Rath, J., Rubinelli, F. A., & Schropp, R. (2000). Effect of Oxide Treatment at the Mycrocrystalline Tunnel Junction of a-Si: H/a-Si:H Tandem Cells. Web
Citación estilo ChicagoRath, J.K., Francisco Alberto Rubinelli, and R.E.I Schropp. Effect of Oxide Treatment At the Mycrocrystalline Tunnel Junction of A-Si: H/a-Si:H Tandem Cells. 2000.
Cita MLARath, J.K., Francisco Alberto Rubinelli, and R.E.I Schropp. Effect of Oxide Treatment At the Mycrocrystalline Tunnel Junction of A-Si: H/a-Si:H Tandem Cells. 2000.
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