Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques

Autores
Mahmud, Z.; Gordillo, G.; Gassa, L.; Ventura D'Alkaine, C.
Año de publicación
2016
Idioma
español castellano
Tipo de recurso
informe técnico
Estado
versión enviada
Descripción
In this work we have analyzed the effect of thiourea concentration in the acid zinc deposition process. For these purpose, we have used the electrochemical techniques (cathodic voltammetry and Electrochemistry Impedance Spectroscopy, EIS). It allows determining the optimal concentration thiourea additive. In this range, we have obtained better finishes, more refined and decoratives layers. We have found in voltammetric studies that the electroreduction of Zn 2+ in the presence of thiourea is accelerated. The EIS studies has shown the “electrodeposition resistance” decrease in the presence of thiourea. The addition of more thiourea in the solution, in the optimum concentration, the electrodeposition resistance to the electrodeposition process is increased. The main contribution of this research and its scientific contribution is the use of electrochemical techniques for determining the optimal concentration of thiourea additive in the zinc electroplating solution in chloride acid media
Fil: Mahmud, Z. Instituto Nacional de Tecnología Industrial. Procesos Superficiales; Argentina.
Fil: Gordillo, G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Química Inorgánica, Analítica y Química Física; Argentina.
Fil: Gassa, L. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina.
Fil: Ventura D'Alkaine, C. Universidade Federal de São Carlos; Brasil.
Materia
zinc
electroplating
additives
EIS
Nivel de accesibilidad
acceso abierto
Condiciones de uso
http://creativecommons.org/licenses/by/2.5/ar
Repositorio
Biblioteca Digital (UBA-FCEN)
Institución
Universidad Nacional de Buenos Aires. Facultad de Ciencias Exactas y Naturales
OAI Identificador
technicalreport:technicalreport_n00014
Acceder
id BDUBAFCEN_39e61dc82cdd1e700be9c55ef6eb12e5
oai_identifier_str technicalreport:technicalreport_n00014
network_acronym_str BDUBAFCEN
repository_id_str 1896
network_name_str Biblioteca Digital (UBA-FCEN)
spelling Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniquesMahmud, Z.Gordillo, G.Gassa, L.Ventura D'Alkaine, C.zincelectroplatingadditivesEISIn this work we have analyzed the effect of thiourea concentration in the acid zinc deposition process. For these purpose, we have used the electrochemical techniques (cathodic voltammetry and Electrochemistry Impedance Spectroscopy, EIS). It allows determining the optimal concentration thiourea additive. In this range, we have obtained better finishes, more refined and decoratives layers. We have found in voltammetric studies that the electroreduction of Zn 2+ in the presence of thiourea is accelerated. The EIS studies has shown the “electrodeposition resistance” decrease in the presence of thiourea. The addition of more thiourea in the solution, in the optimum concentration, the electrodeposition resistance to the electrodeposition process is increased. The main contribution of this research and its scientific contribution is the use of electrochemical techniques for determining the optimal concentration of thiourea additive in the zinc electroplating solution in chloride acid mediaFil: Mahmud, Z. Instituto Nacional de Tecnología Industrial. Procesos Superficiales; Argentina.Fil: Gordillo, G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Química Inorgánica, Analítica y Química Física; Argentina.Fil: Gassa, L. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina.Fil: Ventura D'Alkaine, C. Universidade Federal de São Carlos; Brasil.Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales2016-09info:eu-repo/semantics/reportinfo:eu-repo/semantics/submittedVersionhttp://purl.org/coar/resource_type/c_18ghinfo:ar-repo/semantics/informeTecnicoapplication/pdfhttp://hdl.handle.net/20.500.12110/technicalreport_n00014spainfo:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by/2.5/arreponame:Biblioteca Digital (UBA-FCEN)instname:Universidad Nacional de Buenos Aires. Facultad de Ciencias Exactas y Naturalesinstacron:UBA-FCEN2025-10-16T09:27:20Ztechnicalreport:technicalreport_n00014Institucionalhttps://digital.bl.fcen.uba.ar/Universidad públicaNo correspondehttps://digital.bl.fcen.uba.ar/cgi-bin/oaiserver.cgiana@bl.fcen.uba.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:18962025-10-16 09:27:21.436Biblioteca Digital (UBA-FCEN) - Universidad Nacional de Buenos Aires. Facultad de Ciencias Exactas y Naturalesfalse
dc.title.none.fl_str_mv Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
spellingShingle Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
Mahmud, Z.
zinc
electroplating
additives
EIS
title_short Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_full Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_fullStr Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_full_unstemmed Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
title_sort Control of zinc plating solutions, determining the optimum concentration of thiourea additive by electrochemical techniques
dc.creator.none.fl_str_mv Mahmud, Z.
