; 84; 1-2013; 151021-151025
0034-6748
url http://hdl.handle.net/11336/704
identifier_str_mv Burgi, Juan Mauel; Newenschwander, R.; Kellermann, G.; García Molleja, Javier; Craievich, A.; et al.; Reactive sputter magnetron reactor for preparation of thin films and simultaneous in situ structural study by X-ray diffraction; Amer Inst Physics; Review Of Scientific Instruments; 84; 1-2013; 151021-151025
0034-6748
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/doi/10.1063/1.4773002
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-nd/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv Amer Inst Physics
publisher.none.fl_str_mv Amer Inst Physics
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1847426431962841088
score 13.10058

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