Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study

Autores
Zerbino, Jorge Omar; Torres Sanchez, Rosa Maria; Sustersic, Maria Gisela
Año de publicación
2009
Idioma
inglés
Tipo de recurso
artículo
Estado
versión publicada
Descripción
The effect of the addition of oxalate to the growth of a cuprous oxide layer on copper electrodes was analysed at potential near that of the open circuit, in borax solutions (7 < pH < 9) by cyclic voltammetry, ellipsometry and surface charge techniques. The oxide formation is explained as a sequence of Cu2 O layer growth, ippl, cationic defect accumulation and Cu(II) adsorption on the oxide/solution interface, and a dissolution/precipitation step similar to the mechanism previously reported in oxalate free solutions. The oxalate adsorption at pH = 9 increases the dissolution rate and a greater thickness of the outer layer, oppl, is obtained. Nevertheless, the oxalate adsorption at pH = 7 decreases the cationic defect on the cuprous oxide/electrolyte interface, promoting the Cu2 O growth. For copper particles immersed in solutions of pH between 7 and 9, the measured isoelectric point values, iep, (11.8 < iep < 11.5) shifts in the presence of oxalate to pH between 11.6 and 11.0, respectively. This shift in the iep to a lower pH value indicates oxalate adsorption on the Cu/ Cu2 O particles.
Fil: Zerbino, Jorge Omar. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina
Fil: Torres Sanchez, Rosa Maria. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas. Centro de Tecnología de Recursos Minerales y Cerámica. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Tecnología de Recursos Minerales y Cerámica; Argentina
Fil: Sustersic, Maria Gisela. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis; Argentina. Universidad Nacional de San Luis. Facultad de Ingeniería y Ciencias Económico Sociales; Argentina
Materia
COPPER OXIDE
OXALATE
ELLIPSOMETRIC
ISOELECTRIC POINT
Nivel de accesibilidad
acceso abierto
Condiciones de uso
https://creativecommons.org/licenses/by/2.5/ar/
Repositorio
CONICET Digital (CONICET)
Institución
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identificador
oai:ri.conicet.gov.ar:11336/159820
Acceder
id CONICETDig_2a349bae95c1c143a6f989e18fa35ed7
oai_identifier_str oai:ri.conicet.gov.ar:11336/159820
network_acronym_str CONICETDig
repository_id_str 3498
network_name_str CONICET Digital (CONICET)
spelling Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point studyZerbino, Jorge OmarTorres Sanchez, Rosa MariaSustersic, Maria GiselaCOPPER OXIDEOXALATEELLIPSOMETRICISOELECTRIC POINThttps://purl.org/becyt/ford/1.5https://purl.org/becyt/ford/1The effect of the addition of oxalate to the growth of a cuprous oxide layer on copper electrodes was analysed at potential near that of the open circuit, in borax solutions (7 < pH < 9) by cyclic voltammetry, ellipsometry and surface charge techniques. The oxide formation is explained as a sequence of Cu2 O layer growth, ippl, cationic defect accumulation and Cu(II) adsorption on the oxide/solution interface, and a dissolution/precipitation step similar to the mechanism previously reported in oxalate free solutions. The oxalate adsorption at pH = 9 increases the dissolution rate and a greater thickness of the outer layer, oppl, is obtained. Nevertheless, the oxalate adsorption at pH = 7 decreases the cationic defect on the cuprous oxide/electrolyte interface, promoting the Cu2 O growth. For copper particles immersed in solutions of pH between 7 and 9, the measured isoelectric point values, iep, (11.8 < iep < 11.5) shifts in the presence of oxalate to pH between 11.6 and 11.0, respectively. This shift in the iep to a lower pH value indicates oxalate adsorption on the Cu/ Cu2 O particles.Fil: Zerbino, Jorge Omar. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; ArgentinaFil: Torres Sanchez, Rosa Maria. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas. Centro de Tecnología de Recursos Minerales y Cerámica. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Tecnología de Recursos Minerales y Cerámica; ArgentinaFil: Sustersic, Maria Gisela. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis; Argentina. Universidad Nacional de San Luis. Facultad de Ingeniería y Ciencias Económico Sociales; ArgentinaSlovenian Chemical Society2009-12info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/159820Zerbino, Jorge Omar; Torres Sanchez, Rosa Maria; Sustersic, Maria Gisela; Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study; Slovenian Chemical Society; Acta Chimica Slovenica; 56; 1; 12-2009; 124-1301318-02071580-3155CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/http://acta-arhiv.chem-soc.si/56/graph/acta-56(1)-GA.htminfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-10-22T12:09:14Zoai:ri.conicet.gov.ar:11336/159820instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-10-22 12:09:14.925CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse
dc.title.none.fl_str_mv Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
title Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
spellingShingle Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
Zerbino, Jorge Omar
COPPER OXIDE
OXALATE
ELLIPSOMETRIC
ISOELECTRIC POINT
title_short Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
