Pasquale, M. Á., Gassa, L. M., & Arvia, A. J. (2008). Copper electrodeposition from an acidic plating bath containing accelerating and inhibiting organic additives. Web
Citación estilo ChicagoPasquale, Miguel Ángel, Liliana Mabel Gassa, and Alejandro Jorge Arvia. Copper Electrodeposition From an Acidic Plating Bath Containing Accelerating and Inhibiting Organic Additives. 2008.
Cita MLAPasquale, Miguel Ángel, Liliana Mabel Gassa, and Alejandro Jorge Arvia. Copper Electrodeposition From an Acidic Plating Bath Containing Accelerating and Inhibiting Organic Additives. 2008.
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