Ambient-pressure CVD of graphene on low-index Ni surfaces using methane: A combined experimental and first-principles study

Authors
Mafra, Daniela L.; Olmos Asar, Jimena Anahí; Negreiros, Fabio R.; Reina, Alfonso; Kim, Ki Kang; Dresselhaus, Mildred S.; Kong, Jing; Mankey, Gary J.; Araujo, Paulo T.
Publication Year
2018
Language
English
Format
article
Status
Published version
Description
The growth of large area single-layer graphene (1-LG) is studied using ambient pressure chemical vapor deposition on single-crystal Ni(111), Ni(110), and Ni(100). By varying both the furnace temperature in the range of 800-1100 °C and the gas flow through the growth chamber, uniform, high-quality 1-LG is obtained for Ni(111) and Ni(110) single crystals and for Ni(100) thin films. Surprisingly, only multilayer graphene growth could be obtained for single-crystal Ni(100). The experimental results are analyzed to determine the optimum combination of temperature and gas flow. Characterization with optical microscopy, Raman spectroscopy, and optical transmission support our findings. Density-functional theory calculations are performed to determine the energy barriers for diffusion, segregation, and adsorption, and model the kinetic pathways for formation of different carbon structures on the low-index surfaces of Ni.
Fil: Mafra, Daniela L.. Massachusetts Institute of Technology; Estados Unidos
Fil: Olmos Asar, Jimena Anahí. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Córdoba. Instituto de Investigaciones en Físico-química de Córdoba. Universidad Nacional de Córdoba. Facultad de Ciencias Químicas. Instituto de Investigaciones en Físico-química de Córdoba; Argentina
Fil: Negreiros, Fabio R.. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Córdoba. Instituto de Investigaciones en Físico-química de Córdoba. Universidad Nacional de Córdoba. Facultad de Ciencias Químicas. Instituto de Investigaciones en Físico-química de Córdoba; Argentina
Fil: Reina, Alfonso. Massachusetts Institute of Technology; Estados Unidos
Fil: Kim, Ki Kang. Dongguk University-seoul; Corea del Sur
Fil: Dresselhaus, Mildred S.. Massachusetts Institute of Technology; Estados Unidos
Fil: Kong, Jing. Massachusetts Institute of Technology; Estados Unidos
Fil: Mankey, Gary J.. The University Of Alabama; Estados Unidos
Fil: Araujo, Paulo T.. University of Alabama at Birmingahm; Estados Unidos
Subject
Nickel
Graphene
Ambient-pressure CVD
Física de los Materiales Condensados
Ciencias Físicas
CIENCIAS NATURALES Y EXACTAS
Access level
Open access
License
https://creativecommons.org/licenses/by-nc-sa/2.5/ar/
Repository
CONICET Digital (CONICET)
Institution
Consejo Nacional de Investigaciones Científicas y Técnicas
OAI Identifier
oai:ri.conicet.gov.ar:11336/86914