title_full Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
title_fullStr Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
title_full_unstemmed Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
title_sort Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
dc.creator.none.fl_str_mv Zerbino, Jorge Omar
Torres Sanchez, Rosa Maria
Sustersic, Maria Gisela
author Zerbino, Jorge Omar
author_facet Zerbino, Jorge Omar
Torres Sanchez, Rosa Maria
Sustersic, Maria Gisela
author_role author
author2 Torres Sanchez, Rosa Maria
Sustersic, Maria Gisela
author2_role author
author
dc.subject.none.fl_str_mv COPPER OXIDE
OXALATE
ELLIPSOMETRIC
ISOELECTRIC POINT
topic COPPER OXIDE
OXALATE
ELLIPSOMETRIC
ISOELECTRIC POINT
purl_subject.fl_str_mv https://purl.org/becyt/ford/1.5
https://purl.org/becyt/ford/1
dc.description.none.fl_txt_mv The effect of the addition of oxalate to the growth of a cuprous oxide layer on copper electrodes was analysed at potential near that of the open circuit, in borax solutions (7 < pH < 9) by cyclic voltammetry, ellipsometry and surface charge techniques. The oxide formation is explained as a sequence of Cu2 O layer growth, ippl, cationic defect accumulation and Cu(II) adsorption on the oxide/solution interface, and a dissolution/precipitation step similar to the mechanism previously reported in oxalate free solutions. The oxalate adsorption at pH = 9 increases the dissolution rate and a greater thickness of the outer layer, oppl, is obtained. Nevertheless, the oxalate adsorption at pH = 7 decreases the cationic defect on the cuprous oxide/electrolyte interface, promoting the Cu2 O growth. For copper particles immersed in solutions of pH between 7 and 9, the measured isoelectric point values, iep, (11.8 < iep < 11.5) shifts in the presence of oxalate to pH between 11.6 and 11.0, respectively. This shift in the iep to a lower pH value indicates oxalate adsorption on the Cu/ Cu2 O particles.
Fil: Zerbino, Jorge Omar. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina
Fil: Torres Sanchez, Rosa Maria. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas. Centro de Tecnología de Recursos Minerales y Cerámica. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Tecnología de Recursos Minerales y Cerámica; Argentina
Fil: Sustersic, Maria Gisela. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis; Argentina. Universidad Nacional de San Luis. Facultad de Ingeniería y Ciencias Económico Sociales; Argentina
description The effect of the addition of oxalate to the growth of a cuprous oxide layer on copper electrodes was analysed at potential near that of the open circuit, in borax solutions (7 < pH < 9) by cyclic voltammetry, ellipsometry and surface charge techniques. The oxide formation is explained as a sequence of Cu2 O layer growth, ippl, cationic defect accumulation and Cu(II) adsorption on the oxide/solution interface, and a dissolution/precipitation step similar to the mechanism previously reported in oxalate free solutions. The oxalate adsorption at pH = 9 increases the dissolution rate and a greater thickness of the outer layer, oppl, is obtained. Nevertheless, the oxalate adsorption at pH = 7 decreases the cationic defect on the cuprous oxide/electrolyte interface, promoting the Cu2 O growth. For copper particles immersed in solutions of pH between 7 and 9, the measured isoelectric point values, iep, (11.8 < iep < 11.5) shifts in the presence of oxalate to pH between 11.6 and 11.0, respectively. This shift in the iep to a lower pH value indicates oxalate adsorption on the Cu/ Cu2 O particles.
publishDate 2009
dc.date.none.fl_str_mv 2009-12
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/11336/159820
Zerbino, Jorge Omar; Torres Sanchez, Rosa Maria; Sustersic, Maria Gisela; Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study; Slovenian Chemical Society; Acta Chimica Slovenica; 56; 1; 12-2009; 124-130
1318-0207
1580-3155
CONICET Digital
CONICET
url http://hdl.handle.net/11336/159820
identifier_str_mv Zerbino, Jorge Omar; Torres Sanchez, Rosa Maria; Sustersic, Maria Gisela; Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study; Slovenian Chemical Society; Acta Chimica Slovenica; 56; 1; 12-2009; 124-130
1318-0207
1580-3155
CONICET Digital
CONICET
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/url/http://acta-arhiv.chem-soc.si/56/graph/acta-56(1)-GA.htm
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
https://creativecommons.org/licenses/by/2.5/ar/
eu_rights_str_mv openAccess
rights_invalid_str_mv https://creativecommons.org/licenses/by/2.5/ar/
dc.format.none.fl_str_mv application/pdf
application/pdf
application/pdf
application/pdf
dc.publisher.none.fl_str_mv Slovenian Chemical Society
publisher.none.fl_str_mv Slovenian Chemical Society
dc.source.none.fl_str_mv reponame:CONICET Digital (CONICET)
instname:Consejo Nacional de Investigaciones Científicas y Técnicas
reponame_str CONICET Digital (CONICET)
collection CONICET Digital (CONICET)
instname_str Consejo Nacional de Investigaciones Científicas y Técnicas
repository.name.fl_str_mv CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas
repository.mail.fl_str_mv dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar
_version_ 1846782468968939520
score 12.982451

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