In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper

Autores
Adams, Heather; Miller, Brendan P.; Kotvis, Peter V.; Furlong, Octavio Javier; Martini, Ashlie; Tysoe, Wilfred T.
Año de publicación
2016
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The reaction pathways and shear-induced kinetics of methyl thiolate and ethyl thiolate species on copper are measured using in situ and ex situ techniques in ultrahigh vacuum. The in situ techniques consist of measuring the gas-phase products using a mass spectrometer placed in-line-of-sight of the rubbing interface while monitoring the variation in friction coefficient of an alkyl thiolate-covered surface as a function of the number of times it is rubbed (referred to in the paper as "number of scans"). The rubbed surfaces are analyzed using Auger spectroscopy as a function of the number of scans. The experiments are carried out for a tungsten carbide ball covered by a copper transfer film on copper surface at a normal load of 0.44 N and a sliding speed of 4 mm/s. The shear-induced reaction occurs as RS(ads) → S(ads) → S(subsurface), where RS(ads) is an adsorbed alkyl thiolate species, S(ads) is adsorbed atomic sulfur, and S(subsurface) is subsurface sulfur formed by shear-induced surface-to-bulk transport. The rate constants for the sequential reaction steps are found by fitting an analytical kinetic model to the yield of gas-phase products and Auger signals as a function of the number of scans over the surface. The validity of the kinetic parameters is confirmed by comparison with the variation in friction coefficient as a function of the number of scans. The analysis reveals that both ethyl and methyl thiolate species decompose under shear at approximately the same rate and that the rate of surface-to-bulk transport is higher than for thiolate decomposition.
Fil: Adams, Heather. University of Wisconsin; Estados Unidos
Fil: Miller, Brendan P.. Chevron Oronite Company; Estados Unidos
Fil: Kotvis, Peter V.. University of Wisconsin; Estados Unidos
Fil: Furlong, Octavio Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis. Instituto de Física Aplicada "Dr. Jorge Andrés Zgrablich". Universidad Nacional de San Luis. Facultad de Ciencias Físico Matemáticas y Naturales. Instituto de Física Aplicada "Dr. Jorge Andrés Zgrablich"; Argentina
Fil: Martini, Ashlie. University of California; Estados Unidos
Fil: Tysoe, Wilfred T.. University of Wisconsin; Estados Unidos
Materia
Auger Spectroscopy
Boundary Film Formation
Copper
Dialkyl Disulfides
In Situ Analysis
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/60473
Acceder
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oai_identifier_str oai:ri.conicet.gov.ar:11336/60473
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on CopperAdams, HeatherMiller, Brendan P.Kotvis, Peter V.Furlong, Octavio JavierMartini, AshlieTysoe, Wilfred T.Auger SpectroscopyBoundary Film FormationCopperDialkyl DisulfidesIn Situ Analysishttps://purl.org/becyt/ford/1.3https://purl.org/becyt/ford/1The reaction pathways and shear-induced kinetics of methyl thiolate and ethyl thiolate species on copper are measured using in situ and ex situ techniques in ultrahigh vacuum. The in situ techniques consist of measuring the gas-phase products using a mass spectrometer placed in-line-of-sight of the rubbing interface while monitoring the variation in friction coefficient of an alkyl thiolate-covered surface as a function of the number of times it is rubbed (referred to in the paper as "number of scans"). The rubbed surfaces are analyzed using Auger spectroscopy as a function of the number of scans. The experiments are carried out for a tungsten carbide ball covered by a copper transfer film on copper surface at a normal load of 0.44 N and a sliding speed of 4 mm/s. The shear-induced reaction occurs as RS(ads) → S(ads) → S(subsurface), where RS(ads) is an adsorbed alkyl thiolate species, S(ads) is adsorbed atomic sulfur, and S(subsurface) is subsurface sulfur formed by shear-induced surface-to-bulk transport. The rate constants for the sequential reaction steps are found by fitting an analytical kinetic model to the yield of gas-phase products and Auger signals as a function of the number of scans over the surface. The validity of the kinetic parameters is confirmed by comparison with the variation in friction coefficient as a function of the number of scans. The analysis reveals that both ethyl and methyl thiolate species decompose under shear at approximately the same rate and that the rate of surface-to-bulk transport is higher than for thiolate decomposition.Fil: Adams, Heather. University of Wisconsin; Estados UnidosFil: Miller, Brendan P.. Chevron Oronite Company; Estados UnidosFil: Kotvis, Peter V.. University of Wisconsin; Estados UnidosFil: Furlong, Octavio Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis. Instituto de Física Aplicada "Dr. Jorge Andrés Zgrablich". Universidad Nacional de San Luis. Facultad de Ciencias Físico Matemáticas y Naturales. Instituto de Física Aplicada "Dr. Jorge Andrés Zgrablich"; ArgentinaFil: Martini, Ashlie. University of California; Estados UnidosFil: Tysoe, Wilfred T.. University of Wisconsin; Estados UnidosSpringer/Plenum Publishers2016-04info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/60473Adams, Heather; Miller, Brendan P.; Kotvis, Peter V.; Furlong, Octavio Javier; Martini, Ashlie; et al.; In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper; Springer/Plenum Publishers; Tribology Letters; 62; 4-2016; 1-91023-88831573-2711CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/doi/10.1007/s11249-016-0664-0info:eu-repo/semantics/altIdentifier/url/https://link.springer.com/article/10.1007%2Fs11249-016-0664-0info:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-22T11:10:26Zoai:ri.conicet.gov.ar:11336/60473instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-22 11:10:26.467CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper
title In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper
spellingShingle In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper
Adams, Heather
Auger Spectroscopy
Boundary Film Formation
Copper
Dialkyl Disulfides
In Situ Analysis
title_short In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper
title_full In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper
title_fullStr In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper
title_full_unstemmed In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper
title_sort In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper
dc.creator.none.fl_str_mv Adams, Heather
Miller, Brendan P.
