Cita APA

Fadida, S., Palumbo, F. R. M., Nyns, L., Lin, D., Van Elshocht, S., Caymax, M., & Eizenberg, M. (2013). Hf-based high-k dielectrics for p-Ge MOS gate stacks. Web

Citación estilo Chicago

Fadida, Sivan, Félix Roberto Mario Palumbo, Laura Nyns, Dennis Lin, Sven Van Elshocht, Matty Caymax, and Moshe Eizenberg. Hf-based High-k Dielectrics for P-Ge MOS Gate Stacks. 2013.

Cita MLA

Fadida, Sivan, et al. Hf-based High-k Dielectrics for P-Ge MOS Gate Stacks. 2013.