A comprehensive study of the influence of the stoichiometry on the physical properties of TiOx films prepared by ion beam deposition

Autores
<div class="autor_fcen" id="5357">Marchi, M.C.</div>; <div class="autor_fcen" id="135">Bilmes, S.A.</div>; Ribeiro, C.T.M.; Ochoa, E.A.; Kleinke, M.; <div class="autor_fcen" id="213">Alvarez, F.</div>
Año de publicación
2010
Idioma
inglés
Tipo de recurso
artículo
Estado
Versión publicada
Descripción
A comprehensive study of nonstoichiometry titanium oxide thin films (TiOx, 0.3≤x≤2) prepared by ion beam deposition technique is reported. The physical properties of the material are studied by ultraviolet and x-ray photoelectron, Raman, and Fourier transform infrared spectroscopies, and atomic force microscopy. An abrupt transition from metallic characteristics to a wide gap semiconductor is observed in a very narrow range of oxygen variation. Concomitantly with this change the crystal structure and morphology suffer remarkable physical properties modifications. This transformation is ascribed to surface-volume energy minimization due to the influence of oxygen determining the size of the TiO2 particles during coalescence. © 2010 American Institute of Physics.
Fil:Marchi, M.C. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina.
Fil:Bilmes, S.A. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina.
Fil:Alvarez, F. Universidad de Buenos Aires. Facultad de Ciencias Exactas y Naturales; Argentina.
Fuente
J Appl Phys 2010;108(6)
Materia
Abrupt transition
Comprehensive studies
Crystal structure and morphology
Energy minimization
Influence of oxygen
Ion beam deposition
Ion beam deposition technique
Non-stoichiometry
TiO
Titanium oxide thin films
Wide-gap semiconductor
X-ray photoelectrons
Atomic force microscopy
Atomic spectroscopy
Chemical modification
Coalescence
Crystal structure
Fourier transform infrared spectroscopy
Fourier transforms
Ion beams
Oxide films
Oxygen
Photoelectron spectroscopy
Physical properties
Stoichiometry
Titanium
Titanium oxides
Film preparation
Nivel de accesibilidad
Acceso abierto
Licencia
http://creativecommons.org/licenses/by/2.5/ar
Repositorio
Biblioteca Digital (UBA-FCEN)
Institución
Universidad Nacional de Buenos Aires. Facultad de Ciencias Exactas y Naturales
OAI Identificador
snrd:HASH029b7b08687245b2b32566