Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study
- Autores
- Zerbino, Jorge Omar; Torres Sanchez, Rosa Maria; Sustersic, Maria Gisela
- Año de publicación
- 2009
- Idioma
- inglés
- Tipo de recurso
- artículo
- Estado
- versión publicada
- Descripción
- The effect of the addition of oxalate to the growth of a cuprous oxide layer on copper electrodes was analysed at potential near that of the open circuit, in borax solutions (7 < pH < 9) by cyclic voltammetry, ellipsometry and surface charge techniques. The oxide formation is explained as a sequence of Cu2 O layer growth, ippl, cationic defect accumulation and Cu(II) adsorption on the oxide/solution interface, and a dissolution/precipitation step similar to the mechanism previously reported in oxalate free solutions. The oxalate adsorption at pH = 9 increases the dissolution rate and a greater thickness of the outer layer, oppl, is obtained. Nevertheless, the oxalate adsorption at pH = 7 decreases the cationic defect on the cuprous oxide/electrolyte interface, promoting the Cu2 O growth. For copper particles immersed in solutions of pH between 7 and 9, the measured isoelectric point values, iep, (11.8 < iep < 11.5) shifts in the presence of oxalate to pH between 11.6 and 11.0, respectively. This shift in the iep to a lower pH value indicates oxalate adsorption on the Cu/ Cu2 O particles.
Fil: Zerbino, Jorge Omar. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina
Fil: Torres Sanchez, Rosa Maria. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas. Centro de Tecnología de Recursos Minerales y Cerámica. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Tecnología de Recursos Minerales y Cerámica; Argentina
Fil: Sustersic, Maria Gisela. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis; Argentina. Universidad Nacional de San Luis. Facultad de Ingeniería y Ciencias Económico Sociales; Argentina - Materia
-
COPPER OXIDE
OXALATE
ELLIPSOMETRIC
ISOELECTRIC POINT - Nivel de accesibilidad
- acceso abierto
- Condiciones de uso
- https://creativecommons.org/licenses/by/2.5/ar/
- Repositorio
- Institución
- Consejo Nacional de Investigaciones Científicas y Técnicas
- OAI Identificador
- oai:ri.conicet.gov.ar:11336/159820
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Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point studyZerbino, Jorge OmarTorres Sanchez, Rosa MariaSustersic, Maria GiselaCOPPER OXIDEOXALATEELLIPSOMETRICISOELECTRIC POINThttps://purl.org/becyt/ford/1.5https://purl.org/becyt/ford/1The effect of the addition of oxalate to the growth of a cuprous oxide layer on copper electrodes was analysed at potential near that of the open circuit, in borax solutions (7 < pH < 9) by cyclic voltammetry, ellipsometry and surface charge techniques. The oxide formation is explained as a sequence of Cu2 O layer growth, ippl, cationic defect accumulation and Cu(II) adsorption on the oxide/solution interface, and a dissolution/precipitation step similar to the mechanism previously reported in oxalate free solutions. The oxalate adsorption at pH = 9 increases the dissolution rate and a greater thickness of the outer layer, oppl, is obtained. Nevertheless, the oxalate adsorption at pH = 7 decreases the cationic defect on the cuprous oxide/electrolyte interface, promoting the Cu2 O growth. For copper particles immersed in solutions of pH between 7 and 9, the measured isoelectric point values, iep, (11.8 < iep < 11.5) shifts in the presence of oxalate to pH between 11.6 and 11.0, respectively. This shift in the iep to a lower pH value indicates oxalate adsorption on the Cu/ Cu2 O particles.Fil: Zerbino, Jorge Omar. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; ArgentinaFil: Torres Sanchez, Rosa Maria. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas. Centro de Tecnología de Recursos Minerales y Cerámica. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Tecnología de Recursos Minerales y Cerámica; ArgentinaFil: Sustersic, Maria Gisela. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis; Argentina. Universidad Nacional de San Luis. Facultad de Ingeniería y Ciencias Económico Sociales; ArgentinaSlovenian Chemical Society2009-12info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionhttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdfapplication/pdfapplication/pdfapplication/pdfhttp://hdl.handle.net/11336/159820Zerbino, Jorge Omar; Torres Sanchez, Rosa Maria; Sustersic, Maria Gisela; Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study; Slovenian Chemical Society; Acta Chimica Slovenica; 56; 1; 12-2009; 124-1301318-02071580-3155CONICET DigitalCONICETenginfo:eu-repo/semantics/altIdentifier/url/http://acta-arhiv.chem-soc.si/56/graph/acta-56(1)-GA.htminfo:eu-repo/semantics/openAccesshttps://creativecommons.org/licenses/by/2.5/ar/reponame:CONICET Digital (CONICET)instname:Consejo Nacional de Investigaciones Científicas y Técnicas2025-09-29T10:37:00Zoai:ri.conicet.gov.ar:11336/159820instacron:CONICETInstitucionalhttp://ri.conicet.gov.ar/Organismo científico-tecnológicoNo correspondehttp://ri.conicet.gov.ar/oai/requestdasensio@conicet.gov.ar; lcarlino@conicet.gov.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:34982025-09-29 10:37:00.897CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicasfalse |
dc.title.none.fl_str_mv |
Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study |
title |
Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study |
spellingShingle |
Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study Zerbino, Jorge Omar COPPER OXIDE OXALATE ELLIPSOMETRIC ISOELECTRIC POINT |
title_short |
Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study |
title_full |
Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study |