Kotvis, Peter V.
Furlong, Octavio Javier
Martini, Ashlie
Tysoe, Wilfred T.
author Adams, Heather
author_facet Adams, Heather
Miller, Brendan P.
Kotvis, Peter V.
Furlong, Octavio Javier
Martini, Ashlie
Tysoe, Wilfred T.
author_role author
author2 Miller, Brendan P.
Kotvis, Peter V.
Furlong, Octavio Javier
Martini, Ashlie
Tysoe, Wilfred T.
author2_role author
author
author
author
author
dc.subject.none.fl_str_mv Auger Spectroscopy
Boundary Film Formation
Copper
Dialkyl Disulfides
In Situ Analysis
topic Auger Spectroscopy
Boundary Film Formation
Copper
Dialkyl Disulfides
In Situ Analysis
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv The reaction pathways and shear-induced kinetics of methyl thiolate and ethyl thiolate species on copper are measured using in situ and ex situ techniques in ultrahigh vacuum. The in situ techniques consist of measuring the gas-phase products using a mass spectrometer placed in-line-of-sight of the rubbing interface while monitoring the variation in friction coefficient of an alkyl thiolate-covered surface as a function of the number of times it is rubbed (referred to in the paper as "number of scans"). The rubbed surfaces are analyzed using Auger spectroscopy as a function of the number of scans. The experiments are carried out for a tungsten carbide ball covered by a copper transfer film on copper surface at a normal load of 0.44 N and a sliding speed of 4 mm/s. The shear-induced reaction occurs as RS(ads) → S(ads) → S(subsurface), where RS(ads) is an adsorbed alkyl thiolate species, S(ads) is adsorbed atomic sulfur, and S(subsurface) is subsurface sulfur formed by shear-induced surface-to-bulk transport. The rate constants for the sequential reaction steps are found by fitting an analytical kinetic model to the yield of gas-phase products and Auger signals as a function of the number of scans over the surface. The validity of the kinetic parameters is confirmed by comparison with the variation in friction coefficient as a function of the number of scans. The analysis reveals that both ethyl and methyl thiolate species decompose under shear at approximately the same rate and that the rate of surface-to-bulk transport is higher than for thiolate decomposition.
Fil: Adams, Heather. University of Wisconsin; Estados Unidos
Fil: Miller, Brendan P.. Chevron Oronite Company; Estados Unidos
Fil: Kotvis, Peter V.. University of Wisconsin; Estados Unidos
Fil: Furlong, Octavio Javier. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis. Instituto de Física Aplicada "Dr. Jorge Andrés Zgrablich". Universidad Nacional de San Luis. Facultad de Ciencias Físico Matemáticas y Naturales. Instituto de Física Aplicada "Dr. Jorge Andrés Zgrablich"; Argentina
Fil: Martini, Ashlie. University of California; Estados Unidos
Fil: Tysoe, Wilfred T.. University of Wisconsin; Estados Unidos
description The reaction pathways and shear-induced kinetics of methyl thiolate and ethyl thiolate species on copper are measured using in situ and ex situ techniques in ultrahigh vacuum. The in situ techniques consist of measuring the gas-phase products using a mass spectrometer placed in-line-of-sight of the rubbing interface while monitoring the variation in friction coefficient of an alkyl thiolate-covered surface as a function of the number of times it is rubbed (referred to in the paper as "number of scans"). The rubbed surfaces are analyzed using Auger spectroscopy as a function of the number of scans. The experiments are carried out for a tungsten carbide ball covered by a copper transfer film on copper surface at a normal load of 0.44 N and a sliding speed of 4 mm/s. The shear-induced reaction occurs as RS(ads) → S(ads) → S(subsurface), where RS(ads) is an adsorbed alkyl thiolate species, S(ads) is adsorbed atomic sulfur, and S(subsurface) is subsurface sulfur formed by shear-induced surface-to-bulk transport. The rate constants for the sequential reaction steps are found by fitting an analytical kinetic model to the yield of gas-phase products and Auger signals as a function of the number of scans over the surface. The validity of the kinetic parameters is confirmed by comparison with the variation in friction coefficient as a function of the number of scans. The analysis reveals that both ethyl and methyl thiolate species decompose under shear at approximately the same rate and that the rate of surface-to-bulk transport is higher than for thiolate decomposition.
publishDate 2016
dc.date.none.fl_str_mv 2016-04
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/60473
Adams, Heather; Miller, Brendan P.; Kotvis, Peter V.; Furlong, Octavio Javier; Martini, Ashlie; et al.; In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper; Springer/Plenum Publishers; Tribology Letters; 62; 4-2016; 1-9
1023-8883
1573-2711
CONICET Digital
CONICET
url http://hdl.handle.net/11336/60473
identifier_str_mv Adams, Heather; Miller, Brendan P.; Kotvis, Peter V.; Furlong, Octavio Javier; Martini, Ashlie; et al.; In Situ Measurements of Boundary Film Formation Pathways and Kinetics: Dimethyl and Diethyl Disulfide on Copper; Springer/Plenum Publishers; Tribology Letters; 62; 4-2016; 1-9
1023-8883
1573-2711
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/doi/10.1007/s11249-016-0664-0
info:eu-repo/semantics/altIdentifier/url/https://link.springer.com/article/10.1007%2Fs11249-016-0664-0
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
dc.publisher.none.fl_str_mv Springer/Plenum Publishers
publisher.none.fl_str_mv Springer/Plenum Publishers
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
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score 12.982451

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