Gordillo, G.
Gassa, L.
Ventura D'Alkaine, C.
author Mahmud, Z.
author_facet Mahmud, Z.
Gordillo, G.
Gassa, L.
Ventura D'Alkaine, C.
author_role author
author2 Gordillo, G.
Gassa, L.
Ventura D'Alkaine, C.
author2_role author
author
author
dc.subject.none.fl_str_mv zinc
electroplating
additives
EIS
topic zinc
electroplating
additives
EIS
dc.description.none.fl_txt_mv In this work we have analyzed the effect of thiourea concentration in the acid zinc deposition process. For these purpose, we have used the electrochemical techniques (cathodic voltammetry and Electrochemistry Impedance Spectroscopy, EIS). It allows determining the optimal concentration thiourea additive. In this range, we have obtained better finishes, more refined and decoratives layers. We have found in voltammetric studies that the electroreduction of Zn 2+ in the presence of thiourea is accelerated. The EIS studies has shown the “electrodeposition resistance” decrease in the presence of thiourea. The addition of more thiourea in the solution, in the optimum concentration, the electrodeposition resistance to the electrodeposition process is increased. The main contribution of this research and its scientific contribution is the use of electrochemical techniques for determining the optimal concentration of thiourea additive in the zinc electroplating solution in chloride acid media
Fil: Mahmud, Z. Instituto Nacional de Tecnología Industrial. Procesos Superficiales; Argentina.
Fil: Gordillo, G. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales. Departamento de Química Inorgánica, Analítica y Química Física; Argentina.
Fil: Gassa, L. Universidad Nacional de La Plata. Facultad de Ciencias Exactas. Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas; Argentina.
Fil: Ventura D'Alkaine, C. Universidade Federal de São Carlos; Brasil.
description In this work we have analyzed the effect of thiourea concentration in the acid zinc deposition process. For these purpose, we have used the electrochemical techniques (cathodic voltammetry and Electrochemistry Impedance Spectroscopy, EIS). It allows determining the optimal concentration thiourea additive. In this range, we have obtained better finishes, more refined and decoratives layers. We have found in voltammetric studies that the electroreduction of Zn 2+ in the presence of thiourea is accelerated. The EIS studies has shown the “electrodeposition resistance” decrease in the presence of thiourea. The addition of more thiourea in the solution, in the optimum concentration, the electrodeposition resistance to the electrodeposition process is increased. The main contribution of this research and its scientific contribution is the use of electrochemical techniques for determining the optimal concentration of thiourea additive in the zinc electroplating solution in chloride acid media
publishDate 2016
dc.date.none.fl_str_mv 2016-09
dc.type.none.fl_str_mv info:eu-repo/semantics/report
info:eu-repo/semantics/submittedVersion
http://purl.org/coar/resource_type/c_18gh
info:ar-repo/semantics/informeTecnico
format report
status_str submittedVersion
dc.identifier.none.fl_str_mv http://hdl.handle.net/20.500.12110/technicalreport_n00014
url http://hdl.handle.net/20.500.12110/technicalreport_n00014
dc.language.none.fl_str_mv spa
language spa
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by/2.5/ar
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by/2.5/ar
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales
publisher.none.fl_str_mv Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales
dc.source.none.fl_str_mv reponame:Biblioteca Digital (UBA-FCEN)
instname:Universidad Nacional de Buenos Aires. Facultad de Ciencias Exactas y Naturales
instacron:UBA-FCEN
reponame_str Biblioteca Digital (UBA-FCEN)
collection Biblioteca Digital (UBA-FCEN)
instname_str Universidad Nacional de Buenos Aires. Facultad de Ciencias Exactas y Naturales
instacron_str UBA-FCEN
institution UBA-FCEN
repository.name.fl_str_mv Biblioteca Digital (UBA-FCEN) - Universidad Nacional de Buenos Aires. Facultad de Ciencias Exactas y Naturales
repository.mail.fl_str_mv ana@bl.fcen.uba.ar
_version_ 1846142789349277696
score 12.712165

Publicaciones similares