title_fullStr |
Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study |
title_full_unstemmed |
Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study |
title_sort |
Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study |
dc.creator.none.fl_str_mv |
Zerbino, Jorge Omar Torres Sanchez, Rosa Maria Sustersic, Maria Gisela |
author |
Zerbino, Jorge Omar |
author_facet |
Zerbino, Jorge Omar Torres Sanchez, Rosa Maria Sustersic, Maria Gisela |
author_role |
author |
author2 |
Torres Sanchez, Rosa Maria Sustersic, Maria Gisela |
author2_role |
author author |
dc.subject.none.fl_str_mv |
COPPER OXIDE OXALATE ELLIPSOMETRIC ISOELECTRIC POINT |
topic |
COPPER OXIDE OXALATE ELLIPSOMETRIC ISOELECTRIC POINT |
purl_subject.fl_str_mv |
https://purl.org/becyt/ford/1.5 https://purl.org/becyt/ford/1 |
dc.description.none.fl_txt_mv |
The effect of the addition of oxalate to the growth of a cuprous oxide layer on copper electrodes was analysed at potential near that of the open circuit, in borax solutions (7 < pH < 9) by cyclic voltammetry, ellipsometry and surface charge techniques. The oxide formation is explained as a sequence of Cu2 O layer growth, ippl, cationic defect accumulation and Cu(II) adsorption on the oxide/solution interface, and a dissolution/precipitation step similar to the mechanism previously reported in oxalate free solutions. The oxalate adsorption at pH = 9 increases the dissolution rate and a greater thickness of the outer layer, oppl, is obtained. Nevertheless, the oxalate adsorption at pH = 7 decreases the cationic defect on the cuprous oxide/electrolyte interface, promoting the Cu2 O growth. For copper particles immersed in solutions of pH between 7 and 9, the measured isoelectric point values, iep, (11.8 < iep < 11.5) shifts in the presence of oxalate to pH between 11.6 and 11.0, respectively. This shift in the iep to a lower pH value indicates oxalate adsorption on the Cu/ Cu2 O particles. Fil: Zerbino, Jorge Omar. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina Fil: Torres Sanchez, Rosa Maria. Provincia de Buenos Aires. Gobernación. Comisión de Investigaciones Científicas. Centro de Tecnología de Recursos Minerales y Cerámica. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - La Plata. Centro de Tecnología de Recursos Minerales y Cerámica; Argentina Fil: Sustersic, Maria Gisela. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - San Luis; Argentina. Universidad Nacional de San Luis. Facultad de Ingeniería y Ciencias Económico Sociales; Argentina |
description |
The effect of the addition of oxalate to the growth of a cuprous oxide layer on copper electrodes was analysed at potential near that of the open circuit, in borax solutions (7 < pH < 9) by cyclic voltammetry, ellipsometry and surface charge techniques. The oxide formation is explained as a sequence of Cu2 O layer growth, ippl, cationic defect accumulation and Cu(II) adsorption on the oxide/solution interface, and a dissolution/precipitation step similar to the mechanism previously reported in oxalate free solutions. The oxalate adsorption at pH = 9 increases the dissolution rate and a greater thickness of the outer layer, oppl, is obtained. Nevertheless, the oxalate adsorption at pH = 7 decreases the cationic defect on the cuprous oxide/electrolyte interface, promoting the Cu2 O growth. For copper particles immersed in solutions of pH between 7 and 9, the measured isoelectric point values, iep, (11.8 < iep < 11.5) shifts in the presence of oxalate to pH between 11.6 and 11.0, respectively. This shift in the iep to a lower pH value indicates oxalate adsorption on the Cu/ Cu2 O particles. |
publishDate |
2009 |
dc.date.none.fl_str_mv |
2009-12 |
dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://purl.org/coar/resource_type/c_6501 info:ar-repo/semantics/articulo |
format |
article |
status_str |
publishedVersion |
dc.identifier.none.fl_str_mv |
http://hdl.handle.net/11336/159820 Zerbino, Jorge Omar; Torres Sanchez, Rosa Maria; Sustersic, Maria Gisela; Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study; Slovenian Chemical Society; Acta Chimica Slovenica; 56; 1; 12-2009; 124-130 1318-0207 1580-3155 CONICET Digital CONICET |
url |
http://hdl.handle.net/11336/159820 |
identifier_str_mv |
Zerbino, Jorge Omar; Torres Sanchez, Rosa Maria; Sustersic, Maria Gisela; Effect of oxalate on the growth of cuprous oxide layers on copper electrodes: ellipsometric and isoelectric point study; Slovenian Chemical Society; Acta Chimica Slovenica; 56; 1; 12-2009; 124-130 1318-0207 1580-3155 CONICET Digital CONICET |
dc.language.none.fl_str_mv |
eng |
language |
eng |
dc.relation.none.fl_str_mv |
info:eu-repo/semantics/altIdentifier/url/http://acta-arhiv.chem-soc.si/56/graph/acta-56(1)-GA.htm |
dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess https://creativecommons.org/licenses/by/2.5/ar/ |
eu_rights_str_mv |
openAccess |
rights_invalid_str_mv |
https://creativecommons.org/licenses/by/2.5/ar/ |
dc.format.none.fl_str_mv |
application/pdf application/pdf application/pdf application/pdf |
dc.publisher.none.fl_str_mv |
Slovenian Chemical Society |
publisher.none.fl_str_mv |
Slovenian Chemical Society |
dc.source.none.fl_str_mv |
reponame:CONICET Digital (CONICET) instname:Consejo Nacional de Investigaciones Científicas y Técnicas |
reponame_str |
CONICET Digital (CONICET) |
collection |
CONICET Digital (CONICET) |
instname_str |
Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.name.fl_str_mv |
CONICET Digital (CONICET) - Consejo Nacional de Investigaciones Científicas y Técnicas |
repository.mail.fl_str_mv |
dasensio@conicet.gov.ar; lcarlino@conicet.gov.ar |
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1844614390492430336 |
score |
13.070432 |